BR112022003132A2 - Método e sistema de gravação para gravar uma estrutura de relevo de superfície queimada em um substrato - Google Patents

Método e sistema de gravação para gravar uma estrutura de relevo de superfície queimada em um substrato

Info

Publication number
BR112022003132A2
BR112022003132A2 BR112022003132A BR112022003132A BR112022003132A2 BR 112022003132 A2 BR112022003132 A2 BR 112022003132A2 BR 112022003132 A BR112022003132 A BR 112022003132A BR 112022003132 A BR112022003132 A BR 112022003132A BR 112022003132 A2 BR112022003132 A2 BR 112022003132A2
Authority
BR
Brazil
Prior art keywords
engraving
substrate
relief structure
surface relief
structure onto
Prior art date
Application number
BR112022003132A
Other languages
English (en)
Other versions
BR112022003132B1 (pt
Inventor
Ian Sturland
Macken Ian
Mark Venables
Rory Mills
Tracey Hawke
Original Assignee
Bae Systems Plc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from GBGB1911981.7A external-priority patent/GB201911981D0/en
Priority claimed from EP19275136.0A external-priority patent/EP3828602A1/en
Application filed by Bae Systems Plc filed Critical Bae Systems Plc
Publication of BR112022003132A2 publication Critical patent/BR112022003132A2/pt
Publication of BR112022003132B1 publication Critical patent/BR112022003132B1/pt

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/001—Phase modulating patterns, e.g. refractive index patterns
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C3/00—Apparatus in which the work is brought into contact with a bulk quantity of liquid or other fluent material
    • B05C3/02—Apparatus in which the work is brought into contact with a bulk quantity of liquid or other fluent material the work being immersed in the liquid or other fluent material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/18—Processes for applying liquids or other fluent materials performed by dipping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00436—Shaping materials, i.e. techniques for structuring the substrate or the layers on the substrate
    • B81C1/00523—Etching material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00436—Shaping materials, i.e. techniques for structuring the substrate or the layers on the substrate
    • B81C1/00523—Etching material
    • B81C1/00539—Wet etching
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00436—Shaping materials, i.e. techniques for structuring the substrate or the layers on the substrate
    • B81C1/00555—Achieving a desired geometry, i.e. controlling etch rates, anisotropy or selectivity
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00436—Shaping materials, i.e. techniques for structuring the substrate or the layers on the substrate
    • B81C1/00555—Achieving a desired geometry, i.e. controlling etch rates, anisotropy or selectivity
    • B81C1/00626—Processes for achieving a desired geometry not provided for in groups B81C1/00563 - B81C1/00619
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00436—Shaping materials, i.e. techniques for structuring the substrate or the layers on the substrate
    • B81C1/00634—Processes for shaping materials not provided for in groups B81C1/00444 - B81C1/00626
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1847—Manufacturing methods
    • G02B5/1857—Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/13—Integrated optical circuits characterised by the manufacturing method
    • G02B6/136—Integrated optical circuits characterised by the manufacturing method by etching
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor

Abstract

um método e aparelho para a gravação de características de profundidade variável em um substrato são descritos. o movimento do substrato em relação a um decapante (por exemplo, para dentro ou para fora do decapante) durante o processo de gravação é utilizado para prover um tempo de decapagem variável e, portanto, profundidade, por todo o substrato e, em vários exemplos, isso é habilitado sem exigir uma máscara variável.
BR112022003132-7A 2019-08-21 2020-08-20 Método e sistema de gravação para gravar uma estrutura de relevo de superfície queimada em um substrato BR112022003132B1 (pt)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
GB1911981.7 2019-08-21
GBGB1911981.7A GB201911981D0 (en) 2019-08-21 2019-08-21 Manufacture of surface relief structure
EP19275136.0A EP3828602A1 (en) 2019-11-28 2019-11-28 Manufacture of surface relief structures
EP19275136.0 2019-11-28
PCT/GB2020/051997 WO2021032983A1 (en) 2019-08-21 2020-08-20 Manufacture of surface relief structures

Publications (2)

Publication Number Publication Date
BR112022003132A2 true BR112022003132A2 (pt) 2022-05-17
BR112022003132B1 BR112022003132B1 (pt) 2023-10-31

Family

ID=72243161

Family Applications (1)

