NL1016934A1 - Projectiebelichtingsapparaat en werkwijze voor het fabriceren van inrichtingen met gebruikmaking hiervan. - Google Patents

Projectiebelichtingsapparaat en werkwijze voor het fabriceren van inrichtingen met gebruikmaking hiervan.

Info

Publication number
NL1016934A1
NL1016934A1 NL1016934A NL1016934A NL1016934A1 NL 1016934 A1 NL1016934 A1 NL 1016934A1 NL 1016934 A NL1016934 A NL 1016934A NL 1016934 A NL1016934 A NL 1016934A NL 1016934 A1 NL1016934 A1 NL 1016934A1
Authority
NL
Netherlands
Prior art keywords
exposure apparatus
projection exposure
manufacturing devices
manufacturing
devices
Prior art date
Application number
NL1016934A
Other languages
English (en)
Inventor
Satoru Kumagai
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of NL1016934A1 publication Critical patent/NL1016934A1/nl

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/14—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation
    • G02B13/143—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation for use with ultraviolet radiation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0025—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration
    • G02B27/0037—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration with diffracting elements
    • G02B27/0043—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration with diffracting elements in projection exposure systems, e.g. microlithographic systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70308—Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Toxicology (AREA)
  • Public Health (AREA)
  • Epidemiology (AREA)
  • Environmental & Geological Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
  • Glass Compositions (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Lenses (AREA)
NL1016934A 1999-12-21 2000-12-20 Projectiebelichtingsapparaat en werkwijze voor het fabriceren van inrichtingen met gebruikmaking hiervan. NL1016934A1 (nl)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP36225799A JP2001176789A (ja) 1999-12-21 1999-12-21 投影露光装置および該投影露光装置を用いたデバイスの製造方法

Publications (1)

Publication Number Publication Date
NL1016934A1 true NL1016934A1 (nl) 2001-06-25

Family

ID=18476393

Family Applications (1)

Application Number Title Priority Date Filing Date
NL1016934A NL1016934A1 (nl) 1999-12-21 2000-12-20 Projectiebelichtingsapparaat en werkwijze voor het fabriceren van inrichtingen met gebruikmaking hiervan.

Country Status (6)

Country Link
US (1) US20010012099A1 (nl)
JP (1) JP2001176789A (nl)
KR (1) KR20010062343A (nl)
DE (1) DE10063239A1 (nl)
NL (1) NL1016934A1 (nl)
TW (1) TW487961B (nl)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113491044A (zh) * 2019-02-27 2021-10-08 奥斯兰姆奥普托半导体股份有限两合公司 光电半导体构件和制造光电半导体构件的方法

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1330679A4 (en) 2000-10-03 2006-09-06 Corning Inc PHOTOLITHOGRAPHIC PROCESSES AND SYSTEMS
JP2002244034A (ja) 2001-02-21 2002-08-28 Nikon Corp 投影光学系および該投影光学系を備えた露光装置
JP2002323652A (ja) 2001-02-23 2002-11-08 Nikon Corp 投影光学系，該投影光学系を備えた投影露光装置および投影露光方法
JP2002323653A (ja) * 2001-02-23 2002-11-08 Nikon Corp 投影光学系，投影露光装置および投影露光方法
DE10123230A1 (de) 2001-05-12 2002-11-28 Zeiss Carl Diffraktives optisches Element sowie optische Anordnung mit einem diffraktiven optischen Element
KR100825000B1 (ko) * 2002-05-18 2008-04-24 주식회사 하이닉스반도체 이미지 콘트라스트를 향상시킬 수 있는 노광 시스템
US7241539B2 (en) 2002-10-07 2007-07-10 Samsung Electronics Co., Ltd. Photomasks including shadowing elements therein and related methods and systems
DE10318560A1 (de) * 2003-04-24 2004-11-11 Carl Zeiss Sms Gmbh Anordnung zur Inspektion von Objekten, insbesondere von Masken in der Mikrolithographie
KR100558195B1 (ko) * 2004-06-30 2006-03-10 삼성전자주식회사 광도 보정 방법과 노광 방법 및 이를 수행하기 위한 광도보정 장치와 노광 장치
WO2006136184A1 (de) * 2005-06-21 2006-12-28 Carl Zeiss Smt Ag Projektionsobjektiv für die mikrolithographie und abschlusselement dafür
JP4957983B2 (ja) * 2005-06-30 2012-06-20 株式会社ニコン 顕微鏡
JP4965874B2 (ja) * 2006-03-13 2012-07-04 並木精密宝石株式会社 短波長紫外線検出器及びその製造方法
JP2008047673A (ja) * 2006-08-14 2008-02-28 Canon Inc 露光装置及びデバイス製造方法
CN107329280A (zh) 2008-09-25 2017-11-07 纽约市哥伦比亚大学托管会 提供光刺激和结构成像的装置、设备和方法
JP5854593B2 (ja) * 2010-11-17 2016-02-09 キヤノン株式会社 積層型回折光学素子

