NL2015073A - Lithography apparatus and method of manufacturing devices. - Google Patents
Lithography apparatus and method of manufacturing devices.Info
- Publication number
- NL2015073A NL2015073A NL2015073A NL2015073A NL2015073A NL 2015073 A NL2015073 A NL 2015073A NL 2015073 A NL2015073 A NL 2015073A NL 2015073 A NL2015073 A NL 2015073A NL 2015073 A NL2015073 A NL 2015073A
- Authority
- NL
- Netherlands
- Prior art keywords
- reflectors
- field
- radiation
- substrate
- individually directable
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70083—Non-homogeneous intensity distribution in the mask plane
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
- G03F7/70558—Dose control, i.e. achievement of a desired dose
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP14177025 | 2014-07-15 |
Publications (1)
Publication Number | Publication Date |
---|---|
NL2015073A true NL2015073A (en) | 2016-04-12 |
Family
ID=51176262
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NL2015073A NL2015073A (en) | 2014-07-15 | 2015-07-02 | Lithography apparatus and method of manufacturing devices. |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP6698063B2 (ko) |
KR (1) | KR102523508B1 (ko) |
CN (1) | CN106575085B (ko) |
NL (1) | NL2015073A (ko) |
WO (1) | WO2016008754A1 (ko) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107885038A (zh) * | 2016-09-30 | 2018-04-06 | 上海微电子装备(集团)股份有限公司 | 照明均匀性校正装置、校正方法以及一种曝光投影系统 |
EP3647872A1 (en) * | 2018-11-01 | 2020-05-06 | ASML Netherlands B.V. | A method for controlling the dose profile adjustment of a lithographic apparatus |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6753947B2 (en) * | 2001-05-10 | 2004-06-22 | Ultratech Stepper, Inc. | Lithography system and method for device manufacture |
US7123348B2 (en) * | 2004-06-08 | 2006-10-17 | Asml Netherlands B.V | Lithographic apparatus and method utilizing dose control |
CN103293665B (zh) | 2008-02-15 | 2016-07-06 | 卡尔蔡司Smt有限责任公司 | 微光刻的投射曝光设备使用的分面镜 |
DE102009045694B4 (de) * | 2009-10-14 | 2012-03-29 | Carl Zeiss Smt Gmbh | Beleuchtungsoptik für die Mikrolithographie sowie Beleuchtungssystem und Projektionsbelichtungsanlage mit einer derartigen Beleuchtungsoptik |
US9372413B2 (en) * | 2011-04-15 | 2016-06-21 | Asml Netherlands B.V. | Optical apparatus for conditioning a radiation beam for use by an object, lithography apparatus and method of manufacturing devices |
DE102012204273B4 (de) * | 2012-03-19 | 2015-08-13 | Carl Zeiss Smt Gmbh | Beleuchtungsoptik für die EUV-Projektionslithografie |
DE102012207511A1 (de) * | 2012-05-07 | 2013-05-08 | Carl Zeiss Smt Gmbh | Facettenspiegel |
DE102012213515A1 (de) | 2012-08-01 | 2014-02-06 | Carl Zeiss Smt Gmbh | Verfahren zum Betreiben einer mikrolithographischen Projektionsbelichtungsanlage |
-
2015
- 2015-07-02 NL NL2015073A patent/NL2015073A/en unknown
- 2015-07-06 CN CN201580038295.4A patent/CN106575085B/zh active Active
- 2015-07-06 JP JP2017501200A patent/JP6698063B2/ja active Active
- 2015-07-06 WO PCT/EP2015/065346 patent/WO2016008754A1/en active Application Filing
- 2015-07-06 KR KR1020177004099A patent/KR102523508B1/ko active IP Right Grant
Also Published As
Publication number | Publication date |
---|---|
KR102523508B1 (ko) | 2023-04-20 |
CN106575085A (zh) | 2017-04-19 |
JP6698063B2 (ja) | 2020-05-27 |
JP2017520799A (ja) | 2017-07-27 |
KR20170042592A (ko) | 2017-04-19 |
WO2016008754A1 (en) | 2016-01-21 |
CN106575085B (zh) | 2019-03-15 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
TWI534553B (zh) | 收集器鏡總成及產生極紫外光輻射之方法 | |
JP3972207B2 (ja) | デブリ抑制手段を備えたリソグラフィ装置およびデバイス製造方法 | |
KR101703830B1 (ko) | 리소그래피 장치 및 디바이스 제조방법 | |
KR20120102145A (ko) | 조명 시스템, 리소그래피 장치 및 조명 방법 | |
EP2898370B1 (en) | Lithographic method and apparatus | |
KR101666073B1 (ko) | 조명 시스템, 리소그래피 장치 및 조명 모드 형성 방법 | |
NL2004429A (en) | Illumination system, lithographic apparatus and method of adjusting an illumination mode. | |
KR101776837B1 (ko) | 다중층 거울 | |
KR20130040883A (ko) | Euⅴ 방사선 소스 및 euⅴ 방사선 생성 방법 | |
JP6305426B2 (ja) | Euvリソグラフィ装置用ビーム搬送装置 | |
KR20130009773A (ko) | 스펙트럼 퓨리티 필터 | |
JP2011044708A (ja) | リソグラフィ装置における使用のためのスペクトル純度フィルタ | |
KR102523508B1 (ko) | 리소그래피 장치 및 디바이스 제조 방법 | |
NL2016538A (en) | Radiation Source, Lithographic Apparatus and Device Manufacturing Method. | |
WO2020216643A1 (en) | Lithographic apparatus and illumination uniformity correction system | |
JP5122525B2 (ja) | 放電生成プラズマ放射源、リソグラフィ装置、及び放射を生成する方法 | |
US20110043782A1 (en) | Spectral purity filters for use in a lithographic apparatus | |
NL2005763A (en) | Lithographic apparatus. | |
NL2012615A (en) | Lithographic system and device manufacturing method. | |
NL2011514A (en) | Beam delivery system for an euv radiation source, euv radiation source and method of generating euv radiation. |