MX167504B - Esteres dibasicos para limpiar circuitos electronicos - Google Patents

Esteres dibasicos para limpiar circuitos electronicos

Info

Publication number
MX167504B
MX167504B MX014837A MX1483789A MX167504B MX 167504 B MX167504 B MX 167504B MX 014837 A MX014837 A MX 014837A MX 1483789 A MX1483789 A MX 1483789A MX 167504 B MX167504 B MX 167504B
Authority
MX
Mexico
Prior art keywords
electronic circuits
dibasic esters
cleaning electronic
composition
residue
Prior art date
Application number
MX014837A
Other languages
English (en)
Inventor
Larry Futch
Kevin R Hrebener
Michael E Hayes
Original Assignee
Petroleum Fermentations
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Petroleum Fermentations filed Critical Petroleum Fermentations
Publication of MX167504B publication Critical patent/MX167504B/es

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/22Secondary treatment of printed circuits
    • H05K3/26Cleaning or polishing of the conductive pattern
    • CCHEMISTRY; METALLURGY
    • C11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/16Organic compounds
    • C11D3/20Organic compounds containing oxygen
    • C11D3/2093Esters; Carbonates
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23GCLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
    • C23G5/00Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents
    • C23G5/02Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents using organic solvents
    • C23G5/024Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents using organic solvents containing hydrocarbons
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23GCLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
    • C23G5/00Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents
    • C23G5/02Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents using organic solvents
    • C23G5/032Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents using organic solvents containing oxygen-containing compounds
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26Processing photosensitive materials; Apparatus therefor
    • G03F7/42Stripping or agents therefor
    • G03F7/422Stripping or agents therefor using liquids only
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/07Treatments involving liquids, e.g. plating, rinsing
    • H05K2203/0779Treatments involving liquids, e.g. plating, rinsing characterised by the specific liquids involved
    • H05K2203/0783Using solvent, e.g. for cleaning; Regulating solvent content of pastes or coatings for adjusting the viscosity

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Metallurgy (AREA)
  • Mechanical Engineering (AREA)
  • Materials Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Emergency Medicine (AREA)
  • Wood Science & Technology (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Detergent Compositions (AREA)
  • Manufacturing Of Printed Wiring (AREA)

Abstract

La presente invención se refiere a un método para separar residuos orgánicos de una superficie contaminada, que comprende: a) poner en contacto la superficie con una composición que comprende cuando menos un éster de ácido dibásico y de 0 a aproximadamente 40 por ciento en peso de un agente tensioactivo emulsificador apropiado; b) dejar que continua el contacto durante un tiempo suficiente para solubilizar el residuo; y c) separar la composición y el residuo solubilizado, de la superficie.
MX014837A 1988-02-08 1989-02-08 Esteres dibasicos para limpiar circuitos electronicos MX167504B (es)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US15363788A 1988-02-08 1988-02-08
US07/305,897 US4934391A (en) 1988-02-08 1989-02-02 Dibasic esters for cleaning electronic circuits

Publications (1)

Publication Number Publication Date
MX167504B true MX167504B (es) 1993-03-25

Family

ID=23182844

Family Applications (1)

Application Number Title Priority Date Filing Date
MX014837A MX167504B (es) 1988-02-08 1989-02-08 Esteres dibasicos para limpiar circuitos electronicos

Country Status (6)

Country Link
US (1) US4934391A (es)
JP (1) JPH04503079A (es)
AU (1) AU3428789A (es)
CA (1) CA1321335C (es)
MX (1) MX167504B (es)
WO (1) WO1990008603A1 (es)

Families Citing this family (56)

