NL2020970A - A System for Cleaning a Substrate Support, a Method of Removing Matter from a Substrate Support, and a Lithographic Apparatus - Google Patents
A System for Cleaning a Substrate Support, a Method of Removing Matter from a Substrate Support, and a Lithographic ApparatusInfo
- Publication number
- NL2020970A NL2020970A NL2020970A NL2020970A NL2020970A NL 2020970 A NL2020970 A NL 2020970A NL 2020970 A NL2020970 A NL 2020970A NL 2020970 A NL2020970 A NL 2020970A NL 2020970 A NL2020970 A NL 2020970A
- Authority
- NL
- Netherlands
- Prior art keywords
- substrate support
- cleaning
- treatment tool
- projections
- lithographic device
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
- G03F7/70925—Cleaning, i.e. actively freeing apparatus from pollutants, e.g. using plasma cleaning
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
Landscapes
- Physics & Mathematics (AREA)
- Epidemiology (AREA)
- Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Public Health (AREA)
- General Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Life Sciences & Earth Sciences (AREA)
- Atmospheric Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Abstract
A system for cleaning a substrate support comprising a plurality of projections extending in a first direction each with a terminal surface arranged to be in contact with the substrate, the system comprising: a treatment tool arranged for relative movement in a second direction orthogonal to the 5 first direction and a third direction orthogonal to the first direction and the second direction over the terminal surfaces of the projections thereby to remove matter from the substrate support; a controller adapted to control the treatment tool dependent upon a position in the second and third directions of the treatment tool relative to the substrate support such that the removal amount from each of the plurality of projections is maintained substantially constant from one projection to another. 10
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP17175095 | 2017-06-08 |
Publications (1)
Publication Number | Publication Date |
---|---|
NL2020970A true NL2020970A (nl) | 2018-12-13 |
Family
ID=59034540
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NL2020970A NL2020970A (nl) | 2017-06-08 | 2018-05-23 | A System for Cleaning a Substrate Support, a Method of Removing Matter from a Substrate Support, and a Lithographic Apparatus |
Country Status (3)
Country | Link |
---|---|
US (1) | US20200103770A1 (nl) |
NL (1) | NL2020970A (nl) |
WO (1) | WO2018224303A1 (nl) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2022223277A1 (en) | 2021-04-21 | 2022-10-27 | Asml Netherlands B.V. | Surface treatment device and method |
EP4080285A1 (en) | 2021-04-21 | 2022-10-26 | ASML Netherlands B.V. | Surface treatment device |
EP4318133A1 (en) | 2022-08-05 | 2024-02-07 | ASML Netherlands B.V. | System, apparatus and method for selective surface treatment |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2868652B2 (ja) * | 1991-09-24 | 1999-03-10 | キヤノン株式会社 | 半導体露光装置 |
JP3441956B2 (ja) * | 1998-02-16 | 2003-09-02 | キヤノン株式会社 | 露光装置、クリーニング用砥石およびデバイス製造方法 |
EP1507172A1 (en) * | 2003-08-12 | 2005-02-16 | ASML Netherlands B.V. | Lithographic apparatus and apparatus adjustment method |
EP3221750A1 (en) | 2014-11-23 | 2017-09-27 | M Cubed Technologies | Wafer pin chuck fabrication and repair |
-
2018
- 2018-05-23 NL NL2020970A patent/NL2020970A/nl unknown
- 2018-05-23 US US16/615,868 patent/US20200103770A1/en not_active Abandoned
- 2018-05-23 WO PCT/EP2018/063447 patent/WO2018224303A1/en active Application Filing
Also Published As
Publication number | Publication date |
---|---|
WO2018224303A1 (en) | 2018-12-13 |
US20200103770A1 (en) | 2020-04-02 |
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