NL179775B - Halfgeleiderbeeldopneeminrichting. - Google Patents

Halfgeleiderbeeldopneeminrichting.

Info

Publication number
NL179775B
NL179775B NLAANVRAGE7711000,A NL7711000A NL179775B NL 179775 B NL179775 B NL 179775B NL 7711000 A NL7711000 A NL 7711000A NL 179775 B NL179775 B NL 179775B
Authority
NL
Netherlands
Prior art keywords
recording device
image recording
semiconductor image
semiconductor
recording
Prior art date
Application number
NLAANVRAGE7711000,A
Other languages
English (en)
Other versions
NL7711000A (nl
NL179775C (nl
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Publication of NL7711000A publication Critical patent/NL7711000A/nl
Publication of NL179775B publication Critical patent/NL179775B/nl
Application granted granted Critical
Publication of NL179775C publication Critical patent/NL179775C/nl

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/08—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors
    • H01L31/10—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors characterised by potential barriers, e.g. phototransistors
    • H01L31/101—Devices sensitive to infrared, visible or ultraviolet radiation
    • H01L31/112—Devices sensitive to infrared, visible or ultraviolet radiation characterised by field-effect operation, e.g. junction field-effect phototransistor
    • H01L31/113—Devices sensitive to infrared, visible or ultraviolet radiation characterised by field-effect operation, e.g. junction field-effect phototransistor being of the conductor-insulator-semiconductor type, e.g. metal-insulator-semiconductor field-effect transistor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • H01L27/144—Devices controlled by radiation
    • H01L27/146—Imager structures
    • H01L27/14643—Photodiode arrays; MOS imagers

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Electromagnetism (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Solid State Image Pick-Up Elements (AREA)
  • Transforming Light Signals Into Electric Signals (AREA)
NLAANVRAGE7711000,A 1976-10-06 1977-10-06 Halfgeleiderbeeldopneeminrichting. NL179775C (nl)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11934776A JPS5345119A (en) 1976-10-06 1976-10-06 Solid state pickup element

Publications (3)

Publication Number Publication Date
NL7711000A NL7711000A (nl) 1978-04-10
NL179775B true NL179775B (nl) 1986-06-02
NL179775C NL179775C (nl) 1986-11-03

Family

ID=14759228

Family Applications (1)

Application Number Title Priority Date Filing Date
NLAANVRAGE7711000,A NL179775C (nl) 1976-10-06 1977-10-06 Halfgeleiderbeeldopneeminrichting.

Country Status (6)

Country Link
US (1) US4155094A (nl)
JP (1) JPS5345119A (nl)
DE (1) DE2745046C3 (nl)
FR (1) FR2367353A1 (nl)
GB (1) GB1531180A (nl)
NL (1) NL179775C (nl)