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113491044A (zh) * 2019-02-27 2021-10-08 奥斯兰姆奥普托半导体股份有限两合公司 光电半导体构件和制造光电半导体构件的方法

Also Published As

Publication number Publication date
JP2001176789A (ja) 2001-06-29
TW487961B (en) 2002-05-21
KR20010062343A (ko) 2001-07-07
DE10063239A1 (de) 2001-06-28
US20010012099A1 (en) 2001-08-09

Similar Documents

Publication Publication Date Title
DE60219839D1 (de) Abbildungsvorrichtung und Verfahren zu deren Herstellung
NL1016934A1 (nl) Projectiebelichtingsapparaat en werkwijze voor het fabriceren van inrichtingen met gebruikmaking hiervan.
EP1502291A4 (en) EXPOSURE SYSTEM AND METHOD FOR MANUFACTURING A DEVICE USING THE SAME
DE60328951D1 (de) Bilderzeugungsgerät und Verfahren
DE60035549D1 (de) Bildaufzeichnungsgerät und Verfahren
DE60126235D1 (de) Belichtungsverfahren und -system
NL1019802A1 (nl) CMOS halfgeleiderinrichting en werkwijze voor de vervaardiging daarvan.
NL1021816A1 (nl) Belichtingswerkwijze en belichtingsinrichting.
DE69923294D1 (de) Mikrospiegelvorrichtung und Herstellungsverfahren
DE60026258D1 (de) Bildverarbeitungsverfahren und Bildverarbeitungsvorrichtung
DE60026728D1 (de) Bauteilbestückungseinrichtung und verfahren
DE60045044D1 (de) Angesichtsphotographiervorrichtung und -verfahren
DE60222175D1 (de) Bildverarbeitungsvorrichtung und verfahren dafür
DE60114112D1 (de) Bilderzeugungsvorrichtung und entsprechendes Verfahren
DE60105477D1 (de) Beschichtungs-Vorrichtung und Verfahren
NL1001134A1 (nl) Werkwijze voor het verharden van CaCO3.
DE60021321D1 (de) Bilderzeugungsverfahren und Gerät
NL1009351A1 (nl) Werkwijze voor het vormen van contactpennen van een halfgeleiderinrichting.
DE60131940D1 (de) Bilderzeugungsgerät und Verfahren
DE60024050D1 (de) Bildkommunikationsgerät und Verfahren
DE69802063D1 (de) Belichtungsapparat und Verfahren
NL1024870A1 (nl) Onvertraagd maskeringssysteem en werkwijze voor beelden.
NL1023611A1 (nl) Beeldschermsysteem en werkwijze voor het elimineren van overblijvende beelden daarin.
SG111171A1 (en) Lithographic projection apparatus and device manufacturing method
SG115590A1 (en) Lithographic projection apparatus and device manufacturing method

Legal Events

Date Code Title Description
AD1A A request for search or an international type search has been filed
RD2N Patents in respect of which a decision has been taken or a report has been made (novelty report)

Effective date: 20020312