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US5120371A (en) * 1990-11-29 1992-06-09 Petroferm Inc. Process of cleaning soldering flux and/or adhesive tape with terpenet and monobasic ester
US5062988A (en) * 1989-08-07 1991-11-05 E. I. Du Pont De Nemours And Company Cleaning composition of dibasic ester, hydrocarbon solvent and compatibilizing component
US5084200A (en) * 1989-08-07 1992-01-28 E. I. Du Pont De Nemours And Company Cleaning composition of dibasic ester, hydrocarbon solvent, compatibilizing surfactant and water
US5011620A (en) * 1989-08-07 1991-04-30 E. I. Du Pont De Nemours And Company Cleaning composition of dibasic ester and hydrocarbon solvent
JP2789046B2 (ja) * 1989-11-08 1998-08-20 荒川化学工業株式会社 ロジン系ハンダフラックスの洗浄剤
US5330582A (en) * 1989-11-08 1994-07-19 Arakawa Chemical Industries, Ltd. Method for cleaning rosin-base solder flux
SG50628A1 (en) * 1990-03-16 1998-07-20 Japan Field Kk Cleaning method and cleaning apparatus
US5300154A (en) * 1990-08-14 1994-04-05 Bush Boake Allen Limited Methods for cleaning articles
US5096501A (en) * 1990-08-27 1992-03-17 E. I. Du Pont De Nemours & Company Environmentally safe cleaning process and cleaning composition useful therein
DE4034765A1 (de) * 1990-11-02 1992-05-07 Schwegmann Bernd Gmbh Co Kg Reinigungs- und regenerierungsmittel mit verbesserten chemisch-technischen eigenschaften sowie guenstiger umweltvertraeglichkeit
US5080722A (en) * 1991-02-26 1992-01-14 At&T Bell Laboratories Method for cleaning electrical connectors
DE4116580A1 (de) * 1991-05-21 1992-11-26 Henkel Kgaa Verwendung von fettsaeure-2-ethylhexylestern als kaltreinigungsmittel
US5196136A (en) * 1991-06-20 1993-03-23 E. I. Du Pont De Nemours And Company Cleaning composition of hydrocarbon component, surfactant and multibasic ester additive
US5238504A (en) * 1991-09-27 1993-08-24 Advanced Research Technologies Use of terpene hydrocarbons and ketone blends for electrical contact cleaning
US5354492A (en) * 1992-09-04 1994-10-11 Cook Composites And Polymers Company Aqueous cleaning solutions for removing uncured urethane resin systems from the surfaces of processing equipment
US5288332A (en) * 1993-02-05 1994-02-22 Honeywell Inc. A process for removing corrosive by-products from a circuit assembly
US5415800A (en) * 1993-06-09 1995-05-16 Motsenbocker; Gregg Cleanser for releasing adherent deposits from surfaces
USRE35976E (en) * 1993-10-29 1998-12-01 Baldwin Graphic Systems, Inc. Pre-packaged, pre-soaked cleaning system and method for making the same
US5368157A (en) * 1993-10-29 1994-11-29 Baldwin Graphic Systems, Inc. Pre-packaged, pre-soaked cleaning system and method for making the same
US20020185157A1 (en) * 1994-11-30 2002-12-12 Engel Peter Goth Method of cleaning screen printing frames
US5604193A (en) * 1994-12-08 1997-02-18 Dotolo Research Corporation Adhesive and enamel remover, and method of use with d-limonene, dibasic ester, an N-methyl pyrrolidone
CN1096942C (zh) * 1995-05-01 2002-12-25 鲍德温·格拉菲克系统有限公司 就地浸渍和印刷机上浸渍清洁系统及其使用方法
EP1176011A1 (en) * 1995-05-01 2002-01-30 BALDWIN GRAPHIC SYSTEMS, Inc. Cleaning system
DE59610828D1 (de) * 1995-05-18 2004-01-08 Textil Color Ag Sevelen Zusammensetzung zum Waschen und Reinigen von Textilmaterialien
US6035483A (en) * 1995-06-07 2000-03-14 Baldwin Graphic Systems, Inc. Cleaning system and process for making and using same employing a highly viscous solvent
NZ324776A (en) 1995-12-28 1998-12-23 Eco Solutions Ltd Aqueous composition for plasticising paint prior to stripping
US5814163A (en) * 1996-09-09 1998-09-29 Macdermid, Incorporated Composition and process for cleaning inks form various surfaces including printing plates
JP2946030B2 (ja) * 1996-09-11 1999-09-06 株式会社色素オオタ・オータス サーマルヘッド感熱性スクリーン印刷用孔版原紙及び該孔版原紙を用いた製版方法
GB9716273D0 (en) 1997-07-31 1997-10-08 Kimberly Clark Ltd Hand cleanser
