NL267572A - - Google Patents
Info
- Publication number
- NL267572A NL267572A NL267572DA NL267572A NL 267572 A NL267572 A NL 267572A NL 267572D A NL267572D A NL 267572DA NL 267572 A NL267572 A NL 267572A
- Authority
- NL
- Netherlands
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
- G03F7/322—Aqueous alkaline compositions
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DEK41325A DE1193366B (de) | 1960-07-29 | 1960-07-29 | Entwickler fuer photomechanische Druckformen |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| NL267572A true NL267572A (sv) |
Family
ID=7222372
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL267572D NL267572A (sv) | 1960-07-29 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US3201241A (sv) |
| BE (1) | BE606642A (sv) |
| CH (1) | CH404404A (sv) |
| DE (1) | DE1193366B (sv) |
| GB (1) | GB953925A (sv) |
| NL (1) | NL267572A (sv) |
| SE (1) | SE304444B (sv) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2353992C2 (de) * | 1972-11-02 | 1982-12-02 | Polychrome Corp., 10702 Yonkers, N.Y. | Wäßriger Eintwickler für Flachdruckplatten und dessen Verwendung |
| DE2834958A1 (de) * | 1978-08-10 | 1980-02-21 | Hoechst Ag | Verfahren zum entwickeln von belichteten lichtempfindlichen druckplatten |
| US4330614A (en) * | 1980-10-14 | 1982-05-18 | International Business Machines Corporation | Process for forming a patterned resist mask |
| DE3100259A1 (de) * | 1981-01-08 | 1982-08-05 | Hoechst Ag, 6000 Frankfurt | Verfahren und entwicklergemisch zum entwickeln von belichteten negativ arbeitenden diazoniumsalzschichten |
| US4366224A (en) | 1981-08-06 | 1982-12-28 | American Hoechst Corporation | Inorganic lithium developer composition |
| JPS5854341A (ja) * | 1981-09-28 | 1983-03-31 | Fuji Photo Film Co Ltd | 現像方法および現像液 |
| DE3140186A1 (de) * | 1981-10-09 | 1983-04-28 | Hoechst Ag, 6230 Frankfurt | Entwickler und verfahren zum entwickeln fuer belichtete negativ-arbeitende reproduktionsschichten |
| JPS58190952A (ja) * | 1982-04-30 | 1983-11-08 | Fuji Photo Film Co Ltd | 感光性印刷版の現像液 |
| JPS59121336A (ja) * | 1982-12-28 | 1984-07-13 | Fuji Photo Film Co Ltd | 感光性平版印刷版の現像液 |
| DE3410522A1 (de) * | 1984-03-22 | 1985-10-03 | Hoechst Ag, 6230 Frankfurt | Einbrenngummierung fuer offsetdruckplatten und verfahren zur herstellung einer offsetdruckform |
| DE3439597A1 (de) * | 1984-10-30 | 1986-04-30 | Hoechst Ag, 6230 Frankfurt | Entwickler fuer belichtete negativ arbeitende reproduktionsschichten sowie verfahren zur herstellung von druckformen und verwendung des entwicklers |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2062273A (en) * | 1933-11-28 | 1936-11-24 | Lithographic Technical Fond In | Method for removing colloids from lithographic printing surfaces |
| US2564414A (en) * | 1949-05-14 | 1951-08-14 | Interchem Corp | Developer for bichromated colloids |
| US3046121A (en) * | 1949-07-23 | 1962-07-24 | Azoplate Corp | Process for the manufacture of printing plates and light-sensitive material suttablefor use therein |
| NL80569C (sv) * | 1949-07-23 | |||
| BE506677A (sv) * | 1950-10-31 | |||
| CH307356A (de) * | 1951-08-08 | 1955-05-31 | Kalle & Co Ag | Lichtempfindliches Material für die photomechanische Reproduktion. |
| US2732299A (en) * | 1952-07-22 | 1956-01-24 | Light sensitive | |
| BE559609A (sv) * | 1954-04-05 | |||
| US2931724A (en) * | 1956-10-22 | 1960-04-05 | Oscar D Lantz | Correction fluid and method for correcting blueprints |
| US2958599A (en) * | 1958-02-14 | 1960-11-01 | Azoplate Corp | Diazo compounds and printing plates manufactured therefrom |
-
0
- BE BE606642D patent/BE606642A/xx unknown
- NL NL267572D patent/NL267572A/xx unknown
-
1960
- 1960-07-29 DE DEK41325A patent/DE1193366B/de active Pending
-
1961
- 1961-07-11 US US123114A patent/US3201241A/en not_active Expired - Lifetime
- 1961-07-24 GB GB26737/61A patent/GB953925A/en not_active Expired
- 1961-07-27 SE SE7706/61A patent/SE304444B/xx unknown
- 1961-07-27 CH CH883161A patent/CH404404A/de unknown
Also Published As
| Publication number | Publication date |
|---|---|
| SE304444B (sv) | 1968-09-23 |
| US3201241A (en) | 1965-08-17 |
| DE1193366B (de) | 1965-05-20 |
| GB953925A (en) | 1964-04-02 |
| CH404404A (de) | 1965-12-15 |
| BE606642A (sv) |