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1963-06-20 |
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1963-08-23 |
1966-09-01 |
Kalle Ag |
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1963-12-03 |
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1963-12-09 |
1967-12-19 |
Shipley Company |
Light-sensitive material and process for the development thereof
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1964-03-06 |
1969-02-20 |
Basf Ag |
Verfahren zum Herstellen von Druckformen
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1964-08-05 |
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1965-03-22 |
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1965-12-17 |
1971-07-29 |
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Vorsensibilisierte, positiv arbeitende Flachdruckplatte
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1966-12-12 |
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1969-09-12 |
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1970-10-06 |
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1971-11-09 |
1977-10-04 |
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1972-11-09 |
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1972-10-17 |
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1973-01-30 |
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1973-02-12 |
1976-04-13 |
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1974-02-25 |
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1974-03-05 |
1976-09-28 |
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1974-03-19 |
1979-09-25 |
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Light-sensitive printing plate with matt overlayer
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1974-03-19 |
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1974-05-01 |
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1974-06-06 |
1977-02-08 |
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1974-08-26 |
1976-05-25 |
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1974-10-04 |
1976-09-07 |
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1974-10-09 |
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1975-04-29 |
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American Hoechst Corporation |
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1975-05-24 |
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1976-03-19 |
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1976-06-30 |
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1977-12-30 |
1980-07-08 |
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Method of using a o-quinone diazide sensitized phenol-formaldehyde resist as a deep ultraviolet light exposure mask
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1978-02-15 |
1979-09-14 |
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Nouveau support de plaques lithographiques et procede de mise en oeuvre
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1978-11-02 |
1980-05-10 |
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1979-12-03 |
1981-08-18 |
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1981-01-07 |
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1981-10-02 |
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Positive type photosensitive resin composition with at least two o-quinone diazides
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1982-06-03 |
1983-12-08 |
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1983-06-29 |
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Hoechst Ag, 6230 Frankfurt |
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1983-09-08 |
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1987-08-12 |
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