NL179247C - LENS SYSTEM FOR PARTICULATE RADIATION. - Google Patents

LENS SYSTEM FOR PARTICULATE RADIATION.

Info

Publication number
NL179247C
NL179247C NLAANVRAGE7401645,A NL7401645A NL179247C NL 179247 C NL179247 C NL 179247C NL 7401645 A NL7401645 A NL 7401645A NL 179247 C NL179247 C NL 179247C
Authority
NL
Netherlands
Prior art keywords
lens system
particulate radiation
particulate
radiation
lens
Prior art date
Application number
NLAANVRAGE7401645,A
Other languages
Dutch (nl)
Other versions
NL7401645A (en
NL179247B (en
Original Assignee
Siemens Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens Ag filed Critical Siemens Ag
Publication of NL7401645A publication Critical patent/NL7401645A/xx
Publication of NL179247B publication Critical patent/NL179247B/en
Application granted granted Critical
Publication of NL179247C publication Critical patent/NL179247C/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/09—Diaphragms; Shields associated with electron or ion-optical arrangements; Compensation of disturbing fields
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/10—Lenses
    • H01J37/14—Lenses magnetic
    • H01J37/141—Electromagnetic lenses
    • H01J37/1416—Electromagnetic lenses with superconducting coils
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • H01J37/1471—Arrangements for directing or deflecting the discharge along a desired path for centering, aligning or positioning of ray or beam
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S505/00—Superconductor technology: apparatus, material, process
    • Y10S505/825—Apparatus per se, device per se, or process of making or operating same
    • Y10S505/871—Magnetic lens

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Magnetic Resonance Imaging Apparatus (AREA)
  • Electron Beam Exposure (AREA)
  • Superconductor Devices And Manufacturing Methods Thereof (AREA)
NLAANVRAGE7401645,A 1973-02-16 1974-02-06 LENS SYSTEM FOR PARTICULATE RADIATION. NL179247C (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE2307822A DE2307822C3 (en) 1973-02-16 1973-02-16 Superconducting lens system for corpuscular radiation

Publications (3)

Publication Number Publication Date
NL7401645A NL7401645A (en) 1974-08-20
NL179247B NL179247B (en) 1986-03-03
NL179247C true NL179247C (en) 1986-08-01

Family

ID=5872194

Family Applications (1)

Application Number Title Priority Date Filing Date
NLAANVRAGE7401645,A NL179247C (en) 1973-02-16 1974-02-06 LENS SYSTEM FOR PARTICULATE RADIATION.

Country Status (6)

Country Link
US (1) US3916201A (en)
JP (1) JPS49115264A (en)
DE (1) DE2307822C3 (en)
FR (1) FR2218651B1 (en)
GB (1) GB1459281A (en)
NL (1) NL179247C (en)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2541915A1 (en) * 1975-09-19 1977-03-31 Max Planck Gesellschaft BODY RAY MICROSCOPE WITH RING ZONE SEGMENT IMAGE
DE2726195C3 (en) * 1977-06-10 1980-02-21 Siemens Ag, 1000 Berlin Und 8000 Muenchen Magnetic objective lens for particle beam devices operating under vacuum, in particular objective lens for electron microscopes
JPS5748274Y2 (en) * 1977-07-11 1982-10-22
JPS6338523Y2 (en) * 1981-06-15 1988-10-11
JPH0537397Y2 (en) * 1985-12-10 1993-09-21
JP2611995B2 (en) * 1987-07-29 1997-05-21 秀典 松沢 Superconductor lens for charged particle convergence
NL8800344A (en) * 1988-02-12 1989-09-01 Philips Nv CHARGED PARTICLES BUNDLE DEVICE.
JPH0760661B2 (en) * 1988-07-22 1995-06-28 株式会社日立製作所 electronic microscope
US5012104A (en) * 1990-05-17 1991-04-30 Etec Systems, Inc. Thermally stable magnetic deflection assembly and method of making same
US5264706A (en) * 1991-04-26 1993-11-23 Fujitsu Limited Electron beam exposure system having an electromagnetic deflector configured for efficient cooling
EP0555492B1 (en) * 1991-08-30 1998-10-28 Hitachi, Ltd. Magnetic electron lens and electron microscope using same
US5376792A (en) * 1993-04-26 1994-12-27 Rj Lee Group, Inc. Scanning electron microscope
US5563415A (en) * 1995-06-07 1996-10-08 Arch Development Corporation Magnetic lens apparatus for a low-voltage high-resolution electron microscope
US6051839A (en) * 1996-06-07 2000-04-18 Arch Development Corporation Magnetic lens apparatus for use in high-resolution scanning electron microscopes and lithographic processes
US6046457A (en) * 1998-01-09 2000-04-04 International Business Machines Corporation Charged particle beam apparatus having anticontamination means
US7345287B2 (en) * 2005-09-30 2008-03-18 Applied Materials, Inc. Cooling module for charged particle beam column elements
NL2013814B1 (en) * 2013-11-14 2016-05-10 Mapper Lithography Ip Bv Multi-electrode vacuum arrangement.

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB615257A (en) * 1946-05-13 1949-01-04 Gerhard Liebmann Improvements in or relating to electron microscopes and other electronic apparatus employing electron lenses
US3008044A (en) * 1960-02-25 1961-11-07 Gen Electric Application of superconductivity in guiding charged particles
DE1209224B (en) * 1963-08-16 1966-01-20 Siemens Ag Magnetic lens arrangement for corpuscular beam devices working on the pump
DE1564714C3 (en) * 1966-09-21 1975-04-24 Siemens Ag, 1000 Berlin Und 8000 Muenchen Magnetic lens arrangement for particle beam devices operating under vacuum, in particular objective lens arrangement for electron microscopes
GB1234509A (en) * 1968-05-31 1971-06-03

Also Published As

Publication number Publication date
FR2218651A1 (en) 1974-09-13
DE2307822C3 (en) 1982-03-18
DE2307822A1 (en) 1974-08-22
US3916201A (en) 1975-10-28
FR2218651B1 (en) 1977-03-04
GB1459281A (en) 1976-12-22
NL7401645A (en) 1974-08-20
JPS49115264A (en) 1974-11-02
NL179247B (en) 1986-03-03
DE2307822B2 (en) 1981-07-02

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Legal Events

Date Code Title Description
BA A request for search or an international-type search has been filed
BB A search report has been drawn up
BC A request for examination has been filed
A85 Still pending on 85-01-01
V1 Lapsed because of non-payment of the annual fee