DK1000138T3 (da) * 1997-07-31 2004-02-02 Du Pont Vandige mikroemulsioner
US6165962A (en) * 1997-07-31 2000-12-26 E. I. Du Pont De Nemours And Comapny Aqueous microemulsions
US5916857A (en) * 1997-11-17 1999-06-29 Federal Service & Supply, Inc. Cleaning composition for removing viscid resinous organic matter
GB2353534B (en) 1998-03-19 2002-05-29 Eco Solutions Ltd Aqueous composition for removing coatings
US5958149A (en) 1998-09-17 1999-09-28 S. C. Johnson & Son, Inc. Method of cleaning surfaces, composition suitable for use in the method, and of preparing the composition
EP1147067A4 (en) * 1998-11-25 2002-10-09 Petroferm Inc AQUEOUS CLEANING COMPOSITION
CA2355703C (fr) 1999-10-19 2005-10-18 Chim 92 Composition nettoyante, procede pour nettoyer un ecran de serigraphie et dispositif de nettoyage
FR2799765B1 (fr) * 1999-10-19 2003-01-03 Chim 92 Solution pour le nettoyage d'ecrans de serigraphie
US6743828B1 (en) * 2000-01-03 2004-06-01 Harvey Katz Reduction in polystyrene foams with dibasic esters
US6422246B1 (en) * 2000-02-29 2002-07-23 United Microelectronics Corp. Method removing residual photoresist
US6929702B1 (en) 2000-10-02 2005-08-16 Gregg Motsenbocker Compositions and methods for releasing adherent deposits from surfaces and substrates
US6800141B2 (en) * 2001-12-21 2004-10-05 International Business Machines Corporation Semi-aqueous solvent based method of cleaning rosin flux residue
DE102005041533B3 (de) * 2005-08-31 2007-02-08 Atotech Deutschland Gmbh Lösung und Verfahren zum Entfernen von ionischen Verunreinigungen von einem Werkstück
GB0605157D0 (en) * 2006-03-15 2006-04-26 Gramos Applied Ltd Decontaminant formulations
US7468345B2 (en) * 2006-09-29 2008-12-23 Eco Holdings, Llc Graffiti cleaning solution including a non-aqueous concentrate and diluted aqueous solution
FR2918994B1 (fr) * 2007-07-20 2012-10-19 Rhodia Operations Formulations de diesters d'acide carboxylique et leur utilisation pour le traitement de materiaux.
CN102015994B (zh) * 2008-05-09 2013-10-30 罗地亚管理公司 包含绿色溶剂的清洁组合物及其使用方法
US8222194B2 (en) * 2008-05-09 2012-07-17 Rhodia Operations Cleaning compositions incorporating green solvents and methods for use
FR2941462B1 (fr) * 2009-01-23 2013-07-05 Rhodia Operations Composition decapante
US9074169B2 (en) 2009-01-28 2015-07-07 Advanced Technology Materials, Inc. Lithographic tool in situ clean formulations
US8771925B2 (en) * 2009-08-25 2014-07-08 Eastman Kodak Company Flexographic processing solution and method of use
EP2491102A2 (en) * 2009-10-19 2012-08-29 Rhodia Operations Auto-emulsifying cleaning systems and methods for use
AU2011332308A1 (en) * 2010-11-22 2013-06-13 Rhodia Operations Dilutable cleaning compositions and methods for use
CA2821052A1 (en) 2010-12-10 2012-06-14 Rhodia Operations Dibasic esters utilized as terpene co-solvents, substitutes and/or carriers in tar sand/bitumen/asphaltene cleaning applications
RU2014139942A (ru) 2012-04-17 2016-06-10 Родиа Оперейшнс Полисахаридные суспензии с экологически безопасными активирующими растворителями
WO2015108874A1 (en) 2014-01-16 2015-07-23 Elevance Renewable Sciences, Inc. Olefinic ester compositions and their use in oil- and gas-related applications
CN115287125A (zh) * 2022-06-15 2022-11-04 湖北三赢兴光电科技股份有限公司 一种感光芯片清洗液及其制备方法和应用

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JPS55157700A (en) * 1979-05-28 1980-12-08 Ube Industries Cleaning agent
ATE65388T1 (de) * 1984-05-24 1991-08-15 Pegel Karl Heinrich Kosmetisches mittel.
US4780235A (en) * 1987-04-16 1988-10-25 E. I. Du Pont De Nemours And Company Paint remover

Also Published As

Publication number Publication date
US4934391A (en) 1990-06-19
WO1990008603A1 (en) 1990-08-09
AU3428789A (en) 1990-08-24
JPH04503079A (ja) 1992-06-04
CA1321335C (en) 1993-08-17

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