NL2015073A - Lithography apparatus and method of manufacturing devices. - Google Patents

Lithography apparatus and method of manufacturing devices.

Info

Publication number
NL2015073A
NL2015073A NL2015073A NL2015073A NL2015073A NL 2015073 A NL2015073 A NL 2015073A NL 2015073 A NL2015073 A NL 2015073A NL 2015073 A NL2015073 A NL 2015073A NL 2015073 A NL2015073 A NL 2015073A
Authority
NL
Netherlands
Prior art keywords
reflectors
field
radiation
substrate
individually directable
Prior art date
Application number
NL2015073A
Other languages
English (en)
Dutch (nl)
Inventor
Bieling Stig
Endres Martin
Escalante Marun Maryana
Bernard Plechelmus Van Schoot Jan
Gruner Toralf
Wischmeier Lars
Original Assignee
Asml Netherlands Bv
Zeiss Carl Smt Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv, Zeiss Carl Smt Gmbh filed Critical Asml Netherlands Bv
Publication of NL2015073A publication Critical patent/NL2015073A/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70083—Non-homogeneous intensity distribution in the mask plane
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70558—Dose control, i.e. achievement of a desired dose

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
NL2015073A 2014-07-15 2015-07-02 Lithography apparatus and method of manufacturing devices. NL2015073A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP14177025 2014-07-15

Publications (1)

Publication Number Publication Date
NL2015073A true NL2015073A (en) 2016-04-12

Family

ID=51176262

Family Applications (1)

Application Number Title Priority Date Filing Date
NL2015073A NL2015073A (en) 2014-07-15 2015-07-02 Lithography apparatus and method of manufacturing devices.

Country Status (5)

Country Link
JP (1) JP6698063B2 (ko)
KR (1) KR102523508B1 (ko)
CN (1) CN106575085B (ko)
NL (1) NL2015073A (ko)
WO (1) WO2016008754A1 (ko)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107885038A (zh) * 2016-09-30 2018-04-06 上海微电子装备（集团）股份有限公司 照明均匀性校正装置、校正方法以及一种曝光投影系统
EP3647872A1 (en) * 2018-11-01 2020-05-06 ASML Netherlands B.V. A method for controlling the dose profile adjustment of a lithographic apparatus

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6753947B2 (en) * 2001-05-10 2004-06-22 Ultratech Stepper, Inc. Lithography system and method for device manufacture
US7123348B2 (en) * 2004-06-08 2006-10-17 Asml Netherlands B.V Lithographic apparatus and method utilizing dose control
CN103293665B (zh) 2008-02-15 2016-07-06 卡尔蔡司Smt有限责任公司 微光刻的投射曝光设备使用的分面镜
DE102009045694B4 (de) * 2009-10-14 2012-03-29 Carl Zeiss Smt Gmbh Beleuchtungsoptik für die Mikrolithographie sowie Beleuchtungssystem und Projektionsbelichtungsanlage mit einer derartigen Beleuchtungsoptik
US9372413B2 (en) * 2011-04-15 2016-06-21 Asml Netherlands B.V. Optical apparatus for conditioning a radiation beam for use by an object, lithography apparatus and method of manufacturing devices
DE102012204273B4 (de) * 2012-03-19 2015-08-13 Carl Zeiss Smt Gmbh Beleuchtungsoptik für die EUV-Projektionslithografie
DE102012207511A1 (de) * 2012-05-07 2013-05-08 Carl Zeiss Smt Gmbh Facettenspiegel
DE102012213515A1 (de) 2012-08-01 2014-02-06 Carl Zeiss Smt Gmbh Verfahren zum Betreiben einer mikrolithographischen Projektionsbelichtungsanlage

Also Published As

Publication number Publication date
KR20170042592A (ko) 2017-04-19
KR102523508B1 (ko) 2023-04-20
WO2016008754A1 (en) 2016-01-21
CN106575085B (zh) 2019-03-15
JP2017520799A (ja) 2017-07-27
CN106575085A (zh) 2017-04-19
JP6698063B2 (ja) 2020-05-27

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