MX165427B - Composicion granulada para pulir componentes ferrosos y metodo para hacerlo - Google Patents

Composicion granulada para pulir componentes ferrosos y metodo para hacerlo

Info

Publication number
MX165427B
MX165427B MX009451A MX945187A MX165427B MX 165427 B MX165427 B MX 165427B MX 009451 A MX009451 A MX 009451A MX 945187 A MX945187 A MX 945187A MX 165427 B MX165427 B MX 165427B
Authority
MX
Mexico
Prior art keywords
composition
components
compositions
solution
sufficient
Prior art date
Application number
MX009451A
Other languages
English (en)
Inventor
Peter G Sherman
Fred A Hicks
Original Assignee
Chemimetals Processing Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Chemimetals Processing Inc filed Critical Chemimetals Processing Inc
Publication of MX165427B publication Critical patent/MX165427B/es

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B31/00—Machines or devices designed for polishing or abrading surfaces on work by means of tumbling apparatus or other apparatus in which the work and/or the abrasive material is loose; Accessories therefor
    • B24B31/12—Accessories; Protective equipment or safety devices; Installations for exhaustion of dust or for sound absorption specially adapted for machines covered by group B24B31/00
    • B24B31/14—Abrading-bodies specially designed for tumbling apparatus, e.g. abrading-balls
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1454—Abrasive powders, suspensions and pastes for polishing
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F3/00—Brightening metals by chemical means
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/34—Pretreatment of metallic surfaces to be electroplated
    • C25D5/36—Pretreatment of metallic surfaces to be electroplated of iron or steel

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • General Chemical & Material Sciences (AREA)
  • Electrochemistry (AREA)
  • Polishing Bodies And Polishing Tools (AREA)
  • Disintegrating Or Milling (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Detergent Compositions (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • ing And Chemical Polishing (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Chemically Coating (AREA)
  • Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
  • Glass Compositions (AREA)
  • Luminescent Compositions (AREA)
  • Manufacture Of Metal Powder And Suspensions Thereof (AREA)

Abstract

La presente invención se refiere a una composición adaptada para ser mezclada con agua y utilizada en un aparato de acabado abrasivo, de procedimiento húmedo, para metales ferrosos, tal como un barril revolvedor o similares, caracterizada porque comprende, en porcentaje en peso, hasta alrededor de 40 por ciento de ácido oxálico; hasta alrededor de 30 por ciento de agente secuestrante de fósforo; estando la relación en peso de ácido oxálico a agente secuestrante en la escala de aproximadamente 1.2:1 a aproximadamente 0.4:1; una cantidad de un agente amonificador suficiente y efectiva para ajustar el pH de la solución formada disolviendo la composición en agua a una escala aproximada de 3.5 a 6.5; una cantidad de un agente tensioactivo suficiente y efectiva para obtener la humectación de la composición, y una cantidad de un material portador, suficiente para constituir el resto de la composición; y efectiva para mantener los constituyentes de la composición en forma granulada, seca, fácilmente manejable.
MX009451A 1986-11-24 1987-11-24 Composicion granulada para pulir componentes ferrosos y metodo para hacerlo MX165427B (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/934,469 US4724042A (en) 1986-11-24 1986-11-24 Dry granular composition for, and method of, polishing ferrous components

Publications (1)

Publication Number Publication Date
MX165427B true MX165427B (es) 1992-11-11

Family

ID=25465618

Family Applications (1)

Application Number Title Priority Date Filing Date
MX009451A MX165427B (es) 1986-11-24 1987-11-24 Composicion granulada para pulir componentes ferrosos y metodo para hacerlo

Country Status (16)

