NL2003266A1 - Multi nozzle proximity sensor employing common sensing and nozzle shaping. - Google Patents
Multi nozzle proximity sensor employing common sensing and nozzle shaping. Download PDFInfo
- Publication number
- NL2003266A1 NL2003266A1 NL2003266A NL2003266A NL2003266A1 NL 2003266 A1 NL2003266 A1 NL 2003266A1 NL 2003266 A NL2003266 A NL 2003266A NL 2003266 A NL2003266 A NL 2003266A NL 2003266 A1 NL2003266 A1 NL 2003266A1
- Authority
- NL
- Netherlands
- Prior art keywords
- nozzle
- proximity sensor
- shaping
- sensor employing
- common sensing
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
- G03B27/00—Photographic printing apparatus
- G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
- G03B27/52—Details
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70605—Workpiece metrology
- G03F7/70608—Monitoring the unpatterned workpiece, e.g. measuring thickness, reflectivity or effects of immersion liquid on resist
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70783—Handling stress or warp of chucks, masks or workpieces, e.g. to compensate for imaging errors or considerations related to warpage of masks or workpieces due to their own weight
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US8790208P | 2008-08-11 | 2008-08-11 |
Publications (1)
Publication Number | Publication Date |
---|---|
NL2003266A1 true NL2003266A1 (nl) | 2010-02-15 |
Family
ID=41652613
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NL2003266A NL2003266A1 (nl) | 2008-08-11 | 2009-07-23 | Multi nozzle proximity sensor employing common sensing and nozzle shaping. |
Country Status (3)
Country | Link |
---|---|
US (1) | US8390782B2 (nl) |
JP (1) | JP4922363B2 (nl) |
NL (1) | NL2003266A1 (nl) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20140023927A (ko) * | 2011-03-11 | 2014-02-27 | 에이에스엠엘 네델란즈 비.브이. | 정전기 클램프 장치 및 리소그래피 장치 |
JP5915103B2 (ja) * | 2011-11-11 | 2016-05-11 | セイコーエプソン株式会社 | 物理量検出器 |
NL2017595A (en) * | 2015-11-10 | 2017-05-26 | Asml Netherlands Bv | Proximity sensor, lithographic apparatus and device manufacturing method |
NL2017846A (en) * | 2015-12-21 | 2017-06-27 | Asml Netherlands Bv | Height Measurement Apparatus |
Family Cites Families (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56111998A (en) * | 1980-02-11 | 1981-09-04 | Tokyo Shibaura Electric Co | Pressure signal transmitter |
US4550592A (en) | 1984-05-07 | 1985-11-05 | Dechape Michel L | Pneumatic gauging circuit |
JPH0762729B2 (ja) * | 1986-03-31 | 1995-07-05 | 株式会社日立製作所 | 自動焦点調節装置 |
JPS639805A (ja) * | 1986-06-30 | 1988-01-16 | Hitachi Electronics Eng Co Ltd | 流体噴射による位置決め装置 |
JPH0297643A (ja) * | 1988-09-30 | 1990-04-10 | Kubota Ltd | クリープ抵抗の高い耐熱鋳造合金 |
US4953388A (en) | 1989-01-25 | 1990-09-04 | The Perkin-Elmer Corporation | Air gauge sensor |
EP0460357A3 (en) * | 1990-06-08 | 1992-07-29 | Landis & Gyr Betriebs Ag | Device for optical measurement of pressure differences |
US5163326A (en) | 1991-03-08 | 1992-11-17 | Rosemount Inc. | Line pressure compensator for a pressure transducer |
JPH07135135A (ja) * | 1993-06-21 | 1995-05-23 | Hitachi Ltd | 半導体製造装置 |
JP3659529B2 (ja) * | 1996-06-06 | 2005-06-15 | キヤノン株式会社 | 露光装置およびデバイス製造方法 |
US5825043A (en) * | 1996-10-07 | 1998-10-20 | Nikon Precision Inc. | Focusing and tilting adjustment system for lithography aligner, manufacturing apparatus or inspection apparatus |
JP2002277384A (ja) * | 2001-03-19 | 2002-09-25 | Ishikawajima Inspection & Instrumentation Co | 欠陥検出方法及び装置 |
US7010958B2 (en) * | 2002-12-19 | 2006-03-14 | Asml Holding N.V. | High-resolution gas gauge proximity sensor |
SG107157A1 (en) * | 2002-12-19 | 2004-11-29 | Asml Holding Nv | Liquid flow proximity sensor for use in immersion lithography |
US6945116B2 (en) * | 2003-03-19 | 2005-09-20 | California Institute Of Technology | Integrated capacitive microfluidic sensors method and apparatus |
US7272976B2 (en) * | 2004-03-30 | 2007-09-25 | Asml Holdings N.V. | Pressure sensor |
US7021120B2 (en) * | 2004-04-28 | 2006-04-04 | Asml Holding N.V. | High resolution gas gauge proximity sensor |
US20070074579A1 (en) * | 2005-10-03 | 2007-04-05 | Honeywell International Inc. | Wireless pressure sensor and method of forming same |
US20070151327A1 (en) | 2005-12-29 | 2007-07-05 | Asml Holding N.V. | Gas gauge proximity sensor with internal gas flow control |
-
2009
- 2009-07-23 NL NL2003266A patent/NL2003266A1/nl not_active Application Discontinuation
- 2009-08-04 JP JP2009181211A patent/JP4922363B2/ja not_active Expired - Fee Related
- 2009-08-11 US US12/539,190 patent/US8390782B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
US20100033705A1 (en) | 2010-02-11 |
JP4922363B2 (ja) | 2012-04-25 |
US8390782B2 (en) | 2013-03-05 |
JP2010050449A (ja) | 2010-03-04 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
AD1A | A request for search or an international type search has been filed | ||
WDAP | Patent application withdrawn |
Effective date: 20100705 |