NL173668B - Hekwerk. - Google Patents
Hekwerk.Info
- Publication number
- NL173668B NL173668B NLAANVRAGE7412171,A NL173668DA NL173668B NL 173668 B NL173668 B NL 173668B NL 173668D A NL173668D A NL 173668DA NL 173668 B NL173668 B NL 173668B
- Authority
- NL
- Netherlands
- Prior art keywords
- fences
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
- G01N23/223—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material by irradiating the sample with X-rays or gamma-rays and by measuring X-ray fluorescence
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/07—Investigating materials by wave or particle radiation secondary emission
- G01N2223/076—X-ray fluorescence
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| NL316826X | 1952-11-08 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| NL173668B true NL173668B (nl) |
Family
ID=19783831
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NLAANVRAGE7412171,A NL173668B (nl) | 1952-11-08 | Hekwerk. | |
| NL85501D NL85501C (xx) | 1952-11-08 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL85501D NL85501C (xx) | 1952-11-08 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US2783385A (xx) |
| BE (1) | BE524089A (xx) |
| CH (1) | CH316826A (xx) |
| DE (1) | DE1027903B (xx) |
| FR (1) | FR1090233A (xx) |
| GB (1) | GB741854A (xx) |
| NL (2) | NL85501C (xx) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2835820A (en) * | 1955-03-07 | 1958-05-20 | Jr La Verne S Birks | Curved crystal fluorescent x-ray spectrograph |
| US3031571A (en) * | 1956-05-21 | 1962-04-24 | Well Completions Inc | Apparatus and method for conditioning and analyzing earth components |
| US3073952A (en) * | 1956-09-11 | 1963-01-15 | Gen Electric | X-ray diffraction apparatus |
| US2898469A (en) * | 1956-09-11 | 1959-08-04 | Gen Electric | X-ray diffraction apparatus |
| GB847265A (en) * | 1957-09-11 | 1960-09-07 | Ass Elect Ind | Improvements relating to mechanical linkages |
| US2957079A (en) * | 1957-12-27 | 1960-10-18 | Gen Electric | Penetrating ray emission coding |
| US3012443A (en) * | 1960-01-11 | 1961-12-12 | Patent Man Inc | Mechanical movement for translating rotary motion to linear motion |
| US4199678A (en) * | 1979-01-31 | 1980-04-22 | U.S. Philips Corporation | Asymmetric texture sensitive X-ray powder diffractometer |
| DE3125803A1 (de) * | 1981-06-30 | 1983-01-13 | Siemens AG, 1000 Berlin und 8000 München | Kristall-roentgen-sequenzspektrometer |
| JP3531098B2 (ja) * | 1998-12-28 | 2004-05-24 | 理学電機工業株式会社 | 蛍光ｘ線分析装置 |
| JP6324060B2 (ja) * | 2013-12-24 | 2018-05-16 | 株式会社日立ハイテクサイエンス | Ｘ線分析装置 |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| BE495202A (xx) * | 1949-04-19 | |||
| US2532810A (en) * | 1950-01-13 | 1950-12-05 | Gen Electric | X-ray diffraction apparatus for use with radioactive materials |
| US2578722A (en) * | 1950-05-18 | 1951-12-18 | United States Steel Corp | Apparatus for determining coating thickness |
-
0
- NL NLAANVRAGE7412171,A patent/NL173668B/xx unknown
- BE BE524089D patent/BE524089A/xx unknown
- NL NL85501D patent/NL85501C/xx active
-
1953
- 1953-10-30 US US389448A patent/US2783385A/en not_active Expired - Lifetime
- 1953-11-05 DE DEN7979A patent/DE1027903B/de active Pending
- 1953-11-05 GB GB30616/53A patent/GB741854A/en not_active Expired
- 1953-11-06 CH CH316826D patent/CH316826A/de unknown
- 1953-11-06 FR FR1090233D patent/FR1090233A/fr not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| CH316826A (de) | 1956-10-31 |
| DE1027903B (de) | 1958-04-10 |
| BE524089A (xx) | |
| US2783385A (en) | 1957-02-26 |
| GB741854A (en) | 1955-12-14 |
| NL85501C (xx) | |
| FR1090233A (fr) | 1955-03-29 |
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