Application Number Title Priority Date Filing Date
BR112022003132-7A BR112022003132B1 (pt) 2019-08-21 2020-08-20 Método e sistema de gravação para gravar uma estrutura de relevo de superfície queimada em um substrato

Country Status (7)

Country Link
US (1) US20220342297A1 (pt)
EP (1) EP4018230A1 (pt)
KR (1) KR20220046664A (pt)
BR (1) BR112022003132B1 (pt)
GB (1) GB2589685B (pt)
IL (1) IL290758A (pt)
WO (1) WO2021032983A1 (pt)

Families Citing this family (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB0718706D0 (en) 2007-09-25 2007-11-07 Creative Physics Ltd Method and apparatus for reducing laser speckle
US9335604B2 (en) 2013-12-11 2016-05-10 Milan Momcilo Popovich Holographic waveguide display
US11726332B2 (en) 2009-04-27 2023-08-15 Digilens Inc. Diffractive projection apparatus
US9274349B2 (en) 2011-04-07 2016-03-01 Digilens Inc. Laser despeckler based on angular diversity
EP2748670B1 (en) 2011-08-24 2015-11-18 Rockwell Collins, Inc. Wearable data display
WO2016020630A2 (en) 2014-08-08 2016-02-11 Milan Momcilo Popovich Waveguide laser illuminator incorporating a despeckler
US20150010265A1 (en) 2012-01-06 2015-01-08 Milan, Momcilo POPOVICH Contact image sensor using switchable bragg gratings
US9933684B2 (en) 2012-11-16 2018-04-03 Rockwell Collins, Inc. Transparent waveguide display providing upper and lower fields of view having a specific light output aperture configuration
WO2014188149A1 (en) 2013-05-20 2014-11-27 Milan Momcilo Popovich Holographic waveguide eye tracker
WO2015015138A1 (en) 2013-07-31 2015-02-05 Milan Momcilo Popovich Method and apparatus for contact image sensing
US10241330B2 (en) 2014-09-19 2019-03-26 Digilens, Inc. Method and apparatus for generating input images for holographic waveguide displays
EP3245444B1 (en) 2015-01-12 2021-09-08 DigiLens Inc. Environmentally isolated waveguide display
WO2016113533A2 (en) 2015-01-12 2016-07-21 Milan Momcilo Popovich Holographic waveguide light field displays
WO2016116733A1 (en) 2015-01-20 2016-07-28 Milan Momcilo Popovich Holographic waveguide lidar
US9632226B2 (en) 2015-02-12 2017-04-25 Digilens Inc. Waveguide grating device
US10459145B2 (en) 2015-03-16 2019-10-29 Digilens Inc. Waveguide device incorporating a light pipe
EP3359999A1 (en) 2015-10-05 2018-08-15 Popovich, Milan Momcilo Waveguide display
EP3433659A1 (en) 2016-03-24 2019-01-30 DigiLens, Inc. Method and apparatus for providing a polarization selective holographic waveguide device
EP3548939A4 (en) 2016-12-02 2020-11-25 DigiLens Inc. UNIFORM OUTPUT LIGHTING WAVEGUIDE DEVICE
US10545346B2 (en) 2017-01-05 2020-01-28 Digilens Inc. Wearable heads up displays
CN115356905A (zh) 2018-01-08 2022-11-18 迪吉伦斯公司 波导单元格中全息光栅高吞吐量记录的系统和方法
EP3765897B1 (en) 2018-03-16 2024-01-17 Digilens Inc. Holographic waveguides incorporating birefringence control and methods for their fabrication
US11402801B2 (en) 2018-07-25 2022-08-02 Digilens Inc. Systems and methods for fabricating a multilayer optical structure
KR20210138609A (ko) 2019-02-15 2021-11-19 디지렌즈 인코포레이티드. 일체형 격자를 이용하여 홀로그래픽 도파관 디스플레이를 제공하기 위한 방법 및 장치
KR20210134763A (ko) 2019-03-12 2021-11-10 디지렌즈 인코포레이티드. 홀로그래픽 도파관 백라이트 및 관련된 제조 방법
CN114207492A (zh) 2019-06-07 2022-03-18 迪吉伦斯公司 带透射光栅和反射光栅的波导及其生产方法
KR20220038452A (ko) 2019-07-29 2022-03-28 디지렌즈 인코포레이티드. 픽셀화된 디스플레이의 이미지 해상도와 시야를 증배하는 방법 및 장치
KR20220054386A (ko) 2019-08-29 2022-05-02 디지렌즈 인코포레이티드. 진공 브래그 격자 및 이의 제조 방법

