NL1032989A1 - Opstellingen met een afdichtingsring voor immersielithografiesystemen. - Google Patents

Opstellingen met een afdichtingsring voor immersielithografiesystemen.

Info

Publication number
NL1032989A1
NL1032989A1 NL1032989A NL1032989A NL1032989A1 NL 1032989 A1 NL1032989 A1 NL 1032989A1 NL 1032989 A NL1032989 A NL 1032989A NL 1032989 A NL1032989 A NL 1032989A NL 1032989 A1 NL1032989 A1 NL 1032989A1
Authority
NL
Netherlands
Prior art keywords
arrangements
sealing ring
immersion lithography
lithography systems
systems
Prior art date
Application number
NL1032989A
Other languages
English (en)
Other versions
NL1032989C2 (nl
Inventor
Burn-Jeng Lin
Tsai-Sheng Gau
Chun-Kuang Chen
Ru-Gun Liu
Shinn-Sheng Yu
Jen-Chieh Shih
Original Assignee
Taiwan Semiconductor Mfg
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Taiwan Semiconductor Mfg filed Critical Taiwan Semiconductor Mfg
Publication of NL1032989A1 publication Critical patent/NL1032989A1/nl
Application granted granted Critical
Publication of NL1032989C2 publication Critical patent/NL1032989C2/nl

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
NL1032989A 2005-12-05 2006-12-04 Opstellingen met een afdichtingsring voor immersielithografiesystemen. NL1032989C2 (nl)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US74270105P 2005-12-05 2005-12-05
US74270105 2005-12-05
US11/522,611 US7517639B2 (en) 2004-06-23 2006-09-18 Seal ring arrangements for immersion lithography systems
US52261106 2006-09-18

Publications (2)

Publication Number Publication Date
NL1032989A1 true NL1032989A1 (nl) 2007-06-06
NL1032989C2 NL1032989C2 (nl) 2008-06-02

Family

ID=38242195

Family Applications (1)

Application Number Title Priority Date Filing Date
NL1032989A NL1032989C2 (nl) 2005-12-05 2006-12-04 Opstellingen met een afdichtingsring voor immersielithografiesystemen.

Country Status (4)

Country Link
US (2) US7517639B2 (nl)
JP (1) JP4500954B2 (nl)
NL (1) NL1032989C2 (nl)
TW (1) TWI324372B (nl)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7517639B2 (en) * 2004-06-23 2009-04-14 Taiwan Semiconductor Manufacturing Co., Ltd. Seal ring arrangements for immersion lithography systems
US8416383B2 (en) * 2006-12-13 2013-04-09 Asml Netherlands B.V. Lithographic apparatus and method
US8634052B2 (en) * 2006-12-13 2014-01-21 Asml Netherlands B.V. Lithographic apparatus and method involving a ring to cover a gap between a substrate and a substrate table
NL2003575A (en) 2008-10-29 2010-05-03 Asml Netherlands Bv Lithographic apparatus and device manufacturing method.
NL2004807A (en) * 2009-06-30 2011-01-04 Asml Netherlands Bv Substrate table for a lithographic apparatus, litographic apparatus, method of using a substrate table and device manufacturing method.
NL2006244A (en) 2010-03-16 2011-09-19 Asml Netherlands Bv Lithographic apparatus, cover for use in a lithographic apparatus and method for designing a cover for use in a lithographic apparatus.
NL2006203A (en) * 2010-03-16 2011-09-19 Asml Netherlands Bv Cover for a substrate table, substrate table for a lithographic apparatus, lithographic apparatus, and device manufacturing method.
JP5313293B2 (ja) 2010-05-19 2013-10-09 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置、リソグラフィ装置で使用する流体ハンドリング構造およびデバイス製造方法
JP7015910B2 (ja) 2017-10-12 2022-02-03 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置において使用される基板ホルダ
US11378889B2 (en) 2020-10-29 2022-07-05 Taiwan Semiconductor Manufacturing Company, Ltd. Immersion lithography system and method of using

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2753930B2 (ja) * 1992-11-27 1998-05-20 キヤノン株式会社 液浸式投影露光装置
EP1372039B1 (en) * 2002-06-13 2007-11-14 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
US6788477B2 (en) * 2002-10-22 2004-09-07 Taiwan Semiconductor Manufacturing Co., Ltd. Apparatus for method for immersion lithography
JP3953460B2 (ja) 2002-11-12 2007-08-08 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ投影装置
EP1486828B1 (en) * 2003-06-09 2013-10-09 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
US7213963B2 (en) * 2003-06-09 2007-05-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP4572539B2 (ja) * 2004-01-19 2010-11-04 株式会社ニコン 露光装置及び露光方法、デバイス製造方法
US7517639B2 (en) * 2004-06-23 2009-04-14 Taiwan Semiconductor Manufacturing Co., Ltd. Seal ring arrangements for immersion lithography systems

Also Published As

Publication number Publication date
US7517639B2 (en) 2009-04-14
US20070008508A1 (en) 2007-01-11
JP2007158343A (ja) 2007-06-21
NL1032989C2 (nl) 2008-06-02
TW200723435A (en) 2007-06-16
JP4500954B2 (ja) 2010-07-14
TWI324372B (en) 2010-05-01
US7924401B2 (en) 2011-04-12
US20090180087A1 (en) 2009-07-16

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Legal Events

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AD1A A request for search or an international type search has been filed
RD2N Patents in respect of which a decision has been taken or a report has been made (novelty report)

Effective date: 20080125

PD2B A search report has been drawn up