NL285301A - - Google Patents
Info
- Publication number
- NL285301A NL285301A NL285301DA NL285301A NL 285301 A NL285301 A NL 285301A NL 285301D A NL285301D A NL 285301DA NL 285301 A NL285301 A NL 285301A
- Authority
- NL
- Netherlands
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J29/00—Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
- H01J29/46—Arrangements of electrodes and associated parts for generating or controlling the ray or beam, e.g. electron-optical arrangement
- H01J29/58—Arrangements for focusing or reflecting ray or beam
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/10—Lenses
- H01J37/14—Lenses magnetic
- H01J37/141—Electromagnetic lenses
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/153—Electron-optical or ion-optical arrangements for the correction of image defects, e.g. stigmators
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Electron Beam Exposure (AREA)
- Electron Sources, Ion Sources (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US152531A US3100260A (en) | 1961-11-15 | 1961-11-15 | Electron lens for reduction of spherical aberration |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| NL285301A true NL285301A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
Family
ID=22543323
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL285301D NL285301A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1961-11-15 |
Country Status (6)
Families Citing this family (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3452241A (en) * | 1966-09-06 | 1969-06-24 | Rca Corp | Electron gun suitable for electron microscope |
| DE1905937B1 (de) * | 1969-02-06 | 1971-01-14 | Corpuscular Forschungs Stiftun | Stigmator zur elektrischen Kompensation von Abbildungsfehlern bei elektronenoptischen Systemen mit Hohlstrahlen und Ringblendenden |
| DE1937482C3 (de) * | 1969-07-23 | 1974-10-10 | Max-Planck-Gesellschaft Zur Foerderung Der Wissenschaften E.V., 3400 Goettingen | Mikrostrahlsonde |
| NL7012387A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 1970-08-21 | 1972-02-23 | Philips Nv | |
| GB1416043A (en) * | 1972-01-28 | 1975-12-03 | Nasa | Electron microscope aperture system |
| US3996468A (en) * | 1972-01-28 | 1976-12-07 | Nasa | Electron microscope aperture system |
| US4002912A (en) * | 1975-12-30 | 1977-01-11 | The United States Of America As Represented By The United States Energy Research And Development Administration | Electrostatic lens to focus an ion beam to uniform density |
| DE2752598C3 (de) * | 1977-11-25 | 1981-10-15 | Dr.-Ing. Rudolf Hell Gmbh, 2300 Kiel | Verfahren zum Betrieb einer elektromagnetischen fokussierenden elektronen-optischen Linsenanordnung und Linsenanordnung hierfür |
| JPS5842935B2 (ja) * | 1978-04-07 | 1983-09-22 | 日本電子株式会社 | 走査電子顕微鏡等の対物レンズ |
| AU534599B2 (en) * | 1978-08-25 | 1984-02-09 | Commonwealth Scientific And Industrial Research Organisation | Cold cathode ion soirce |
| US4438336A (en) | 1982-03-26 | 1984-03-20 | Fraunhofer-Gesellschaft Zur Forderung Der Angewandten Forschung E.V. | Corpuscular radiation device for producing an irradiation pattern on a workpiece |
| JPS6091544A (ja) * | 1983-10-24 | 1985-05-22 | Anelva Corp | オ−ジエ分析装置 |
| US4725736A (en) * | 1986-08-11 | 1988-02-16 | Electron Beam Memories | Electrostatic electron gun with integrated electron beam deflection and/or stigmating system |
| US7947964B2 (en) * | 2006-11-21 | 2011-05-24 | Hitachi High-Technologies Corporation | Charged particle beam orbit corrector and charged particle beam apparatus |
| JP5153348B2 (ja) * | 2008-01-09 | 2013-02-27 | 株式会社日立ハイテクノロジーズ | 荷電粒子ビーム軌道補正器及び荷電粒子ビーム装置 |
| JP6747687B2 (ja) * | 2014-08-25 | 2020-08-26 | ナショナル ユニヴァーシティー オブ シンガポール | 収差補正装置、これを有するデバイス、および荷電粒子の収差を補正するための方法 |
| JP6351196B2 (ja) * | 2015-04-27 | 2018-07-04 | 国立大学法人名古屋大学 | 荷電粒子ビーム用電磁レンズの球面収差補正装置 |
| JP7124216B2 (ja) * | 2019-05-15 | 2022-08-23 | 株式会社日立ハイテク | 荷電粒子線装置 |
| JP2023166336A (ja) * | 2022-05-09 | 2023-11-21 | アイエムエス ナノファブリケーション ゲーエムベーハー | シャント装置を有する調節可能永久磁石レンズ |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL192009A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 1953-11-02 | |||
| NL95815C (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 1954-03-11 |
-
0
- NL NL285301D patent/NL285301A/xx unknown
-
1961
- 1961-11-15 US US152531A patent/US3100260A/en not_active Expired - Lifetime
-
1962
- 1962-11-09 CH CH1314562A patent/CH407356A/de unknown
- 1962-11-13 DE DEP30567A patent/DE1236097B/de active Pending
- 1962-11-14 SE SE12217/62A patent/SE300852B/xx unknown
- 1962-11-14 GB GB43081/62A patent/GB995387A/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| SE300852B (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1968-05-13 |
| CH407356A (de) | 1966-02-15 |
| GB995387A (en) | 1965-06-16 |
| US3100260A (en) | 1963-08-06 |
| DE1236097B (de) | 1967-03-09 |