Country Link
US (1) US4724042A (es)
EP (1) EP0334877B1 (es)
JP (1) JPH02500757A (es)
AT (1) ATE86311T1 (es)
BR (1) BR8707893A (es)
DE (1) DE3784517T2 (es)
DK (1) DK390588D0 (es)
FI (1) FI83544C (es)
IL (1) IL84562A (es)
LT (1) LT3297B (es)
LV (1) LV10316B (es)
MX (1) MX165427B (es)
NO (1) NO176722C (es)
NZ (1) NZ222626A (es)
RU (1) RU2062305C1 (es)
WO (1) WO1988003963A1 (es)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL8701407A (nl) * 1987-06-17 1989-01-16 Vunderink Ate Een oppervlakte techniek die het massaal slijpen en polijsten van metalen artikelen in rotofinish apparatuur sneller doet verlopen.
DE3800834A1 (de) * 1988-01-14 1989-07-27 Henkel Kgaa Verfahren und mittel zum gleichzeitigen gleitschleifen, reinigen und passivieren metallischer werkstuecke
USRE34272E (en) * 1989-05-04 1993-06-08 Rem Chemicals, Inc. Method and composition for refinement of metal surfaces
US4906327A (en) * 1989-05-04 1990-03-06 Rem Chemicals, Inc. Method and composition for refinement of metal surfaces
WO1998004646A1 (en) 1996-07-25 1998-02-05 Ekc Technology, Inc. Chemical mechanical polishing composition and process
US20040134873A1 (en) * 1996-07-25 2004-07-15 Li Yao Abrasive-free chemical mechanical polishing composition and polishing process containing same
US20040140288A1 (en) * 1996-07-25 2004-07-22 Bakul Patel Wet etch of titanium-tungsten film
US6261154B1 (en) 1998-08-25 2001-07-17 Mceneny Jeffrey William Method and apparatus for media finishing
US6409936B1 (en) 1999-02-16 2002-06-25 Micron Technology, Inc. Composition and method of formation and use therefor in chemical-mechanical polishing
US6426295B1 (en) * 1999-02-16 2002-07-30 Micron Technology, Inc. Reduction of surface roughness during chemical mechanical planarization(CMP)
US6638326B2 (en) 2001-09-25 2003-10-28 Ekc Technology, Inc. Compositions for chemical mechanical planarization of tantalum and tantalum nitride
US6895855B2 (en) 2001-10-01 2005-05-24 The Timken Company Hydraulic motors and pumps with engineered surfaces
US6866792B2 (en) * 2001-12-12 2005-03-15 Ekc Technology, Inc. Compositions for chemical mechanical planarization of copper
WO2010099230A2 (en) 2009-02-25 2010-09-02 Illumina, Inc. Separation of pyrophosphate release and pyrophosphate detection
US10179388B2 (en) * 2009-05-12 2019-01-15 Rem Technologies, Inc. High throughput finishing of metal components
CN103540947B (zh) * 2013-10-30 2015-10-21 涿州安泰星电子器件有限公司 一种电镀基材除油剂及其制备方法

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2666000A (en) * 1950-10-11 1954-01-12 Standard Oil Dev Co Process for cleaning automobile radiators
US2832706A (en) * 1953-05-12 1958-04-29 Victor Chemical Works Metal cleaning and phosphating composition and method of cleaning and phosphating
US2890944A (en) * 1956-05-25 1959-06-16 North American Aviation Inc Continuous chemical milling process
US2981610A (en) * 1957-05-14 1961-04-25 Boeing Co Chemical milling process and composition
US2940838A (en) * 1957-08-19 1960-06-14 Boeing Co Chemical milling
US3094489A (en) * 1959-08-31 1963-06-18 Monsanto Chemicals Method and composition for brightening aluminum
US3052582A (en) * 1959-10-05 1962-09-04 Boeing Co Process of chemical milling and acid aqueous bath used therefor
US3061494A (en) * 1959-10-05 1962-10-30 Boeing Co Process of chemical milling and acid aqueous bath used therefor
SE400581B (sv) * 1974-12-13 1978-04-03 Nordnero Ab Bad for kemisk polering av koppar och dess legeringar
AT366422B (de) * 1980-06-30 1982-04-13 Wiener Brueckenbau Phosphorsaures medium und verfahren zum dampfstrahl-phosphatieren von stahlkonstruktionen mittels dieses mediums
SU1093732A1 (ru) * 1983-04-04 1984-05-23 Bereshchenko Alla A Раствор дл виброхимического удалени заусенцев со стали
US4491500A (en) * 1984-02-17 1985-01-01 Rem Chemicals, Inc. Method for refinement of metal surfaces
US4532066A (en) * 1984-03-05 1985-07-30 Sterling Drug Inc. Stable mildly acidic aqueous polishing cleanser and preparation thereof
US4705594A (en) * 1986-11-20 1987-11-10 Rem Chemicals, Inc. Composition and method for metal surface refinement

Also Published As

Publication number Publication date
DE3784517T2 (de) 1993-10-07
JPH02500757A (ja) 1990-03-15
ATE86311T1 (de) 1993-03-15
WO1988003963A1 (en) 1988-06-02
NO883242L (no) 1988-07-21
EP0334877A4 (en) 1989-12-28
LV10316B (en) 1995-06-20
RU2062305C1 (ru) 1996-06-20
FI884658A (fi) 1988-10-11
FI884658A0 (fi) 1988-10-11
IL84562A (en) 1991-05-12
NO176722B (no) 1995-02-06
EP0334877A1 (en) 1989-10-04
LTIP287A (en) 1994-10-25
DE3784517D1 (de) 1993-04-08
LV10316A (lv) 1994-10-20
IL84562A0 (en) 1988-04-29
FI83544B (fi) 1991-04-15
NZ222626A (en) 1990-07-26
NO176722C (no) 1995-05-16
DK390588A (da) 1988-07-13
FI83544C (fi) 1991-07-25
DK390588D0 (da) 1988-07-13
LT3297B (en) 1995-06-26
US4724042A (en) 1988-02-09
EP0334877B1 (en) 1993-03-03
NO883242D0 (no) 1988-07-21
BR8707893A (pt) 1989-10-03

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