NL285301A - - Google Patents

Info

Publication number
NL285301A
NL285301A NL285301DA NL285301A NL 285301 A NL285301 A NL 285301A NL 285301D A NL285301D A NL 285301DA NL 285301 A NL285301 A NL 285301A
Authority
NL
Netherlands
Application number
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Publication of NL285301A publication Critical patent/NL285301A/xx

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J29/00—Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
    • H01J29/46—Arrangements of electrodes and associated parts for generating or controlling the ray or beam, e.g. electron-optical arrangement
    • H01J29/58—Arrangements for focusing or reflecting ray or beam
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/10—Lenses
    • H01J37/14—Lenses magnetic
    • H01J37/141—Electromagnetic lenses
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/153—Electron-optical or ion-optical arrangements for the correction of image defects, e.g. stigmators

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Electron Beam Exposure (AREA)
  • Electron Sources, Ion Sources (AREA)
NL285301D 1961-11-15 NL285301A (nl)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US152531A US3100260A (en) 1961-11-15 1961-11-15 Electron lens for reduction of spherical aberration

Publications (1)

Publication Number Publication Date
NL285301A true NL285301A (nl)

Family

ID=22543323

Family Applications (1)

Application Number Title Priority Date Filing Date
NL285301D NL285301A (nl) 1961-11-15

Country Status (6)

Country Link
US (1) US3100260A (nl)
CH (1) CH407356A (nl)
DE (1) DE1236097B (nl)
GB (1) GB995387A (nl)
NL (1) NL285301A (nl)
SE (1) SE300852B (nl)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3452241A (en) * 1966-09-06 1969-06-24 Rca Corp Electron gun suitable for electron microscope
DE1905937B1 (de) * 1969-02-06 1971-01-14 Corpuscular Forschungs Stiftun Stigmator zur elektrischen Kompensation von Abbildungsfehlern bei elektronenoptischen Systemen mit Hohlstrahlen und Ringblendenden
DE1937482C3 (de) * 1969-07-23 1974-10-10 Max-Planck-Gesellschaft Zur Foerderung Der Wissenschaften E.V., 3400 Goettingen Mikrostrahlsonde
NL7012387A (nl) * 1970-08-21 1972-02-23 Philips Nv
GB1416043A (en) * 1972-01-28 1975-12-03 Nasa Electron microscope aperture system
US3996468A (en) * 1972-01-28 1976-12-07 Nasa Electron microscope aperture system
US4002912A (en) * 1975-12-30 1977-01-11 The United States Of America As Represented By The United States Energy Research And Development Administration Electrostatic lens to focus an ion beam to uniform density
DE2752598C3 (de) * 1977-11-25 1981-10-15 Dr.-Ing. Rudolf Hell Gmbh, 2300 Kiel Verfahren zum Betrieb einer elektromagnetischen fokussierenden elektronen-optischen Linsenanordnung und Linsenanordnung hierfür
JPS5842935B2 (ja) * 1978-04-07 1983-09-22 日本電子株式会社 走査電子顕微鏡等の対物レンズ
AU534599B2 (en) * 1978-08-25 1984-02-09 Commonwealth Scientific And Industrial Research Organisation Cold cathode ion soirce
JPS6091544A (ja) * 1983-10-24 1985-05-22 Anelva Corp オ−ジエ分析装置
US4725736A (en) * 1986-08-11 1988-02-16 Electron Beam Memories Electrostatic electron gun with integrated electron beam deflection and/or stigmating system
US7947964B2 (en) * 2006-11-21 2011-05-24 Hitachi High-Technologies Corporation Charged particle beam orbit corrector and charged particle beam apparatus
JP5153348B2 (ja) * 2008-01-09 2013-02-27 株式会社日立ハイテクノロジーズ 荷電粒子ビーム軌道補正器及び荷電粒子ビーム装置
JP6747687B2 (ja) * 2014-08-25 2020-08-26 ナショナル ユニヴァーシティー オブ シンガポール 収差補正装置、これを有するデバイス、および荷電粒子の収差を補正するための方法
JP6351196B2 (ja) * 2015-04-27 2018-07-04 国立大学法人名古屋大学 荷電粒子ビーム用電磁レンズの球面収差補正装置
US11798776B2 (en) * 2019-05-15 2023-10-24 Hitachi High-Tech Corporation Charged particle beam apparatus

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL192009A (nl) * 1953-11-02
NL185815B (nl) * 1954-03-11 Bayer Ag Werkwijze voor het bestrijden van micro-organismen alsmede gevormd voortbrengsel, geheel of ten dele bestaande uit materiaal, dat volgens deze werkwijze behandeld is.

Also Published As

Publication number Publication date
CH407356A (de) 1966-02-15
DE1236097B (de) 1967-03-09
US3100260A (en) 1963-08-06
SE300852B (nl) 1968-05-13
GB995387A (en) 1965-06-16

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