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5648643A (en) * 1995-06-16 1997-07-15 Knowles; Terence J. Acoustic wave touch panel with inlayed, etched arrays and method of making the panel
US20020127497A1 (en) * 1998-09-10 2002-09-12 Brown Daniel J. W. Large diffraction grating for gas discharge laser
JP2003207905A (ja) * 2002-01-17 2003-07-25 Konica Corp 現像方法、基材の製造方法及び現像装置
EP2399151B1 (en) * 2009-02-18 2019-11-27 ROLIC Technologies AG Surface relief microstructures, related devices and method of making them
EP2752691A1 (en) * 2013-01-08 2014-07-09 BAE Systems PLC Variable-efficiency diffraction grating
US9304235B2 (en) * 2014-07-30 2016-04-05 Microsoft Technology Licensing, Llc Microfabrication
US20160033784A1 (en) * 2014-07-30 2016-02-04 Tapani Levola Optical Components

Also Published As

Publication number Publication date
GB202012984D0 (en) 2020-10-07
IL290758A (en) 2022-04-01
KR20220046664A (ko) 2022-04-14
BR112022003132B1 (pt) 2023-10-31
WO2021032983A1 (en) 2021-02-25
US20220342297A1 (en) 2022-10-27
GB2589685A (en) 2021-06-09
EP4018230A1 (en) 2022-06-29
GB2589685B (en) 2023-01-18

Similar Documents

Publication Publication Date Title
BR112022003132A2 (pt) Método e sistema de gravação para gravar uma estrutura de relevo de superfície queimada em um substrato
TW200834265A (en) Dry photoresist stripping process and apparatus
MY163666A (en) Apparatus and method for processing a substrate
EP4235758A3 (en) Substrate processing method
SG10201708450PA (en) Substrate support with varying depths of areas between mesas and corresponding temperature dependent method of fabricating
WO2008073954A3 (en) Wet photoresist stripping process and apparatus
SG10201805798UA (en) Etching method and residue removal method
WO2016138218A8 (en) Methods and apparatus for using alkyl amines for the selective removal of metal nitride
MY177495A (en) Wafer thinning method
MY182253A (en) Apparatus and methods for micro-transfer-printing
ATE488621T1 (de) Galvanisches verfahren zur herstellung einer mehrlagenstruktur
DE60033664D1 (de) Veränderbarer gasionenclusterstrahl zur glättung von oberflächen
EP3733308A3 (de) Verfahren und vorrichtung zur oberflächenbearbeitung
SG144740A1 (en) Methods and systems for processing a substrate using a dynamic liquid meniscus
TW201611908A (en) Substrate processing method, substrate processing apparatus, substrate processing system and recording medium
WO2009057764A1 (ja) エッチング方法およびそれを用いた光／電子デバイスの製造方法
TW201614718A (en) Substrate processing system and substrate processing method
TW200725739A (en) Method for using film formation apparatus
EP3751450A4 (en) METHOD AND DEVICE FOR GENERATING A NEGATIVE SAMPLE FACIAL RECOGNITION AND COMPUTER DEVICE
EP3866572A3 (en) Methods for producing a metallic pattern on a substrate
ATE493817T1 (de) Verfahren zum austausch von suchvorgängen zwischen einer informatikanwendung eines mobilen endgeräts und einem instant-messaging-server
TW200503102A (en) Processing method and processing system
TW200802535A (en) Method and system for patterning a dielectric film
ATE526094T1 (de) Verfahren und vorrichtung zur entfernung von farb-und dichtungsmitteln
MX2020005591A (es) Metodo para producir un panel recubierto, impreso.

Legal Events

Date Code Title Description
B09A Decision: intention to grant [chapter 9.1 patent gazette]
B16A Patent or certificate of addition of invention granted [chapter 16.1 patent gazette]

Free format text: PRAZO DE VALIDADE: 20 (VINTE) ANOS CONTADOS A PARTIR DE 20/08/2020, OBSERVADAS AS CONDICOES LEGAIS