NL2007177A - Alignment measurement system, lithographic apparatus, and a method to determine alignment of in a lithographic apparatus. - Google Patents
Alignment measurement system, lithographic apparatus, and a method to determine alignment of in a lithographic apparatus. Download PDFInfo
- Publication number
- NL2007177A NL2007177A NL2007177A NL2007177A NL2007177A NL 2007177 A NL2007177 A NL 2007177A NL 2007177 A NL2007177 A NL 2007177A NL 2007177 A NL2007177 A NL 2007177A NL 2007177 A NL2007177 A NL 2007177A
- Authority
- NL
- Netherlands
- Prior art keywords
- alignment
- measurement
- substrate
- detector
- measurement beam
- Prior art date
Links
- 238000005259 measurement Methods 0.000 title abstract description 155
- 238000000034 method Methods 0.000 title description 20
- 239000000758 substrate Substances 0.000 claims description 87
- 230000005855 radiation Effects 0.000 claims description 53
- 238000000059 patterning Methods 0.000 claims description 35
- 238000001459 lithography Methods 0.000 claims description 5
- 238000012545 processing Methods 0.000 abstract description 27
- 239000000835 fiber Substances 0.000 abstract description 25
- 230000003287 optical effect Effects 0.000 abstract description 9
- 238000005286 illumination Methods 0.000 description 33
- 230000010287 polarization Effects 0.000 description 33
- 239000010410 layer Substances 0.000 description 15
- 238000001514 detection method Methods 0.000 description 12
- 230000008859 change Effects 0.000 description 8
- 230000008901 benefit Effects 0.000 description 5
- 239000003086 colorant Substances 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- 239000007788 liquid Substances 0.000 description 5
- 230000006870 function Effects 0.000 description 4
- 238000007654 immersion Methods 0.000 description 4
- 238000009826 distribution Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 238000002310 reflectometry Methods 0.000 description 3
- 238000004590 computer program Methods 0.000 description 2
- 230000005684 electric field Effects 0.000 description 2
- 230000005670 electromagnetic radiation Effects 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 230000010363 phase shift Effects 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 230000003068 static effect Effects 0.000 description 2
- 238000012876 topography Methods 0.000 description 2
- 238000012546 transfer Methods 0.000 description 2
- 238000001429 visible spectrum Methods 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
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- 230000002238 attenuated effect Effects 0.000 description 1
- 238000013500 data storage Methods 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 239000002346 layers by function Substances 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 230000005381 magnetic domain Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000015654 memory Effects 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
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- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70141—Illumination system adjustment, e.g. adjustments during exposure or alignment during assembly of illumination system
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/26—Measuring arrangements characterised by the use of optical techniques for measuring angles or tapers; for testing the alignment of axes
- G01B11/27—Measuring arrangements characterised by the use of optical techniques for measuring angles or tapers; for testing the alignment of axes for testing the alignment of axes
- G01B11/272—Measuring arrangements characterised by the use of optical techniques for measuring angles or tapers; for testing the alignment of axes for testing the alignment of axes using photoelectric detection means
