NL2023669A - Apparatus and method for measuring a position of alignment marks - Google Patents
Apparatus and method for measuring a position of alignment marks Download PDFInfo
- Publication number
- NL2023669A NL2023669A NL2023669A NL2023669A NL2023669A NL 2023669 A NL2023669 A NL 2023669A NL 2023669 A NL2023669 A NL 2023669A NL 2023669 A NL2023669 A NL 2023669A NL 2023669 A NL2023669 A NL 2023669A
- Authority
- NL
- Netherlands
- Prior art keywords
- alignment marks
- alignment
- substrate
- images
- sensing element
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7049—Technique, e.g. interferometric
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7069—Alignment mark illumination, e.g. darkfield, dual focus
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Multimedia (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP18189668 | 2018-08-20 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| NL2023669A true NL2023669A (en) | 2020-02-26 |
Family
ID=63311868
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL2023669A NL2023669A (en) | 2018-08-20 | 2019-08-20 | Apparatus and method for measuring a position of alignment marks |
Country Status (3)
| Country | Link |
|---|---|
| CN (1) | CN112639623B (fr) |
| NL (1) | NL2023669A (fr) |
| WO (1) | WO2020038629A1 (fr) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2021115735A1 (fr) | 2019-12-12 | 2021-06-17 | Asml Netherlands B.V. | Procédé d'alignement et appareils lithographiques et d'alignement associés |
| WO2021156069A1 (fr) * | 2020-02-05 | 2021-08-12 | Asml Holding N.V. | Appareil de détection de marques d'alignement |
| WO2023126173A1 (fr) * | 2021-12-28 | 2023-07-06 | Asml Netherlands B.V. | Système optique mis en œuvre dans un système d'inspection optique rapide de cibles |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE60319462T2 (de) | 2002-06-11 | 2009-03-12 | Asml Netherlands B.V. | Lithographischer Apparat und Verfahren zur Herstellung eines Artikels |
| SG135052A1 (en) | 2002-11-12 | 2007-09-28 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method |
| KR100688982B1 (ko) * | 2005-08-04 | 2007-03-08 | 삼성전자주식회사 | 광학 멀티플렉서 |
| CN1949087B (zh) * | 2006-11-03 | 2010-05-12 | 上海微电子装备有限公司 | 一种光刻装置的对准系统以及该对准系统的级结合系统 |
| NL1036476A1 (nl) | 2008-02-01 | 2009-08-04 | Asml Netherlands Bv | Alignment mark and a method of aligning a substrate comprising such an alignment mark. |
| JP5637931B2 (ja) * | 2011-05-17 | 2014-12-10 | キヤノン株式会社 | インプリント装置、インプリント方法およびデバイス製造方法 |
| WO2014019846A2 (fr) | 2012-07-30 | 2014-02-06 | Asml Netherlands B.V. | Appareil de mesure de positions, procédé de mesure de positions, appareil lithographique, et procédé de fabrication de dispositif |
| CN104111594B (zh) * | 2013-04-16 | 2016-09-28 | 上海微电子装备有限公司 | 基于信号频率的二维自参考干涉对准系统及对准方法 |
| JP6347849B2 (ja) * | 2014-03-12 | 2018-06-27 | エーエスエムエル ネザーランズ ビー．ブイ． | センサシステム、基板ハンドリングシステムおよびリソグラフィ装置 |
| CN105988309B (zh) * | 2015-02-26 | 2019-01-18 | 上海微电子装备（集团）股份有限公司 | 一种用于光刻设备的对准装置及对准方法 |
| WO2016192865A1 (fr) * | 2015-06-05 | 2016-12-08 | Asml Netherlands B.V. | Système d'alignement |
| CN106772988A (zh) * | 2017-03-28 | 2017-05-31 | 江苏京创先进电子科技有限公司 | 切割机双显微镜系统及其工作过程 |
-
2019
- 2019-06-27 CN CN201980054293.2A patent/CN112639623B/zh active Active
- 2019-06-27 WO PCT/EP2019/067110 patent/WO2020038629A1/fr active Application Filing
- 2019-08-20 NL NL2023669A patent/NL2023669A/en unknown
Also Published As
| Publication number | Publication date |
|---|---|
| CN112639623A (zh) | 2021-04-09 |
| WO2020038629A1 (fr) | 2020-02-27 |
| CN112639623B (zh) | 2024-05-14 |
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