NL2024679A - Metrology device and phase modulator apparatus therefor - Google Patents

Metrology device and phase modulator apparatus therefor Download PDF

Info

Publication number
NL2024679A
NL2024679A NL2024679A NL2024679A NL2024679A NL 2024679 A NL2024679 A NL 2024679A NL 2024679 A NL2024679 A NL 2024679A NL 2024679 A NL2024679 A NL 2024679A NL 2024679 A NL2024679 A NL 2024679A
Authority
NL
Netherlands
Prior art keywords
alignment
grating
phase modulator
substrate
diffraction
Prior art date
Application number
NL2024679A
Other languages
English (en)
Inventor
Reinald Huisman Simon
Jeffrey Den Boef Arie
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=69457742&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=NL2024679(A) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Priority to NL2024679A priority Critical patent/NL2024679A/en
Publication of NL2024679A publication Critical patent/NL2024679A/en

Links

Claims (1)

  1. CONCLUSIE
    1. Een inrichting ingericht voor het belichten van een substraat.
NL2024679A 2020-01-15 2020-01-15 Metrology device and phase modulator apparatus therefor NL2024679A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
NL2024679A NL2024679A (en) 2020-01-15 2020-01-15 Metrology device and phase modulator apparatus therefor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL2024679A NL2024679A (en) 2020-01-15 2020-01-15 Metrology device and phase modulator apparatus therefor

Publications (1)

Publication Number Publication Date
NL2024679A true NL2024679A (en) 2020-02-10

Family

ID=69457742

Family Applications (1)

Application Number Title Priority Date Filing Date
NL2024679A NL2024679A (en) 2020-01-15 2020-01-15 Metrology device and phase modulator apparatus therefor

Country Status (1)

Country Link
NL (1) NL2024679A (nl)

Similar Documents

Publication Publication Date Title
EP3853666B1 (en) Metrology sensor for position metrology
US11092900B2 (en) Method and apparatus for measuring a parameter of a lithographic process, substrate and patterning devices for use in the method
TWI428705B (zh) 檢驗裝置、微影裝置、微影製程單元及檢驗方法
JP5280555B2 (ja) 検査装置および方法、リソグラフィ装置、リソグラフィ処理セル、およびデバイス製造方法
JP5288808B2 (ja) 測定方法、検査装置およびリソグラフィ装置
TWI405046B (zh) 評估模型之方法，檢查裝置及微影裝置
EP2275871B1 (en) Position Calibration of Alignment Heads in a Multi-Head Alignment System
JP4980264B2 (ja) 検査方法、デバイス製造方法、検査装置、基板、マスク、リソグラフィ装置、及びリソグラフィセル
TWI493296B (zh) 檢查方法和裝置、微影裝置、微影製程單元及元件製造方法
CN102027416B (zh) 用于光刻术的检查设备
TWI500094B (zh) 在基板上量測標的的次波長區段
JP2008166734A (ja) インスペクション方法および装置、リソグラフィ装置、リソグラフィ処理セルおよびデバイス製造方法
JP2008047900A (ja) 角度分解分光リソグラフィキャラクタライゼーションのための方法および装置
JP2009002931A (ja) 計測ツールのキャリブレーションに使用する基板を形成する方法、キャリブレーション基板および計測ツールをキャリブレーションする方法
US11428925B2 (en) Position metrology apparatus and associated optical elements
JP2011023726A (ja) 物体アライメント測定方法及び装置
US10866526B2 (en) Metrology method and device
CN110603492B (zh) 量测传感器、光刻装置以及用于制造器件的方法
JP2011176309A (ja) リソグラフィ装置及びデバイス製造方法
WO2010025793A1 (en) A substrate, a method of measuring a property, an inspection apparatus and a lithographic apparatus
TWI467346B (zh) 決定特性之方法
US11815675B2 (en) Metrology device and phase modulator apparatus therefor comprising a first moving grating and a first compensatory grating element
NL2024679A (en) Metrology device and phase modulator apparatus therefor
EP3715951A1 (en) Position metrology apparatus and associated optical elements