MY193962A - Sputtering arrangement and sputtering method for optimized distribution of the energy flow - Google Patents

Sputtering arrangement and sputtering method for optimized distribution of the energy flow

Info

Publication number
MY193962A
MY193962A MYPI2018000736A MYPI2018000736A MY193962A MY 193962 A MY193962 A MY 193962A MY PI2018000736 A MYPI2018000736 A MY PI2018000736A MY PI2018000736 A MYPI2018000736 A MY PI2018000736A MY 193962 A MY193962 A MY 193962A
Authority
MY
Malaysia
Prior art keywords
sputtering
arrangement
energy flow
optimized distribution
sputtering method
Prior art date
Application number
MYPI2018000736A
Other languages
English (en)
Inventor
Siegfried Krassnitzer
Daniel Lendi
Denis Kurapov
Original Assignee
Oerlikon Surface Solutions Ag Pfaffikon
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oerlikon Surface Solutions Ag Pfaffikon filed Critical Oerlikon Surface Solutions Ag Pfaffikon
Publication of MY193962A publication Critical patent/MY193962A/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3464—Operating strategies
    • H01J37/3467—Pulsed operation, e.g. HIPIMS
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3485—Sputtering using pulsed power to the target
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3444—Associated circuits

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
MYPI2018000736A 2015-11-12 2016-11-14 Sputtering arrangement and sputtering method for optimized distribution of the energy flow MY193962A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201562254451P 2015-11-12 2015-11-12
PCT/EP2016/001891 WO2017080672A1 (de) 2015-11-12 2016-11-14 Sputter-anordnung und - verfahren zur optimierten verteilung des energieflusses

Publications (1)

Publication Number Publication Date
MY193962A true MY193962A (en) 2022-11-03

Family

ID=57354318

Family Applications (1)

Application Number Title Priority Date Filing Date
MYPI2018000736A MY193962A (en) 2015-11-12 2016-11-14 Sputtering arrangement and sputtering method for optimized distribution of the energy flow

Country Status (17)

Country Link
US (1) US10943774B2 (es)
EP (1) EP3375006B1 (es)
JP (1) JP6895432B2 (es)
KR (1) KR20180081776A (es)
CN (1) CN108352286B (es)
BR (1) BR112018009585B1 (es)
CA (1) CA3004920C (es)
ES (1) ES2883198T3 (es)
HU (1) HUE055816T2 (es)
IL (1) IL259263B (es)
MX (1) MX2018005902A (es)
MY (1) MY193962A (es)
PH (1) PH12018501018A1 (es)
PL (1) PL3375006T3 (es)
RU (1) RU2741614C2 (es)
SG (1) SG11201803970RA (es)
WO (1) WO2017080672A1 (es)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7509790B2 (ja) 2019-02-11 2024-07-02 アプライド マテリアルズ インコーポレイテッド パルスｐｖｄにおけるプラズマ改質によるウエハからの粒子除去方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19651615C1 (de) * 1996-12-12 1997-07-10 Fraunhofer Ges Forschung Verfahren zum Aufbringen von Kohlenstoffschichten durch reaktives Magnetron-Sputtern
US9771648B2 (en) * 2004-08-13 2017-09-26 Zond, Inc. Method of ionized physical vapor deposition sputter coating high aspect-ratio structures
EP2272080B1 (de) * 2008-04-28 2012-08-01 CemeCon AG Vorrichtung und verfahren zum vorbehandeln und beschichten von körpern
RU2371514C1 (ru) * 2008-08-20 2009-10-27 Государственное образовательное учреждение высшего профессионального образования "Томский политехнический университет" Дуальная магнетронная распылительная система
DE102008050499B4 (de) * 2008-10-07 2014-02-06 Systec System- Und Anlagentechnik Gmbh & Co. Kg PVD-Beschichtungsverfahren, Vorrichtung zur Durchführung des Verfahrens und nach dem Verfahren beschichtete Substrate
EP2700083B1 (de) * 2011-04-20 2015-04-22 Oerlikon Surface Solutions AG, Trübbach Verfahren zur bereistellung sequenzieller leistungspulse
DE102011018363A1 (de) * 2011-04-20 2012-10-25 Oerlikon Trading Ag, Trübbach Hochleistungszerstäubungsquelle
DE102011116576A1 (de) * 2011-10-21 2013-04-25 Oerlikon Trading Ag, Trübbach Bohrer mit Beschichtung

Also Published As

Publication number Publication date
BR112018009585B1 (pt) 2022-12-27
IL259263A (en) 2018-07-31
CN108352286B (zh) 2020-12-22
ES2883198T3 (es) 2021-12-07
EP3375006B1 (de) 2021-05-12
RU2018120892A (ru) 2019-12-13
US20180330931A1 (en) 2018-11-15
MX2018005902A (es) 2019-04-04
PL3375006T3 (pl) 2021-11-22
CA3004920A1 (en) 2017-05-18
CA3004920C (en) 2024-01-23
SG11201803970RA (en) 2018-06-28
KR20180081776A (ko) 2018-07-17
IL259263B (en) 2022-04-01
US10943774B2 (en) 2021-03-09
EP3375006A1 (de) 2018-09-19
JP2018535323A (ja) 2018-11-29
JP6895432B2 (ja) 2021-06-30
PH12018501018A1 (en) 2018-12-17
CN108352286A (zh) 2018-07-31
HUE055816T2 (hu) 2021-12-28
RU2741614C2 (ru) 2021-01-27
BR112018009585A2 (pt) 2018-12-04
WO2017080672A1 (de) 2017-05-18
RU2018120892A3 (es) 2020-01-30

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