Families Citing this family (39)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1592373A (en) * 1976-12-30 1981-07-08 Ibm Photodetector
JPS53125791A (en) * 1977-04-08 1978-11-02 Toshiba Corp Solidstate pick up unit
JPS6017196B2 (ja) * 1978-01-23 1985-05-01 株式会社日立製作所 固体撮像素子
US4236829A (en) * 1978-01-31 1980-12-02 Matsushita Electric Industrial Co., Ltd. Solid-state image sensor
JPS54114922A (en) * 1978-02-27 1979-09-07 Nec Corp Two dimentional pick up element and its drive
JPS54154382A (en) * 1978-05-25 1979-12-05 Canon Inc Photo sensor device
FR2433868A1 (fr) * 1978-08-17 1980-03-14 Hitachi Ltd Dispositif de formation d'image a semi-conducteur
DE2939518A1 (de) * 1979-09-28 1981-04-16 Siemens AG, 1000 Berlin und 8000 München Monolithisch integrierte schaltung zur zeilenweisen bildabtastung
DE2943143A1 (de) * 1979-10-25 1981-05-07 Siemens AG, 1000 Berlin und 8000 München Infrarotempfindler x-y-ccd-sensor und verfahren zu seiner herstellung
US4322638A (en) * 1980-01-16 1982-03-30 Eastman Kodak Company Image sensor adaptable for fast frame readout
FR2481553A1 (fr) * 1980-04-23 1981-10-30 Thomson Csf Dispositif photosensible lu par transfert de charges et camera de television comportant un tel dispositif
US4484210A (en) * 1980-09-05 1984-11-20 Nippon Electric Co., Ltd. Solid-state imaging device having a reduced image lag
FR2501943B1 (fr) * 1981-03-13 1986-01-17 Thomson Csf Dispositif photosensible solide a deux dimensions et dispositif d'analyse d'image, utilisant le transfert de charges electriques, comportant un tel dispositif
FR2503502B1 (fr) * 1981-03-31 1985-07-05 Thomson Csf Dispositif d'analyse d'images en couleur utilisant le transfert de charges electriques et camera de television comportant un tel dispositif
DE3138294A1 (de) * 1981-09-25 1983-04-14 Siemens AG, 1000 Berlin und 8000 München Zweidimensionaler halbleiter-bildsensor mit steuerung oder regelung der integrationszeit
US4481522A (en) * 1982-03-24 1984-11-06 Rca Corporation CCD Imagers with substrates having drift field
DE3465830D1 (en) * 1983-07-06 1987-10-08 Agfa Gevaert Nv Radiation-sensitive semiconductor device
US4807007A (en) * 1983-10-03 1989-02-21 Texas Instruments Incorporated Mis infrared detector having a storage area
US4665325A (en) * 1984-01-30 1987-05-12 Matsushita Electric Industrial Co., Ltd. Solid state image sensor with signal amplification
US4606115A (en) * 1985-05-14 1986-08-19 Motorola, Inc. Method of manufacturing optically sensitive semiconductor devices including anti-reflective coatings
US4720746A (en) * 1985-08-05 1988-01-19 Eastman Kodak Company Frame transfer CCD area image sensor with improved horizontal resolution
DE3706278A1 (de) * 1986-02-28 1987-09-03 Canon Kk Halbleitervorrichtung und herstellungsverfahren hierfuer
JPS6431062A (en) * 1987-07-27 1989-02-01 Ngk Insulators Ltd Inferior insulator detector
JPS6475977A (en) * 1987-09-18 1989-03-22 Ngk Insulators Ltd Faulty insulator detector
US5051797A (en) * 1989-09-05 1991-09-24 Eastman Kodak Company Charge-coupled device (CCD) imager and method of operation
JP3356816B2 (ja) * 1992-03-24 2002-12-16 セイコーインスツルメンツ株式会社 半導体光電気変換装置
US6021172A (en) 1994-01-28 2000-02-01 California Institute Of Technology Active pixel sensor having intra-pixel charge transfer with analog-to-digital converter
US6486503B1 (en) 1994-01-28 2002-11-26 California Institute Of Technology Active pixel sensor array with electronic shuttering
US5471515A (en) * 1994-01-28 1995-11-28 California Institute Of Technology Active pixel sensor with intra-pixel charge transfer
USRE42918E1 (en) 1994-01-28 2011-11-15 California Institute Of Technology Single substrate camera device with CMOS image sensor
US6570617B2 (en) 1994-01-28 2003-05-27 California Institute Of Technology CMOS active pixel sensor type imaging system on a chip
US5563429A (en) * 1994-06-14 1996-10-08 Nikon Corp. Solid state imaging device
US5576763A (en) * 1994-11-22 1996-11-19 Lucent Technologies Inc. Single-polysilicon CMOS active pixel
WO1997028558A2 (en) * 1996-01-22 1997-08-07 California Institute Of Technology Active pixel sensor array with electronic shuttering
US5942775A (en) * 1997-04-30 1999-08-24 Lucent Technologies Inc. Photosensing device with improved spectral response and low thermal leakage
US6353240B2 (en) * 1999-06-02 2002-03-05 United Microelectronics Corp. CMOS sensor with shallow and deep regions
US6376868B1 (en) * 1999-06-15 2002-04-23 Micron Technology, Inc. Multi-layered gate for a CMOS imager
CA2350416A1 (en) * 2000-12-20 2002-06-20 Symagery Microsystems Inc. Image sensor with correlated double sampling technique using switched-capacitor technology
CA2351025A1 (en) * 2001-06-19 2002-12-19 Symagery Microsystems Inc. Method and apparatus for controlling power consumption in an active pixel sensor array

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3883437A (en) * 1974-01-25 1975-05-13 Hughes Aircraft Co Monolithic IR detector arrays with direct injection charge coupled device readout
NL180157C (nl) * 1975-06-09 1987-01-02 Philips Nv Halfgeleider beeldopneeminrichting.

Also Published As

Publication number Publication date
JPS5345119A (en) 1978-04-22
FR2367353B1 (nl) 1982-02-26
DE2745046C3 (de) 1981-01-29
FR2367353A1 (fr) 1978-05-05
NL7711000A (nl) 1978-04-10
DE2745046A1 (de) 1978-04-20
DE2745046B2 (de) 1980-05-29
NL179775C (nl) 1986-11-03
GB1531180A (en) 1978-11-01
JPS5714063B2 (nl) 1982-03-20
US4155094A (en) 1979-05-15

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Legal Events

Date Code Title Description
BC A request for examination has been filed
A85 Still pending on 85-01-01
V4 Discontinued because of reaching the maximum lifetime of a patent

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