MX168832B - Composicion de revestimiento fotosencible y metodo para para la preparacion de un polimero sensible a la radiacion ultravioleta - Google Patents
Composicion de revestimiento fotosencible y metodo para para la preparacion de un polimero sensible a la radiacion ultravioletaInfo
- Publication number
- MX168832B MX168832B MX009667A MX966787A MX168832B MX 168832 B MX168832 B MX 168832B MX 009667 A MX009667 A MX 009667A MX 966787 A MX966787 A MX 966787A MX 168832 B MX168832 B MX 168832B
- Authority
- MX
- Mexico
- Prior art keywords
- reaction mixture
- component
- carboxylated
- hydroxyalkyl
- carbon atoms
- Prior art date
Links
- 229920000642 polymer Polymers 0.000 title abstract 3
- 230000005855 radiation Effects 0.000 title abstract 2
- 239000011248 coating agent Substances 0.000 title 1
- 238000000576 coating method Methods 0.000 title 1
- 238000000034 method Methods 0.000 title 1
- 238000002360 preparation method Methods 0.000 title 1
- 239000011541 reaction mixture Substances 0.000 abstract 4
- 125000004432 carbon atom Chemical group C* 0.000 abstract 3
- 125000002768 hydroxyalkyl group Chemical group 0.000 abstract 2
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 abstract 1
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 abstract 1
- 125000000217 alkyl group Chemical group 0.000 abstract 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 abstract 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 abstract 1
- -1 carboxylic acid polyol Chemical class 0.000 abstract 1
- 239000008199 coating composition Substances 0.000 abstract 1
- HIUMCGGLJPRCBQ-UHFFFAOYSA-N ethyl carbamate;2-methylprop-2-enoic acid Chemical compound CCOC(N)=O.CC(=C)C(O)=O.CC(=C)C(O)=O.CC(=C)C(O)=O HIUMCGGLJPRCBQ-UHFFFAOYSA-N 0.000 abstract 1
- MKVYSRNJLWTVIK-UHFFFAOYSA-N ethyl carbamate;2-methylprop-2-enoic acid Chemical compound CCOC(N)=O.CC(=C)C(O)=O.CC(=C)C(O)=O MKVYSRNJLWTVIK-UHFFFAOYSA-N 0.000 abstract 1
- JZMPIUODFXBXSC-UHFFFAOYSA-N ethyl carbamate;prop-2-enoic acid Chemical compound OC(=O)C=C.OC(=O)C=C.CCOC(N)=O JZMPIUODFXBXSC-UHFFFAOYSA-N 0.000 abstract 1
- 229920005862 polyol Polymers 0.000 abstract 1
- 229920006395 saturated elastomer Polymers 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/025—Non-macromolecular photopolymerisable compounds having carbon-to-carbon triple bonds, e.g. acetylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/035—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyurethanes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F299/00—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
- C08F299/02—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates
- C08F299/06—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from polyurethanes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
- C08G18/30—Low-molecular-weight compounds
- C08G18/34—Carboxylic acids; Esters thereof with monohydroxyl compounds
- C08G18/348—Hydroxycarboxylic acids
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
- C08G18/67—Unsaturated compounds having active hydrogen
- C08G18/671—Unsaturated compounds having only one group containing active hydrogen
- C08G18/672—Esters of acrylic or alkyl acrylic acid having only one group containing active hydrogen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
- C08G18/67—Unsaturated compounds having active hydrogen
- C08G18/671—Unsaturated compounds having only one group containing active hydrogen
- C08G18/672—Esters of acrylic or alkyl acrylic acid having only one group containing active hydrogen
- C08G18/6725—Esters of acrylic or alkyl acrylic acid having only one group containing active hydrogen containing ester groups other than acrylate or alkylacrylate ester groups
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/38—Treatment before imagewise removal, e.g. prebaking
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Medicinal Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Polyurethanes Or Polyureas (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Paints Or Removers (AREA)
- Non-Metallic Protective Coatings For Printed Circuits (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US93960486A | 1986-12-08 | 1986-12-08 | |