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01D—MEASURING NOT SPECIALLY ADAPTED FOR A SPECIFIC VARIABLE; ARRANGEMENTS FOR MEASURING TWO OR MORE VARIABLES NOT COVERED IN A SINGLE OTHER SUBCLASS; TARIFF METERING APPARATUS; MEASURING OR TESTING NOT OTHERWISE PROVIDED FOR
- G01D5/00—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable
- G01D5/26—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light
- G01D5/32—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light with attenuation or whole or partial obturation of beams of light
- G01D5/34—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light with attenuation or whole or partial obturation of beams of light the beams of light being detected by photocells
- G01D5/344—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light with attenuation or whole or partial obturation of beams of light the beams of light being detected by photocells using polarisation
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
- G03F9/7046—Strategy, e.g. mark, sensor or wavelength selection
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Multimedia (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Length Measuring Devices By Optical Means (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US38214710P | 2010-09-13 | 2010-09-13 | |
| US38214710 | 2010-09-13 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| NL2007177A true NL2007177A (en) | 2012-03-14 |
Family
ID=45806404
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL2007177A NL2007177A (en) | 2010-09-13 | 2011-07-26 | Alignment measurement system, lithographic apparatus, and a method to determine alignment of in a lithographic apparatus. |
Country Status (3)
| Country | Link |
|---|---|
| US (2) | US9046385B2 (enExample) |
| JP (2) | JP5559114B2 (enExample) |
| NL (1) | NL2007177A (enExample) |
Families Citing this family (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL2007177A (en) | 2010-09-13 | 2012-03-14 | Asml Netherlands Bv | Alignment measurement system, lithographic apparatus, and a method to determine alignment of in a lithographic apparatus. |
| NL2011477A (en) | 2012-10-10 | 2014-04-14 | Asml Netherlands Bv | Mark position measuring apparatus and method, lithographic apparatus and device manufacturing method. |
| JP5992110B2 (ja) * | 2012-11-05 | 2016-09-14 | エーエスエムエル ネザーランズ ビー．ブイ． | ミクロ構造の非対称性を測定する方法および装置、位置測定方法、位置測定装置、リソグラフィ装置およびデバイス製造方法 |
| US8830456B2 (en) * | 2013-02-01 | 2014-09-09 | Zeta Instruments, Inc. | Optical inspector |
| US9383661B2 (en) | 2013-08-10 | 2016-07-05 | Kla-Tencor Corporation | Methods and apparatus for determining focus |
| US10935893B2 (en) * | 2013-08-11 | 2021-03-02 | Kla-Tencor Corporation | Differential methods and apparatus for metrology of semiconductor targets |
| CN106415193B (zh) * | 2014-03-21 | 2019-08-09 | 卡尔佩迪姆技术有限公司 | 用于在柔性基板上制造微型结构的系统和方法 |
| JP6568298B2 (ja) | 2015-07-13 | 2019-08-28 | エーエスエムエル ネザーランズ ビー．ブイ． | リソグラフィ装置およびデバイス製造方法 |
| US10241426B2 (en) | 2015-08-27 | 2019-03-26 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| CN106610570B (zh) * | 2015-10-21 | 2020-11-13 | 上海微电子装备（集团）股份有限公司 | 一种实现运动台定位的装置及方法 |
| NL2018931A (en) | 2016-06-03 | 2017-12-05 | Asml Holding Nv | Alignment system wafer stack beam analyzer |
| US10788766B2 (en) | 2017-05-08 | 2020-09-29 | Asml Netherlands B.V. | Metrology sensor, lithographic apparatus and method for manufacturing devices |
| WO2018210505A1 (en) * | 2017-05-15 | 2018-11-22 | Asml Netherlands B.V. | Metrology sensor, lithographic apparatus and method for manufacturing devices |
