NL2024435A - Reticle sub-field thermal control - Google Patents
Reticle sub-field thermal control Download PDFInfo
- Publication number
- NL2024435A NL2024435A NL2024435A NL2024435A NL2024435A NL 2024435 A NL2024435 A NL 2024435A NL 2024435 A NL2024435 A NL 2024435A NL 2024435 A NL2024435 A NL 2024435A NL 2024435 A NL2024435 A NL 2024435A
- Authority
- NL
- Netherlands
- Prior art keywords
- clamp
- reticle
- sub
- gas
- distribution
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
- G03F7/70875—Temperature, e.g. temperature control of masks or workpieces via control of stage temperature
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Atmospheric Sciences (AREA)
- Toxicology (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Claims (1)
1. Een inrichting ingericht voor het belichten van een substraat.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201862783884P | 2018-12-21 | 2018-12-21 |
Publications (1)
Publication Number | Publication Date |
---|---|
NL2024435A true NL2024435A (en) | 2020-07-07 |
Family
ID=69105776
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NL2024435A NL2024435A (en) | 2018-12-21 | 2019-12-12 | Reticle sub-field thermal control |
Country Status (8)
Country | Link |
---|---|
US (1) | US11500298B2 (nl) |
EP (1) | EP3899666A1 (nl) |
KR (1) | KR20210105903A (nl) |
CN (1) | CN113168123A (nl) |
IL (1) | IL283621A (nl) |
NL (1) | NL2024435A (nl) |
TW (1) | TW202032739A (nl) |
WO (1) | WO2020126807A1 (nl) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN115380251A (zh) * | 2020-03-31 | 2022-11-22 | Asml荷兰有限公司 | 用于制备衬底的方法和光刻设备 |
US20220382168A1 (en) * | 2021-05-28 | 2022-12-01 | Taiwan Semiconductor Manufacturing Company, Ltd. | Method of manufacturing semiconductor devices using a photomask |
US11815810B2 (en) * | 2021-09-22 | 2023-11-14 | Intel Corporation | Measurement tool and methods for EUV lithography masks |
US11693326B1 (en) * | 2022-03-11 | 2023-07-04 | Taiwan Semiconductor Manufacturing Company, Ltd. | System and method for dynamically controlling temperature of thermostatic reticles |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7088431B2 (en) * | 2003-12-17 | 2006-08-08 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
SG186621A1 (en) * | 2004-06-09 | 2013-01-30 | Nikon Corp | Substrate holding device, exposure apparatus having same, exposure method, method for producing device, and liquid repellent plate |
US7304715B2 (en) * | 2004-08-13 | 2007-12-04 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
JP2008066295A (ja) * | 2006-08-08 | 2008-03-21 | Sumitomo Electric Ind Ltd | 発熱体回路パターン、それを搭載したサセプタ及び半導体製造装置 |
JP2010521820A (ja) | 2007-03-12 | 2010-06-24 | 東京エレクトロン株式会社 | 基板内での処理の均一性を改善するための動的な温度背面ガス制御 |
NL2006674A (en) * | 2010-08-02 | 2012-02-06 | Asml Holding Nv | Reticle cooling in a lithographic apparatus. |
NL2009189A (en) * | 2011-08-17 | 2013-02-19 | Asml Netherlands Bv | Support table for a lithographic apparatus, lithographic apparatus and device manufacturing method. |
SG188036A1 (en) | 2011-08-18 | 2013-03-28 | Asml Netherlands Bv | Lithographic apparatus, support table for a lithographic apparatus and device manufacturing method |
US9541846B2 (en) | 2013-09-06 | 2017-01-10 | Taiwan Semiconductor Manufacturing Co., Ltd. | Homogeneous thermal equalization with active device |
US20180213608A1 (en) | 2017-01-20 | 2018-07-26 | Applied Materials, Inc. | Electrostatic chuck with radio frequency isolated heaters |
US11081383B2 (en) * | 2017-11-24 | 2021-08-03 | Taiwan Semiconductor Manufacturing Co., Ltd. | Substrate table with vacuum channels grid |
-
2019
- 2019-12-12 US US17/415,715 patent/US11500298B2/en active Active
- 2019-12-12 EP EP19832006.1A patent/EP3899666A1/en active Pending
- 2019-12-12 NL NL2024435A patent/NL2024435A/en unknown
- 2019-12-12 CN CN201980082729.9A patent/CN113168123A/zh active Pending
- 2019-12-12 WO PCT/EP2019/084848 patent/WO2020126807A1/en unknown
- 2019-12-12 KR KR1020217019152A patent/KR20210105903A/ko active Search and Examination
- 2019-12-17 TW TW108146148A patent/TW202032739A/zh unknown
-
2021
- 2021-06-01 IL IL283621A patent/IL283621A/en unknown
Also Published As
Publication number | Publication date |
---|---|
KR20210105903A (ko) | 2021-08-27 |
CN113168123A (zh) | 2021-07-23 |
US11500298B2 (en) | 2022-11-15 |
IL283621A (en) | 2021-07-29 |
US20220057723A1 (en) | 2022-02-24 |
EP3899666A1 (en) | 2021-10-27 |
TW202032739A (zh) | 2020-09-01 |
WO2020126807A1 (en) | 2020-06-25 |
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