| US4546487A | 1987-05-04 | 1987-05-04 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| MX168832B true MX168832B (es) | 1993-06-10 |
Family
ID=26722797
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| MX009667A MX168832B (es) | 1986-12-08 | 1987-12-08 | Composicion de revestimiento fotosencible y metodo para para la preparacion de un polimero sensible a la radiacion ultravioleta |
Country Status (13)
| Country | Link |
|---|---|
| KR (1) | KR910001523B1 (enExample) |
| CN (1) | CN1031227C (enExample) |
| BR (1) | BR8706609A (enExample) |
| CA (1) | CA1332093C (enExample) |
| CH (1) | CH680622A5 (enExample) |
| DE (1) | DE3741385C2 (enExample) |
| FR (1) | FR2607820B1 (enExample) |
| GB (1) | GB2199335B (enExample) |
| HK (1) | HK60692A (enExample) |
| IT (1) | IT1233418B (enExample) |
| MX (1) | MX168832B (enExample) |
| NL (1) | NL190785C (enExample) |
| SG (1) | SG61192G (enExample) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0443537A3 (en) * | 1990-02-20 | 1992-05-06 | Takeda Chemical Industries, Ltd. | Water soluble photocurable polyurethane poly(meth-)acrylate, adhesives containing the same, and production of laminated articles |
| CA2040097A1 (en) * | 1990-04-12 | 1991-10-13 | Wako Yokoyama | Urethane polymers for printing plate compositions |
| US5341799A (en) * | 1991-12-23 | 1994-08-30 | Hercules Incorporated | Urethane polymers for printing plate compositions |
| CN1238398C (zh) * | 1999-09-30 | 2006-01-25 | 巴斯福股份公司 | 能够用紫外线和热硬化的聚氨酯水分散体,以及它们的用途 |
| TW201220974A (en) * | 2010-05-21 | 2012-05-16 | Nano Terra Inc | Stencils for high-throughput micron-scale etching of substrates and processes of making and using the same |
| CN104193944A (zh) * | 2014-08-21 | 2014-12-10 | 苏州瑞红电子化学品有限公司 | 一种酸值可控光敏碱溶性聚氨酯丙烯酸酯树脂及其光刻胶组合物 |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4153778A (en) * | 1978-03-30 | 1979-05-08 | Union Carbide Corporation | Acrylyl capped urethane oligomers |
| NL8401785A (nl) * | 1984-06-04 | 1986-01-02 | Polyvinyl Chemie Holland | Werkwijze voor de bereiding van een waterige dispersie van urethan-acrylaat entcopolymeren, alsmede aldus verkregen stabiele waterige dispersie. |
| DE3676054D1 (de) * | 1985-05-17 | 1991-01-17 | Atochem North America | Durch waessriges alkali entwickelbare, uv-haertbare urethanacrylatverbindungen und zusammensetzungen, die zur herstellung von beschichtung fuer loetmasken geeignet sind. |
-
1987
- 1987-11-03 CA CA000550900A patent/CA1332093C/en not_active Expired - Fee Related
- 1987-12-04 IT IT8722899A patent/IT1233418B/it active
- 1987-12-07 DE DE3741385A patent/DE3741385C2/de not_active Expired - Fee Related
- 1987-12-07 NL NL8702942A patent/NL190785C/xx not_active IP Right Cessation
- 1987-12-08 CN CN87107321A patent/CN1031227C/zh not_active Expired - Fee Related
- 1987-12-08 KR KR1019870014055A patent/KR910001523B1/ko not_active Expired
- 1987-12-08 BR BR8706609A patent/BR8706609A/pt not_active IP Right Cessation
- 1987-12-08 CH CH4773/87A patent/CH680622A5/de unknown
- 1987-12-08 GB GB8728631A patent/GB2199335B/en not_active Expired - Lifetime
- 1987-12-08 MX MX009667A patent/MX168832B/es unknown
- 1987-12-08 FR FR878717087A patent/FR2607820B1/fr not_active Expired - Lifetime
-
1992
- 1992-06-12 SG SG611/92A patent/SG61192G/en unknown
- 1992-08-13 HK HK606/92A patent/HK60692A/xx not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| BR8706609A (pt) | 1988-07-19 |
| IT1233418B (it) | 1992-03-31 |
| GB2199335A (en) | 1988-07-06 |
| NL190785B (nl) | 1994-03-16 |
| KR880014415A (ko) | 1988-12-23 |
| FR2607820A1 (fr) | 1988-06-10 |
| GB2199335B (en) | 1991-01-09 |
| GB8728631D0 (en) | 1988-01-13 |
| SG61192G (en) | 1992-09-04 |
| HK60692A (en) | 1992-08-21 |
| CN87107321A (zh) | 1988-06-22 |
| CA1332093C (en) | 1994-09-20 |
| KR910001523B1 (ko) | 1991-03-15 |
| CN1031227C (zh) | 1996-03-06 |
| DE3741385C2 (de) | 1996-06-05 |
| NL190785C (nl) | 1994-08-16 |
| CH680622A5 (enExample) | 1992-09-30 |
| FR2607820B1 (fr) | 1994-06-10 |
| DE3741385A1 (de) | 1988-06-09 |
| NL8702942A (nl) | 1988-07-01 |
| IT8722899A0 (it) | 1987-12-04 |
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