MXPA04004729A - Formas multimericas de acilfosfinas y sus derivados. - Google Patents

Formas multimericas de acilfosfinas y sus derivados.

Info

Publication number
MXPA04004729A
MXPA04004729A MXPA04004729A MXPA04004729A MXPA04004729A MX PA04004729 A MXPA04004729 A MX PA04004729A MX PA04004729 A MXPA04004729 A MX PA04004729A MX PA04004729 A MXPA04004729 A MX PA04004729A MX PA04004729 A MXPA04004729 A MX PA04004729A
Authority
MX
Mexico
Prior art keywords
unsubstituted
substituted
once
nonconsecutive
uninterrupted
Prior art date
Application number
MXPA04004729A
Other languages
English (en)
Spanish (es)
Inventor
Hug Gebhard
Original Assignee
Ciba Sc Holding Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Sc Holding Ag filed Critical Ciba Sc Holding Ag
Publication of MXPA04004729A publication Critical patent/MXPA04004729A/es

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/02Phosphorus compounds
    • C07F9/28Phosphorus compounds with one or more P—C bonds
    • C07F9/50Organo-phosphines
    • C07F9/53Organo-phosphine oxides; Organo-phosphine thioxides
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/02Phosphorus compounds
    • C07F9/28Phosphorus compounds with one or more P—C bonds
    • C07F9/50Organo-phosphines
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/02Phosphorus compounds
    • C07F9/28Phosphorus compounds with one or more P—C bonds
    • C07F9/50Organo-phosphines
    • C07F9/5036Phosphines containing the structure -C(=X)-P or NC-P
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/02Phosphorus compounds
    • C07F9/28Phosphorus compounds with one or more P—C bonds
    • C07F9/50Organo-phosphines
    • C07F9/53Organo-phosphine oxides; Organo-phosphine thioxides
    • C07F9/5337Phosphine oxides or thioxides containing the structure -C(=X)-P(=X) or NC-P(=X) (X = O, S, Se)
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/02Phosphorus compounds
    • C07F9/547Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom
    • C07F9/553Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom having one nitrogen atom as the only ring hetero atom
    • C07F9/576Six-membered rings
    • C07F9/58Pyridine rings
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/46Polymerisation initiated by wave energy or particle radiation
    • C08F2/48Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Molecular Biology (AREA)
  • Physics & Mathematics (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymerisation Methods In General (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Cosmetics (AREA)
MXPA04004729A 2001-11-20 2002-11-13 Formas multimericas de acilfosfinas y sus derivados. MXPA04004729A (es)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP01811113 2001-11-20
PCT/EP2002/012680 WO2003044030A1 (en) 2001-11-20 2002-11-13 Multimer forms of acylphosphines and their derivatives

Publications (1)

Publication Number Publication Date
MXPA04004729A true MXPA04004729A (es) 2004-07-30

Family

ID=8184252

Family Applications (1)

Application Number Title Priority Date Filing Date
MXPA04004729A MXPA04004729A (es) 2001-11-20 2002-11-13 Formas multimericas de acilfosfinas y sus derivados.

Country Status (10)

Country Link
US (1) US7109250B2 (enExample)
EP (1) EP1446410A1 (enExample)
JP (1) JP2005509685A (enExample)
KR (1) KR20050044549A (enExample)
CN (1) CN1589276A (enExample)
AU (1) AU2002366198A1 (enExample)
BR (1) BR0214324A (enExample)
CA (1) CA2467576A1 (enExample)
MX (1) MXPA04004729A (enExample)
WO (1) WO2003044030A1 (enExample)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20050009744A (ko) * 2002-06-11 2005-01-25 시바 스페셜티 케미칼스 홀딩 인크. 모노- 및 비스아실포스핀 옥사이드의 다량체 형태
JP4676434B2 (ja) * 2003-08-29 2011-04-27 チバ ホールディング インコーポレーテッド 光ファイバコーティング
EP1814891B1 (en) * 2004-11-23 2011-01-26 Basf Se Bisacylphosphanes and their use as photoinitiators; process for preparing acylphosphanes
US7547735B1 (en) 2006-12-04 2009-06-16 Henkel Corporation UV curable compositions
EP2903995B1 (en) * 2012-10-01 2019-01-16 ETH Zürich A process for the preparation of acylphosphanes
US10106629B2 (en) * 2014-05-30 2018-10-23 Igm Resins Italia S.R.L. Multifunctional acylphosphine oxide photoinitiators
JP7036506B2 (ja) * 2015-12-08 2022-03-15 スリーエム イノベイティブ プロパティズ カンパニー 二成分自己接着性歯科用組成物、保存安定性開始剤系、及びそれらの使用
CN105334697B (zh) * 2015-12-08 2019-10-11 深圳市华星光电技术有限公司 光刻胶组合物及彩色滤光片的制作方法
EP3409680B1 (en) * 2017-05-30 2021-01-06 IGM Group B.V. Synthesis of bis(acyl)phosphines by activation of unreactive metal phosphides

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4265723A (en) * 1979-07-06 1981-05-05 Basf Aktiengesellschaft Photocurable molding, impregnating and coating compositions
DE3034697A1 (de) * 1980-09-15 1982-05-06 Basf Ag, 6700 Ludwigshafen Acylphosphinsulfidverbindungen, ihre herstellung und verwendung
US5218009A (en) * 1989-08-04 1993-06-08 Ciba-Geigy Corporation Mono- and di-acylphosphine oxides
EP0413657B1 (de) * 1989-08-04 1996-12-27 Ciba SC Holding AG Mono- und Diacylphosphinoxide
TW303379B (enExample) * 1994-03-02 1997-04-21 Ciba Sc Holding Ag
DE19618720A1 (de) * 1995-05-12 1996-11-14 Ciba Geigy Ag Bisacyl-bisphosphine, -oxide und -sulfide
US6075065A (en) * 1996-12-20 2000-06-13 Takeda Chemical Industries, Ltd. Photocurable resin composition and a method for producing the same
WO1998047954A1 (en) * 1997-04-22 1998-10-29 Dsm N.V. Liquid curable resin composition
JP2001200007A (ja) * 2000-01-19 2001-07-24 Shin Etsu Chem Co Ltd 光硬化性樹脂組成物及び光ファイバー用被覆材
GB2360283B (en) * 2000-02-08 2002-08-21 Ciba Sc Holding Ag Monoacylarylphosphines and acylphosphine oxides and sulphides
GB2365430B (en) * 2000-06-08 2002-08-28 Ciba Sc Holding Ag Acylphosphine photoinitiators and intermediates
WO2003012126A2 (en) * 2001-08-03 2003-02-13 Diversa Corporation Epoxide hydrolases, nucleic acids encoding them and methods for making and using them

Also Published As

Publication number Publication date
CA2467576A1 (en) 2003-05-30
JP2005509685A (ja) 2005-04-14
US7109250B2 (en) 2006-09-19
WO2003044030A1 (en) 2003-05-30
EP1446410A1 (en) 2004-08-18
CN1589276A (zh) 2005-03-02
AU2002366198A1 (en) 2003-06-10
BR0214324A (pt) 2004-11-03
US20050004247A1 (en) 2005-01-06
KR20050044549A (ko) 2005-05-12

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