NL1024355A1 - Reparatiewerkwijze voor defecten, in het bijzonder voor het repareren van kwartsdefecten op alternerende faseverschuivingsmaskers. - Google Patents

Reparatiewerkwijze voor defecten, in het bijzonder voor het repareren van kwartsdefecten op alternerende faseverschuivingsmaskers.

Info

Publication number
NL1024355A1
NL1024355A1 NL1024355A NL1024355A NL1024355A1 NL 1024355 A1 NL1024355 A1 NL 1024355A1 NL 1024355 A NL1024355 A NL 1024355A NL 1024355 A NL1024355 A NL 1024355A NL 1024355 A1 NL1024355 A1 NL 1024355A1
Authority
NL
Netherlands
Prior art keywords
defects
phase shift
repair method
alternating phase
shift masks
Prior art date
Application number
NL1024355A
Other languages
English (en)
Other versions
NL1024355C2 (nl
Inventor
Ralf Ludwig
Martin Verbeek
Original Assignee
Infineon Technologies Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Infineon Technologies Ag filed Critical Infineon Technologies Ag
Publication of NL1024355A1 publication Critical patent/NL1024355A1/nl
Application granted granted Critical
Publication of NL1024355C2 publication Critical patent/NL1024355C2/nl

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/72—Repair or correction of mask defects
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
    • G03F1/30—Alternating PSM, e.g. Levenson-Shibuya PSM; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/72—Repair or correction of mask defects
    • G03F1/74—Repair or correction of mask defects by charged particle beam [CPB], e.g. focused ion beam

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
NL1024355A 2002-09-24 2003-09-23 Reparatiewerkwijze voor defecten, in het bijzonder voor het repareren van kwartsdefecten op alternerende faseverschuivingsmaskers. NL1024355C2 (nl)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10244399 2002-09-24
DE10244399A DE10244399B4 (de) 2002-09-24 2002-09-24 Defekt-Reparatur-Verfahren zur Reparatur von Masken-Defekten

Publications (2)

Publication Number Publication Date
NL1024355A1 true NL1024355A1 (nl) 2004-03-25
NL1024355C2 NL1024355C2 (nl) 2008-02-14

Family

ID=32009874

Family Applications (1)

Application Number Title Priority Date Filing Date
NL1024355A NL1024355C2 (nl) 2002-09-24 2003-09-23 Reparatiewerkwijze voor defecten, in het bijzonder voor het repareren van kwartsdefecten op alternerende faseverschuivingsmaskers.

Country Status (3)

Country Link
US (1) US7108798B2 (nl)
DE (1) DE10244399B4 (nl)
NL (1) NL1024355C2 (nl)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20060147814A1 (en) * 2005-01-03 2006-07-06 Ted Liang Methods for repairing an alternating phase-shift mask
DE102005004070B3 (de) * 2005-01-28 2006-08-03 Infineon Technologies Ag Verfahren zum Entfernen von Defektmaterial einer Lithographiemaske
KR100818998B1 (ko) * 2006-09-01 2008-04-02 삼성전자주식회사 결함이 수정된 포토마스크 및 포토마스크의 결함 수정 방법
CN102308256B (zh) * 2009-02-16 2013-09-25 大日本印刷株式会社 光掩模、光掩模的制造方法及修正方法
US9086639B2 (en) * 2013-09-12 2015-07-21 International Business Machines Corporation Fabrication of on-product aberration monitors with nanomachining
DE102017203841A1 (de) 2017-03-08 2018-09-13 Carl Zeiss Smt Gmbh Verfahren und Vorrichtung zum Ermitteln einer Reparaturform zum Bearbeiten eines Defekts einer photolithographischen Maske

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4426730B2 (ja) * 2001-01-12 2010-03-03 エスアイアイ・ナノテクノロジー株式会社 マスクの黒欠陥修正方法

Also Published As

Publication number Publication date
DE10244399A1 (de) 2004-04-15
NL1024355C2 (nl) 2008-02-14
US20040124175A1 (en) 2004-07-01
DE10244399B4 (de) 2006-08-03
US7108798B2 (en) 2006-09-19

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Legal Events

Date Code Title Description
AD1A A request for search or an international type search has been filed
RD2N Patents in respect of which a decision has been taken or a report has been made (novelty report)

Effective date: 20071213

PD2B A search report has been drawn up
VD1 Lapsed due to non-payment of the annual fee

Effective date: 20090401