NL254616A - - Google Patents
Info
- Publication number
- NL254616A NL254616A NL254616DA NL254616A NL 254616 A NL254616 A NL 254616A NL 254616D A NL254616D A NL 254616DA NL 254616 A NL254616 A NL 254616A
- Authority
- NL
- Netherlands
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DEK0038378 | 1959-08-05 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| NL254616A true NL254616A (en:Method) |
Family
ID=7221358
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL254616D NL254616A (en:Method) | 1959-08-05 | ||
| NL130471D NL130471C (en:Method) | 1959-08-05 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL130471D NL130471C (en:Method) | 1959-08-05 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US3102809A (en:Method) |
| BE (1) | BE593836A (en:Method) |
| CH (1) | CH381985A (en:Method) |
| GB (1) | GB941914A (en:Method) |
| NL (2) | NL130471C (en:Method) |
Families Citing this family (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4024122A (en) * | 1973-02-12 | 1977-05-17 | Rca Corporation | Method of purifying 2,4-bis(6-diazo-5,6-dihydro-5-oxo-1-naphthalenesulfonyloxy benzophenone) |
| DE2547905C2 (de) * | 1975-10-25 | 1985-11-21 | Hoechst Ag, 6230 Frankfurt | Lichtempfindliches Aufzeichnungsmaterial |
| JPS60163043A (ja) * | 1984-02-06 | 1985-08-24 | Japan Synthetic Rubber Co Ltd | ポジ型感光性樹脂組成物 |
| DE3686032T2 (de) * | 1985-12-27 | 1993-02-18 | Japan Synthetic Rubber Co Ltd | Strahlungsempfindliche positiv arbeitende kunststoffzusammensetzung. |
| JPS63178228A (ja) * | 1987-01-20 | 1988-07-22 | Fuji Photo Film Co Ltd | ポジ型フオトレジスト組成物 |
| US5219700A (en) * | 1988-10-03 | 1993-06-15 | Mitsubishi Kasei Corporation | Photosensitive composition containing 1,2-naphthoquinone-2-diazido-4-sulfonic acid ester, alkali-soluble resin, halomethyloxadiazole compound and a dye |
| DE69029104T2 (de) | 1989-07-12 | 1997-03-20 | Fuji Photo Film Co Ltd | Polysiloxane und positiv arbeitende Resistmasse |
| JP2639853B2 (ja) * | 1990-05-18 | 1997-08-13 | 富士写真フイルム株式会社 | 新規キノンジアジド化合物及びそれを含有する感光性組成物 |
| JP2976597B2 (ja) * | 1991-04-17 | 1999-11-10 | 住友化学工業株式会社 | キノンジアジドスルホン酸エステルの製造方法 |
| JP2944296B2 (ja) | 1992-04-06 | 1999-08-30 | 富士写真フイルム株式会社 | 感光性平版印刷版の製造方法 |
| JPH0876380A (ja) | 1994-09-06 | 1996-03-22 | Fuji Photo Film Co Ltd | ポジ型印刷版組成物 |
| JP3278306B2 (ja) | 1994-10-31 | 2002-04-30 | 富士写真フイルム株式会社 | ポジ型フォトレジスト組成物 |
| EP0887182B1 (en) | 1996-04-23 | 2002-07-24 | Kodak Polychrome Graphics Company Ltd. | Heat-sensitive composition for making a lithographic printing form precursor |
| US6117610A (en) * | 1997-08-08 | 2000-09-12 | Kodak Polychrome Graphics Llc | Infrared-sensitive diazonaphthoquinone imaging composition and element containing non-basic IR absorbing material and methods of use |
| GB9622657D0 (en) | 1996-10-31 | 1997-01-08 | Horsell Graphic Ind Ltd | Direct positive lithographic plate |
| US6090532A (en) * | 1997-03-21 | 2000-07-18 | Kodak Polychrome Graphics Llc | Positive-working infrared radiation sensitive composition and printing plate and imaging method |
| US6063544A (en) * | 1997-03-21 | 2000-05-16 | Kodak Polychrome Graphics Llc | Positive-working printing plate and method of providing a positive image therefrom using laser imaging |
| WO1999001795A2 (en) | 1997-07-05 | 1999-01-14 | Kodak Polychrome Graphics Company Ltd. | Pattern-forming methods and radiation sensitive materials |
| US6060217A (en) * | 1997-09-02 | 2000-05-09 | Kodak Polychrome Graphics Llc | Thermal lithographic printing plates |
| US6045963A (en) * | 1998-03-17 | 2000-04-04 | Kodak Polychrome Graphics Llc | Negative-working dry planographic printing plate |
| US6296982B1 (en) | 1999-11-19 | 2001-10-02 | Kodak Polychrome Graphics Llc | Imaging articles |
| US11675266B2 (en) | 2021-04-15 | 2023-06-13 | Industrial Technology Research Institute | Photosensitive compound, photosensitive composition, and patterning method |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| BE510151A (en:Method) * | 1949-07-23 | |||
| US2702243A (en) * | 1950-06-17 | 1955-02-15 | Azoplate Corp | Light-sensitive photographic element and process of producing printing plates |
| NL77540C (en:Method) * | 1950-12-23 | |||
| NL185407B (nl) * | 1953-03-11 | Mitsui Petrochemical Ind | Werkwijze voor het polymeriseren of copolymeriseren van 1-alkenen alsmede katalysatorsamenstelling voor toepassing van deze werkwijze. |
-
0
- NL NL254616D patent/NL254616A/xx unknown
- NL NL130471D patent/NL130471C/xx active
- BE BE593836D patent/BE593836A/xx unknown
-
1960
- 1960-07-21 US US44254A patent/US3102809A/en not_active Expired - Lifetime
- 1960-07-29 GB GB26480/60A patent/GB941914A/en not_active Expired
- 1960-08-01 CH CH874460A patent/CH381985A/de unknown
Also Published As
| Publication number | Publication date |
|---|---|
| BE593836A (en:Method) | |
| DE1422473B2 (de) | 1972-09-28 |
| DE1422473A1 (de) | 1968-10-24 |
| NL130471C (en:Method) | |
| CH381985A (de) | 1964-09-15 |
| US3102809A (en) | 1963-09-03 |
| GB941914A (en) | 1963-11-13 |