| NL2022852A (en) | 2018-04-26 | 2019-10-31 | Asml Holding Nv | Alignment sensor apparatus for process sensivity compensation |
| WO2020169357A1 (en) * | 2019-02-21 | 2020-08-27 | Asml Holding N.V. | Wafer alignment using form birefringence of targets or product |
Family Cites Families (24)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62211503A (ja) | 1986-03-13 | 1987-09-17 | Hitachi Ltd | 段差計測装置 |
| JPS635203A (ja) | 1986-06-25 | 1988-01-11 | Hitachi Ltd | パタ−ン検出方法および装置 |
| JPH0635928B2 (ja) | 1990-10-11 | 1994-05-11 | 株式会社ソルテック | 位置検出方法及び位置合せ方法 |
| US5182610A (en) | 1990-04-19 | 1993-01-26 | Sortec Corporation | Position detecting method and device therefor as well as aligning device |
| JPH0540026A (ja) | 1991-03-15 | 1993-02-19 | Nippon Seiko Kk | パターン読み取り装置 |
| JPH0587528A (ja) | 1991-09-27 | 1993-04-06 | Canon Inc | 光ヘテロダイン干渉計測方法及び計測装置 |
| JPH07239212A (ja) | 1994-02-28 | 1995-09-12 | Nikon Corp | 位置検出装置 |
| US20010026357A1 (en) | 1996-04-26 | 2001-10-04 | Nikon Corporation | Position transducer and exposure apparatus with same |
| JPH09293663A (ja) | 1996-04-26 | 1997-11-11 | Nikon Corp | 位置検出装置及び該装置を備えた露光装置 |
| TW579435B (en) | 1999-08-02 | 2004-03-11 | Zetetic Inst | Scanning interferometric near-field confocal microscopy |
| WO2001009662A2 (en) | 1999-08-02 | 2001-02-08 | Zetetic Institute | Scanning interferometric near-field confocal microscopy |
| US6891627B1 (en) * | 2000-09-20 | 2005-05-10 | Kla-Tencor Technologies Corp. | Methods and systems for determining a critical dimension and overlay of a specimen |
| JP2002350117A (ja) | 2001-05-29 | 2002-12-04 | Olympus Optical Co Ltd | 形状計測装置及び形状計測方法 |
| JP2005509147A (ja) * | 2001-11-05 | 2005-04-07 | ザイゴ コーポレーション | 干渉周期誤差の補償 |
| TWI251722B (en) | 2002-09-20 | 2006-03-21 | Asml Netherlands Bv | Device inspection |
| JP2005062155A (ja) * | 2003-07-25 | 2005-03-10 | Olympus Corp | コヒーレントラマン散乱顕微鏡 |
| US7136163B2 (en) * | 2003-12-09 | 2006-11-14 | Applied Materials, Inc. | Differential evaluation of adjacent regions for change in reflectivity |
| US20060117293A1 (en) | 2004-11-30 | 2006-06-01 | Nigel Smith | Method for designing an overlay mark |
| US7816654B2 (en) | 2005-01-16 | 2010-10-19 | Baer Stephen C | Single wavelength stimulated emission depletion microscopy |
| US7642536B2 (en) | 2005-01-16 | 2010-01-05 | Baer Stephen C | Real-time high-magnification stereoscopic microscope |
| US7701577B2 (en) * | 2007-02-21 | 2010-04-20 | Asml Netherlands B.V. | Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method |
| JP5508416B2 (ja) * | 2008-07-24 | 2014-05-28 | ザ リージェンツ オブ ザ ユニヴァーシティー オブ カリフォルニア | ディスパーシブフーリエ変換イメージングの装置および方法 |
| JP4436878B2 (ja) | 2008-10-06 | 2010-03-24 | オリンパス株式会社 | 観察物体の物理量を検出するための装置およびこれを用いた検出方法 |
| NL2007177A (en) | 2010-09-13 | 2012-03-14 | Asml Netherlands Bv | Alignment measurement system, lithographic apparatus, and a method to determine alignment of in a lithographic apparatus. |
-
2011
- 2011-07-26 NL NL2007177A patent/NL2007177A/en not_active Application Discontinuation
- 2011-08-10 US US13/206,592 patent/US9046385B2/en active Active
- 2011-09-09 JP JP2011196769A patent/JP5559114B2/ja active Active
-
2014
- 2014-04-08 JP JP2014079408A patent/JP2014132695A/ja active Pending
-
2015
- 2015-05-29 US US14/725,023 patent/US9280057B2/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| JP2012060131A (ja) | 2012-03-22 |
| US20150261100A1 (en) | 2015-09-17 |
| US9280057B2 (en) | 2016-03-08 |
| US9046385B2 (en) | 2015-06-02 |
| JP5559114B2 (ja) | 2014-07-23 |
| JP2014132695A (ja) | 2014-07-17 |
| US20120062863A1 (en) | 2012-03-15 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| WDAP | Patent application withdrawn |
Effective date: 20120604 |