NL2007177A - Alignment measurement system, lithographic apparatus, and a method to determine alignment of in a lithographic apparatus. - Google Patents

Alignment measurement system, lithographic apparatus, and a method to determine alignment of in a lithographic apparatus. Download PDF

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Publication number
NL2007177A
NL2007177A NL2007177A NL2007177A NL2007177A NL 2007177 A NL2007177 A NL 2007177A NL 2007177 A NL2007177 A NL 2007177A NL 2007177 A NL2007177 A NL 2007177A NL 2007177 A NL2007177 A NL 2007177A
Authority
NL
Netherlands
Prior art keywords
alignment
measurement
substrate
detector
measurement beam
Prior art date
Application number
NL2007177A
Other languages
English (en)
Dutch (nl)
Inventor
Franciscus Bijnen
David Deckers
Sami Musa
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of NL2007177A publication Critical patent/NL2007177A/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70141—Illumination system adjustment, e.g. adjustments during exposure or alignment during assembly of illumination system
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/26—Measuring arrangements characterised by the use of optical techniques for measuring angles or tapers; for testing the alignment of axes
    • G01B11/27—Measuring arrangements characterised by the use of optical techniques for measuring angles or tapers; for testing the alignment of axes for testing the alignment of axes
    • G01B11/272—Measuring arrangements characterised by the use of optical techniques for measuring angles or tapers; for testing the alignment of axes for testing the alignment of axes using photoelectric detection means
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01D—MEASURING NOT SPECIALLY ADAPTED FOR A SPECIFIC VARIABLE; ARRANGEMENTS FOR MEASURING TWO OR MORE VARIABLES NOT COVERED IN A SINGLE OTHER SUBCLASS; TARIFF METERING APPARATUS; MEASURING OR TESTING NOT OTHERWISE PROVIDED FOR
    • G01D5/00—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable
    • G01D5/26—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light
    • G01D5/32—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light with attenuation or whole or partial obturation of beams of light
    • G01D5/34—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light with attenuation or whole or partial obturation of beams of light the beams of light being detected by photocells
    • G01D5/344—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light with attenuation or whole or partial obturation of beams of light the beams of light being detected by photocells using polarisation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7046—Strategy, e.g. mark, sensor or wavelength selection

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Multimedia (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Length Measuring Devices By Optical Means (AREA)
NL2007177A 2010-09-13 2011-07-26 Alignment measurement system, lithographic apparatus, and a method to determine alignment of in a lithographic apparatus. NL2007177A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US38214710P 2010-09-13 2010-09-13
US38214710 2010-09-13

Publications (1)

Publication Number Publication Date
NL2007177A true NL2007177A (en) 2012-03-14

Family

ID=45806404

Family Applications (1)

Application Number Title Priority Date Filing Date
NL2007177A NL2007177A (en) 2010-09-13 2011-07-26 Alignment measurement system, lithographic apparatus, and a method to determine alignment of in a lithographic apparatus.

Country Status (3)

Country Link
US (2) US9046385B2 (enExample)
JP (2) JP5559114B2 (enExample)
NL (1) NL2007177A (enExample)

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NL2007177A (en) 2010-09-13 2012-03-14 Asml Netherlands Bv Alignment measurement system, lithographic apparatus, and a method to determine alignment of in a lithographic apparatus.
NL2011477A (en) * 2012-10-10 2014-04-14 Asml Netherlands Bv Mark position measuring apparatus and method, lithographic apparatus and device manufacturing method.
JP5992110B2 (ja) * 2012-11-05 2016-09-14 エーエスエムエル ネザーランズ ビー．ブイ． ミクロ構造の非対称性を測定する方法および装置、位置測定方法、位置測定装置、リソグラフィ装置およびデバイス製造方法
US8830456B2 (en) * 2013-02-01 2014-09-09 Zeta Instruments, Inc. Optical inspector
US9383661B2 (en) 2013-08-10 2016-07-05 Kla-Tencor Corporation Methods and apparatus for determining focus
US10935893B2 (en) * 2013-08-11 2021-03-02 Kla-Tencor Corporation Differential methods and apparatus for metrology of semiconductor targets
DK3120107T3 (en) * 2014-03-21 2019-03-18 Carpe Diem Tech Inc System and method for producing miniature structures on a flexible substrate
US10474045B2 (en) 2015-07-13 2019-11-12 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US10241426B2 (en) 2015-08-27 2019-03-26 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
CN106610570B (zh) * 2015-10-21 2020-11-13 上海微电子装备（集团）股份有限公司 一种实现运动台定位的装置及方法
CN109313402B (zh) 2016-06-03 2020-08-28 Asml控股股份有限公司 对准系统晶片堆叠光束分析器
NL2020530A (en) * 2017-05-08 2018-11-14 Asml Netherlands Bv Metrology sensor, lithographic apparatus and method for manufacturing devices
JP6917472B2 (ja) * 2017-05-15 2021-08-11 エーエスエムエル ネザーランズ ビー．ブイ． メトロロジセンサ、リソグラフィ装置、及びデバイスを製造するための方法
CN112020677B (zh) * 2018-04-26 2023-03-21 Asml荷兰有限公司 用于工艺灵敏度补偿的对准传感器装置
WO2020169357A1 (en) * 2019-02-21 2020-08-27 Asml Holding N.V. Wafer alignment using form birefringence of targets or product

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JPS635203A (ja) 1986-06-25 1988-01-11 Hitachi Ltd パタ−ン検出方法および装置
US5182610A (en) 1990-04-19 1993-01-26 Sortec Corporation Position detecting method and device therefor as well as aligning device
JPH0635928B2 (ja) 1990-10-11 1994-05-11 株式会社ソルテック 位置検出方法及び位置合せ方法
JPH0540026A (ja) 1991-03-15 1993-02-19 Nippon Seiko Kk パターン読み取り装置
JPH0587528A (ja) 1991-09-27 1993-04-06 Canon Inc 光ヘテロダイン干渉計測方法及び計測装置
JPH07239212A (ja) 1994-02-28 1995-09-12 Nikon Corp 位置検出装置
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NL2007177A (en) 2010-09-13 2012-03-14 Asml Netherlands Bv Alignment measurement system, lithographic apparatus, and a method to determine alignment of in a lithographic apparatus.

Also Published As

Publication number Publication date
US9046385B2 (en) 2015-06-02
JP5559114B2 (ja) 2014-07-23
US20150261100A1 (en) 2015-09-17
JP2014132695A (ja) 2014-07-17
JP2012060131A (ja) 2012-03-22
US9280057B2 (en) 2016-03-08
US20120062863A1 (en) 2012-03-15

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Effective date: 20120604