JPS5236042B2 - - Google Patents
Info
- Publication number
- JPS5236042B2 JPS5236042B2 JP13039073A JP13039073A JPS5236042B2 JP S5236042 B2 JPS5236042 B2 JP S5236042B2 JP 13039073 A JP13039073 A JP 13039073A JP 13039073 A JP13039073 A JP 13039073A JP S5236042 B2 JPS5236042 B2 JP S5236042B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F291/00—Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00
- C08F291/18—Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00 on to irradiated or oxidised macromolecules
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Medicinal Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Polyamides (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Polymerisation Methods In General (AREA)
- Graft Or Block Polymers (AREA)
- Polyesters Or Polycarbonates (AREA)
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13039073A JPS5236042B2 (xx) | 1973-11-19 | 1973-11-19 | |
DE19742454676 DE2454676C3 (de) | 1973-11-19 | 1974-11-19 | Lichtempfindliches Gemisch |
FR7439296A FR2251838A1 (en) | 1973-11-19 | 1974-11-29 | Light-sensitive compsn. contg. polymer with ammonium gps. - in main or side chain for printing plate mfr. etc. |
US05/843,850 US4187112A (en) | 1973-11-19 | 1977-10-20 | Photosensitive plate containing nitrogen containing condensation type polyesters |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13039073A JPS5236042B2 (xx) | 1973-11-19 | 1973-11-19 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5078401A JPS5078401A (xx) | 1975-06-26 |
JPS5236042B2 true JPS5236042B2 (xx) | 1977-09-13 |
Family
ID=15033163
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13039073A Expired JPS5236042B2 (xx) | 1973-11-19 | 1973-11-19 |
Country Status (3)
Country | Link |
---|---|
JP (1) | JPS5236042B2 (xx) |
DE (1) | DE2454676C3 (xx) |
FR (1) | FR2251838A1 (xx) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3129529A1 (de) * | 1981-07-27 | 1983-04-07 | Toyo Boseki K.K., Osaka | Lichtempfindliche harzmasse |
DE3131448A1 (de) * | 1981-08-07 | 1983-02-24 | Basf Ag, 6700 Ludwigshafen | Fuer die herstellung von photoresistschichten geeignete photopolymerisierbare aufzeichnungsmasse |
GB2235927B (en) * | 1989-09-14 | 1992-10-21 | Asahi Chemical Ind | A sulfonic acid group-containing polyurethane and a photosensitive resin composition containing the same |
EP0556403A4 (en) * | 1991-08-09 | 1996-02-28 | Toyo Ink Mfg Co | Photosensitive resin composition, production thereof, and flexographic plate material |
DE19501726A1 (de) * | 1995-01-20 | 1996-07-25 | Merck Patent Gmbh | Polymerisationsfähige Derivate von Polyamiden |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2274831A (en) * | 1939-07-20 | 1942-03-03 | Du Pont | Polyamides and process for their preparation |
US2887376A (en) * | 1956-01-26 | 1959-05-19 | Eastman Kodak Co | Photographic reproduction process using light-sensitive polymers |
NL219906A (xx) * | 1956-08-14 | |||
DE1447017B2 (de) * | 1963-10-26 | 1971-08-12 | Kalle AG, 6202 Wiesbaden Biebrich | Verfahren zur herstellung von druckformen gedruckten schal tungen oder metallaetzungen |
DE1772722A1 (de) * | 1968-06-26 | 1971-06-03 | Basf Ag | Verfahren zur Herstellung von Reliefformen fuer Druckzwecke |
SU363066A1 (ru) * | 1971-04-20 | 1972-12-30 | Авторы изобретени витель | Всеооюз |
-
1973
- 1973-11-19 JP JP13039073A patent/JPS5236042B2/ja not_active Expired
-
1974
- 1974-11-19 DE DE19742454676 patent/DE2454676C3/de not_active Expired
- 1974-11-29 FR FR7439296A patent/FR2251838A1/fr active Granted
Also Published As
Publication number | Publication date |
---|---|
DE2454676C3 (de) | 1985-08-29 |
JPS5078401A (xx) | 1975-06-26 |
FR2251838A1 (en) | 1975-06-13 |
FR2251838B1 (xx) | 1981-12-31 |
DE2454676A1 (de) | 1975-05-22 |
DE2454676B2 (de) | 1980-01-31 |