NL125781C - - Google Patents
Info
- Publication number
- NL125781C NL125781C NL125781DA NL125781C NL 125781 C NL125781 C NL 125781C NL 125781D A NL125781D A NL 125781DA NL 125781 C NL125781 C NL 125781C
- Authority
- NL
- Netherlands
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/0226—Quinonediazides characterised by the non-macromolecular additives
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DEK36878A DE1097273B (de) | 1959-02-04 | 1959-02-04 | o-Chinondiazide enthaltende Kopierschichten fuer Flachdruckformen |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| NL125781C true NL125781C (fr) |
Family
ID=7220828
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL125781D NL125781C (fr) | 1959-02-04 | ||
| NL247939D NL247939A (fr) | 1959-02-04 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL247939D NL247939A (fr) | 1959-02-04 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US3126281A (fr) |
| BE (1) | BE587146A (fr) |
| CH (1) | CH388778A (fr) |
| DE (1) | DE1097273B (fr) |
| FR (1) | FR1250805A (fr) |
| GB (1) | GB937159A (fr) |
| NL (2) | NL247939A (fr) |
Families Citing this family (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CA774047A (en) * | 1963-12-09 | 1967-12-19 | Shipley Company | Light-sensitive material and process for the development thereof |
| GB1116737A (en) * | 1966-02-28 | 1968-06-12 | Agfa Gevaert Nv | Bis-(o-quinone diazide) modified bisphenols |
| US3837860A (en) * | 1969-06-16 | 1974-09-24 | L Roos | PHOTOSENSITIVE MATERIALS COMPRISING POLYMERS HAVING RECURRING PENDENT o-QUINONE DIAZIDE GROUPS |
| US4193797A (en) * | 1971-03-22 | 1980-03-18 | E. I. Dupont De Nemours And Company | Method for making photoresists |
| US4196003A (en) * | 1974-02-01 | 1980-04-01 | Fuji Photo Film Co., Ltd. | Light-sensitive o-quinone diazide copying composition |
| US4007047A (en) * | 1974-06-06 | 1977-02-08 | International Business Machines Corporation | Modified processing of positive photoresists |
| US4093461A (en) * | 1975-07-18 | 1978-06-06 | Gaf Corporation | Positive working thermally stable photoresist composition, article and method of using |
| US4268602A (en) * | 1978-12-05 | 1981-05-19 | Toray Industries, Ltd. | Photosensitive O-quinone diazide containing composition |
| DE3151078A1 (de) * | 1981-12-23 | 1983-07-28 | Hoechst Ag, 6230 Frankfurt | Verfahren zur herstellung von reliefbildern |
| DE3584316D1 (de) * | 1984-06-01 | 1991-11-14 | Rohm & Haas | Lichtempfindliche beschichtungszusammensetzung, aus diesem hergestellte thermisch stabile beschichtungen und verfahren zur herstellung von thermisch stabilen polymerbildern. |
| JPS61125019A (ja) * | 1984-11-16 | 1986-06-12 | インタ−ナショナル ビジネス マシ−ンズ コ−ポレ−ション | 集積回路製造方法及びその方法に使用する光導電性フオトレジスト複合体 |
| JPS6478249A (en) * | 1987-09-18 | 1989-03-23 | Fuji Photo Film Co Ltd | Photosensitive material and image forming method |
| US5272026A (en) * | 1987-12-18 | 1993-12-21 | Ucb S.A. | Negative image process utilizing photosensitive compositions containing aromatic fused polycyclic sulfonic acid and partial ester or phenolic resin with diazoquinone sulfonic acid or diazoquinone carboxylic acid, and associated imaged article |
| GB8729510D0 (en) * | 1987-12-18 | 1988-02-03 | Ucb Sa | Photosensitive compositions containing phenolic resins & diazoquinone compounds |
| JP2944296B2 (ja) | 1992-04-06 | 1999-08-30 | 富士写真フイルム株式会社 | 感光性平版印刷版の製造方法 |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE596731C (de) * | 1932-05-23 | 1934-05-09 | Kalle & Co Akt Ges | Verfahren zur Darstellung von hoehermolekularen Diazoverbindungen |
| DE907739C (de) * | 1949-07-23 | 1954-02-18 | Kalle & Co Ag | Verfahren zur Herstellung von Kopien, besonders Druckformen, mit Hilfe von Diazoverbindungen und dafuer verwendbares lichtempfindliches Material |
| US2702243A (en) * | 1950-06-17 | 1955-02-15 | Azoplate Corp | Light-sensitive photographic element and process of producing printing plates |
| NL78025C (fr) * | 1951-02-02 | |||
| BE545042A (fr) * | 1955-02-11 | |||
| BE551933A (fr) * | 1955-10-25 |
-
0
- NL NL125781D patent/NL125781C/xx active
- US US3126281D patent/US3126281A/en not_active Expired - Lifetime
- NL NL247939D patent/NL247939A/xx unknown
-
1959
- 1959-02-04 DE DEK36878A patent/DE1097273B/de active Pending
-
1960
- 1960-01-26 CH CH74460A patent/CH388778A/de unknown
- 1960-01-28 GB GB3097/60A patent/GB937159A/en not_active Expired
- 1960-02-01 BE BE587146A patent/BE587146A/fr unknown
- 1960-02-02 FR FR817295A patent/FR1250805A/fr not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| FR1250805A (fr) | 1961-01-13 |
| CH388778A (de) | 1965-02-28 |
| GB937159A (en) | 1963-09-18 |
| DE1097273B (de) | 1961-01-12 |
| US3126281A (en) | 1964-03-24 |
| BE587146A (fr) | 1960-05-30 |
| NL247939A (fr) |