MD360Z - Process for the formation of microstructured surfaces of silicon substrates - Google Patents

Process for the formation of microstructured surfaces of silicon substrates

Info

Publication number
MD360Z
MD360Z MDS20100158A MDS20100158A MD360Z MD 360 Z MD360 Z MD 360Z MD S20100158 A MDS20100158 A MD S20100158A MD S20100158 A MDS20100158 A MD S20100158A MD 360 Z MD360 Z MD 360Z
Authority
MD
Moldova
Prior art keywords
silicon substrates
formation
microstructured surfaces
mechanical action
linear mechanical
Prior art date
Application number
MDS20100158A
Other languages
Romanian (ro)
Russian (ru)
Inventor
Евгений ХАРЯ
Дарья ГРАБКО
Ольга ШИКИМАКА
Дормидонт ШЕРБАН
Original Assignee
Институт Прикладной Физики Академии Наук Молдовы
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Институт Прикладной Физики Академии Наук Молдовы filed Critical Институт Прикладной Физики Академии Наук Молдовы
Priority to MDS20100158A priority Critical patent/MD360Z/en
Publication of MD360Y publication Critical patent/MD360Y/en
Publication of MD360Z publication Critical patent/MD360Z/en

Links

Abstract

The invention relates to processes for processing of semiconductor wafers and can be used for the manufacture of silicon substrates used for solar cells.The process for the formation of microstructured surfaces of silicon substrates consists in that the surface of the silicon substrate is subjected to a linear mechanical action with subsequent selective etching with an aqueous alkaline solution, the linear mechanical action being carried out by means of the Vickers indenter at a load of no more than 0.3 g.
MDS20100158A 2010-09-23 2010-09-23 Process for the formation of microstructured surfaces of silicon substrates MD360Z (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
MDS20100158A MD360Z (en) 2010-09-23 2010-09-23 Process for the formation of microstructured surfaces of silicon substrates

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
MDS20100158A MD360Z (en) 2010-09-23 2010-09-23 Process for the formation of microstructured surfaces of silicon substrates

Publications (2)

Publication Number Publication Date
MD360Y MD360Y (en) 2011-04-30
MD360Z true MD360Z (en) 2011-11-30

Family

ID=45815106

Family Applications (1)

Application Number Title Priority Date Filing Date
MDS20100158A MD360Z (en) 2010-09-23 2010-09-23 Process for the formation of microstructured surfaces of silicon substrates

Country Status (1)

Country Link
MD (1) MD360Z (en)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
RU2056672C1 (en) * 1993-06-08 1996-03-20 Евгений Макарович Соколов Method for processing the surface of silicon plates for solar batteries
RU2072585C1 (en) * 1994-02-08 1997-01-27 Научно-исследовательский институт измерительных систем Method of preparation of semiconductor substrates
RU2340979C1 (en) * 2004-10-28 2008-12-10 Мимасу Семикондактор Индастри Ко., Лтд Method of semiconductor wafer manufacture, semiconductor wafer for solar plants, and etching solution
US20100216308A1 (en) * 2009-02-25 2010-08-26 Imec Method for etching 3d structures in a semiconductor substrate, including surface preparation
  • 2010

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
RU2056672C1 (en) * 1993-06-08 1996-03-20 Евгений Макарович Соколов Method for processing the surface of silicon plates for solar batteries
RU2072585C1 (en) * 1994-02-08 1997-01-27 Научно-исследовательский институт измерительных систем Method of preparation of semiconductor substrates
RU2340979C1 (en) * 2004-10-28 2008-12-10 Мимасу Семикондактор Индастри Ко., Лтд Method of semiconductor wafer manufacture, semiconductor wafer for solar plants, and etching solution
US20100216308A1 (en) * 2009-02-25 2010-08-26 Imec Method for etching 3d structures in a semiconductor substrate, including surface preparation

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
Крапивко Г.И., Хлопёнова И.А. Современные технические средства, комплексы и системы повышения коэффициента полезного действия кремниевых фотоэлектронных преобразователей методом лазерной гравировки, ААЭКС, № 2 (12), 2003 (Regăsită în Internet la 04.02.2011, url: http://aaecs.org/krapivko-gi-hlopenova-ia-povishenie-koafficienta-poleznogo-deistviya-kremnievih-fotoalektronnih-preobrazovatelei-metodom-lazernoi-gravirovki.html) *

Also Published As

Publication number Publication date
MD360Y (en) 2011-04-30

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Legal Events

Date Code Title Description
KA4Y Short-term patent lapsed due to non-payment of fees (with right of restoration)