WO2020038629A1 - Appareil et procédé de mesure d'une position de marques d'alignement - Google Patents

Appareil et procédé de mesure d'une position de marques d'alignement Download PDF

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Publication number
WO2020038629A1
WO2020038629A1 PCT/EP2019/067110 EP2019067110W WO2020038629A1 WO 2020038629 A1 WO2020038629 A1 WO 2020038629A1 EP 2019067110 W EP2019067110 W EP 2019067110W WO 2020038629 A1 WO2020038629 A1 WO 2020038629A1
Authority
WO
WIPO (PCT)
Prior art keywords
alignment marks
images
alignment
substrate
sensing element
Prior art date
Application number
PCT/EP2019/067110
Other languages
English (en)
Inventor
Oleg Viacheslavovich VOZNYI
Original Assignee
Asml Netherlands B.V.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands B.V. filed Critical Asml Netherlands B.V.
Priority to CN201980054293.2A priority Critical patent/CN112639623A/zh
Publication of WO2020038629A1 publication Critical patent/WO2020038629A1/fr

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7049—Technique, e.g. interferometric
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7069—Alignment mark illumination, e.g. darkfield, dual focus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection

Abstract

La présente invention concerne un appareil servant à mesurer une position de chaque marque d'une pluralité de marques d'alignement sur un substrat. Cet appareil comprend : un système d'éclairage conçu pour diriger un faisceau de rayonnement provenant d'une source de rayonnement sur la pluralité de marques d'alignement sur le substrat, un système de projection conçu pour projeter des images de la pluralité de marques d'alignement du substrat, les images de la pluralité de marques d'alignement étant produites par la diffraction du faisceau de rayonnement par la pluralité de marques d'alignement ; un bloc optique conçu pour moduler les images de la pluralité de marques d'alignement projetées à partir du substrat, le bloc optique étant conçu pour projeter les images modulées de la pluralité de marques d'alignement sur un élément de détection pour produire des signaux à partir desquels la position de chaque marque de la pluralité de marques d'alignement est déterminée en parallèle.
PCT/EP2019/067110 2018-08-20 2019-06-27 Appareil et procédé de mesure d'une position de marques d'alignement WO2020038629A1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201980054293.2A CN112639623A (zh) 2018-08-20 2019-06-27 用于测量对准标记的位置的设备和方法

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP18189668 2018-08-20
EP18189668.9 2018-08-20

Publications (1)

Publication Number Publication Date
WO2020038629A1 true WO2020038629A1 (fr) 2020-02-27

Family

ID=63311868

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2019/067110 WO2020038629A1 (fr) 2018-08-20 2019-06-27 Appareil et procédé de mesure d'une position de marques d'alignement

Country Status (3)

Country Link
CN (1) CN112639623A (fr)
NL (1) NL2023669A (fr)
WO (1) WO2020038629A1 (fr)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2021156069A1 (fr) * 2020-02-05 2021-08-12 Asml Holding N.V. Appareil de détection de marques d'alignement
WO2023126173A1 (fr) * 2021-12-28 2023-07-06 Asml Netherlands B.V. Système optique mis en œuvre dans un système d'inspection optique rapide de cibles
US11927892B2 (en) 2019-12-12 2024-03-12 Asml Netherlands B.V. Alignment method and associated alignment and lithographic apparatuses

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6952253B2 (en) 2002-11-12 2005-10-04 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US6961116B2 (en) 2002-06-11 2005-11-01 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method, and device manufactured thereby
WO2008052405A1 (fr) * 2006-11-03 2008-05-08 Shanghai Micro Electronics Equipment Co., Ltd. Systeme d'alignement mis en œuvre dans un appareil lithographique et systeme de combinaison d'ordres de diffraction mis en œuvre dans le systeme d'alignement
US20090195768A1 (en) 2008-02-01 2009-08-06 Asml Netherlands B.V. Alignment Mark and a Method of Aligning a Substrate Comprising Such an Alignment Mark
US20150261097A1 (en) 2012-07-30 2015-09-17 Asml Netherlands B.V. Position Measuring Apparatus, Position Measuring Method, Lithographic Apparatus and Device Manufacturing Method
CN104111594B (zh) * 2013-04-16 2016-09-28 上海微电子装备有限公司 基于信号频率的二维自参考干涉对准系统及对准方法
US20180149987A1 (en) * 2015-06-05 2018-05-31 Asml Netherlands B.V. Alignment system

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100688982B1 (ko) * 2005-08-04 2007-03-08 삼성전자주식회사 광학 멀티플렉서
JP5637931B2 (ja) * 2011-05-17 2014-12-10 キヤノン株式会社 インプリント装置、インプリント方法およびデバイス製造方法
JP6347849B2 (ja) * 2014-03-12 2018-06-27 エーエスエムエル ネザーランズ ビー．ブイ． センサシステム、基板ハンドリングシステムおよびリソグラフィ装置
CN105988309B (zh) * 2015-02-26 2019-01-18 上海微电子装备（集团）股份有限公司 一种用于光刻设备的对准装置及对准方法
CN106772988A (zh) * 2017-03-28 2017-05-31 江苏京创先进电子科技有限公司 切割机双显微镜系统及其工作过程

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6961116B2 (en) 2002-06-11 2005-11-01 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method, and device manufactured thereby
US6952253B2 (en) 2002-11-12 2005-10-04 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
WO2008052405A1 (fr) * 2006-11-03 2008-05-08 Shanghai Micro Electronics Equipment Co., Ltd. Systeme d'alignement mis en œuvre dans un appareil lithographique et systeme de combinaison d'ordres de diffraction mis en œuvre dans le systeme d'alignement
US20090195768A1 (en) 2008-02-01 2009-08-06 Asml Netherlands B.V. Alignment Mark and a Method of Aligning a Substrate Comprising Such an Alignment Mark
US20150261097A1 (en) 2012-07-30 2015-09-17 Asml Netherlands B.V. Position Measuring Apparatus, Position Measuring Method, Lithographic Apparatus and Device Manufacturing Method
CN104111594B (zh) * 2013-04-16 2016-09-28 上海微电子装备有限公司 基于信号频率的二维自参考干涉对准系统及对准方法
US20180149987A1 (en) * 2015-06-05 2018-05-31 Asml Netherlands B.V. Alignment system

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11927892B2 (en) 2019-12-12 2024-03-12 Asml Netherlands B.V. Alignment method and associated alignment and lithographic apparatuses
WO2021156069A1 (fr) * 2020-02-05 2021-08-12 Asml Holding N.V. Appareil de détection de marques d'alignement
US11841628B2 (en) 2020-02-05 2023-12-12 Asml Holding N.V. Apparatus for and method of sensing alignment marks
WO2023126173A1 (fr) * 2021-12-28 2023-07-06 Asml Netherlands B.V. Système optique mis en œuvre dans un système d'inspection optique rapide de cibles

Also Published As

Publication number Publication date
CN112639623A (zh) 2021-04-09
NL2023669A (en) 2020-02-26

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