MY103325A - Negative photoresist systems - Google Patents

Negative photoresist systems

Info

Publication number
MY103325A
MY103325A MYPI88000851A MYPI19880851A MY103325A MY 103325 A MY103325 A MY 103325A MY PI88000851 A MYPI88000851 A MY PI88000851A MY PI19880851 A MYPI19880851 A MY PI19880851A MY 103325 A MY103325 A MY 103325A
Authority
MY
Malaysia
Prior art keywords
polyglutarimide
negative
hydrogen
resist
exposing
Prior art date
Application number
MYPI88000851A
Other languages
English (en)
Inventor
Palatyur Sundarappier Kalyanaraman
Original Assignee
Rohm & Haas
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rohm & Haas filed Critical Rohm & Haas
Publication of MY103325A publication Critical patent/MY103325A/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C5/00—Photographic processes or agents therefor; Regeneration of such processing agents
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L79/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen or carbon only, not provided for in groups C08L61/00 - C08L77/00
    • C08L79/04—Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/008—Azides
    • G03F7/0085—Azides characterised by the non-macromolecular additives
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0387—Polyamides or polyimides
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/128—Radiation-activated cross-linking agent containing

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Other Resins Obtained By Reactions Not Involving Carbon-To-Carbon Unsaturated Bonds (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Developing Agents For Electrophotography (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
MYPI88000851A 1984-01-16 1988-07-28 Negative photoresist systems MY103325A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/571,053 US4569897A (en) 1984-01-16 1984-01-16 Negative photoresist compositions with polyglutarimide polymer

Publications (1)

Publication Number Publication Date
MY103325A true MY103325A (en) 1993-05-29

Family

ID=24282141

Family Applications (1)

Application Number Title Priority Date Filing Date
MYPI88000851A MY103325A (en) 1984-01-16 1988-07-28 Negative photoresist systems

Country Status (14)

Country Link
US (1) US4569897A (cg-RX-API-DMAC7.html)
EP (1) EP0149553B1 (cg-RX-API-DMAC7.html)
JP (1) JPS60159744A (cg-RX-API-DMAC7.html)
KR (1) KR870000678B1 (cg-RX-API-DMAC7.html)
AT (1) ATE63647T1 (cg-RX-API-DMAC7.html)
AU (1) AU581199B2 (cg-RX-API-DMAC7.html)
BR (1) BR8500146A (cg-RX-API-DMAC7.html)
CA (1) CA1272059A (cg-RX-API-DMAC7.html)
DE (1) DE3582807D1 (cg-RX-API-DMAC7.html)
HK (1) HK78291A (cg-RX-API-DMAC7.html)
IL (1) IL74073A (cg-RX-API-DMAC7.html)
MY (1) MY103325A (cg-RX-API-DMAC7.html)
PH (1) PH21005A (cg-RX-API-DMAC7.html)
ZA (1) ZA85320B (cg-RX-API-DMAC7.html)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4636532A (en) * 1985-10-11 1987-01-13 Shipley Company Inc. Method for preparing polyglutarimide having a lower molecular weight and a low polydispersity
US4980264A (en) * 1985-12-17 1990-12-25 International Business Machines Corporation Photoresist compositions of controlled dissolution rate in alkaline developers
US4720445A (en) * 1986-02-18 1988-01-19 Allied Corporation Copolymers from maleimide and aliphatic vinyl ethers and esters used in positive photoresist
US4968581A (en) * 1986-02-24 1990-11-06 Hoechst Celanese Corporation High resolution photoresist of imide containing polymers
US4837124A (en) * 1986-02-24 1989-06-06 Hoechst Celanese Corporation High resolution photoresist of imide containing polymers
US4912018A (en) * 1986-02-24 1990-03-27 Hoechst Celanese Corporation High resolution photoresist based on imide containing polymers
JPS6344648A (ja) * 1986-08-12 1988-02-25 Matsushita Electric Ind Co Ltd パタ−ン形成用コントラストエンハンスト材料
US4810613A (en) * 1987-05-22 1989-03-07 Hoechst Celanese Corporation Blocked monomer and polymers therefrom for use as photoresists
US5081001A (en) * 1987-05-22 1992-01-14 Hoechst Celanese Corporation Blocked monomer and polymers therefrom for use as photoresists
US4962171A (en) * 1987-05-22 1990-10-09 Hoechst Celanese Corporation Blocked monomer and polymers therefrom for use as photoresists
US4814258A (en) * 1987-07-24 1989-03-21 Motorola Inc. PMGI bi-layer lift-off process
KR100211546B1 (ko) * 1996-10-24 1999-08-02 김영환 신규한 포토레지스트용 공중합체
US6495311B1 (en) 2000-03-17 2002-12-17 International Business Machines Corporation Bilayer liftoff process for high moment laminate
US6395449B1 (en) * 2000-03-31 2002-05-28 Microchem Corp. Poly-hydroxy aromatic dissolution modifiers for lift-off resists
WO2010132284A1 (en) * 2009-05-13 2010-11-18 The Trustees Of The University Of Pennsylvania Photolithographically defined contacts to carbon nanostructures
WO2013095468A1 (en) * 2011-12-21 2013-06-27 Intel Corporation Ball placement in a photo-patterned template for fine pitch interconnect

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB763288A (en) * 1954-06-16 1956-12-12 Kodak Ltd Improvements in photo mechanical processes and materials therefor
US2852379A (en) * 1955-05-04 1958-09-16 Eastman Kodak Co Azide resin photolithographic composition
US3702766A (en) * 1971-01-29 1972-11-14 Eastman Kodak Co Photoresist compositions containing n-halo cyclic imides
GB1375461A (cg-RX-API-DMAC7.html) * 1972-05-05 1974-11-27
US4079041A (en) * 1975-06-18 1978-03-14 Ciba-Geigy Corporation Crosslinkable polymeric compounds
US3964908A (en) * 1975-09-22 1976-06-22 International Business Machines Corporation Positive resists containing dimethylglutarimide units
JPS52153672A (en) * 1976-06-16 1977-12-20 Matsushita Electric Ind Co Ltd Electron beam resist and its usage
US4197133A (en) * 1977-10-14 1980-04-08 Ciba-Geigy Corporation Photo-curable compositions of matter containing bis-azidophthalimidyl derivatives
US4246374A (en) * 1979-04-23 1981-01-20 Rohm And Haas Company Imidized acrylic polymers
DE2919840A1 (de) * 1979-05-16 1980-11-20 Siemens Ag Verfahren zur phototechnischen herstellung von reliefstrukturen
US4524121A (en) * 1983-11-21 1985-06-18 Rohm And Haas Company Positive photoresists containing preformed polyglutarimide polymer

Also Published As

Publication number Publication date
KR870000678B1 (ko) 1987-04-06
IL74073A0 (en) 1985-04-30
DE3582807D1 (de) 1991-06-20
JPH0523429B2 (cg-RX-API-DMAC7.html) 1993-04-02
AU3767085A (en) 1985-07-25
EP0149553A2 (en) 1985-07-24
AU581199B2 (en) 1989-02-16
ZA85320B (en) 1986-02-26
ATE63647T1 (de) 1991-06-15
CA1272059A (en) 1990-07-31
US4569897A (en) 1986-02-11
KR850005630A (ko) 1985-08-28
PH21005A (en) 1987-06-23
IL74073A (en) 1988-07-31
BR8500146A (pt) 1985-08-20
JPS60159744A (ja) 1985-08-21
EP0149553A3 (en) 1987-07-01
EP0149553B1 (en) 1991-05-15
HK78291A (en) 1991-10-11

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