MY159267A - Method for fabricating a three-dimensional thin-film semiconductor substrate from a template - Google Patents
Method for fabricating a three-dimensional thin-film semiconductor substrate from a templateInfo
- Publication number
- MY159267A MY159267A MYPI2011004548A MYPI2011004548A MY159267A MY 159267 A MY159267 A MY 159267A MY PI2011004548 A MYPI2011004548 A MY PI2011004548A MY PI2011004548 A MYPI2011004548 A MY PI2011004548A MY 159267 A MY159267 A MY 159267A
- Authority
- MY
- Malaysia
- Prior art keywords
- template
- semiconductor
- semiconductor substrate
- dimensional thin
- dimensional
- Prior art date
Links
- 239000004065 semiconductor Substances 0.000 title abstract 8
- 238000000034 method Methods 0.000 title abstract 3
- 239000000758 substrate Substances 0.000 title abstract 3
- 239000010409 thin film Substances 0.000 title abstract 3
- 238000005530 etching Methods 0.000 abstract 1
- 238000004519 manufacturing process Methods 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
- H01L31/0352—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their shape or by the shapes, relative sizes or disposition of the semiconductor regions
- H01L31/035272—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their shape or by the shapes, relative sizes or disposition of the semiconductor regions characterised by at least one potential jump barrier or surface barrier
- H01L31/035281—Shape of the body
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/02—Elements
- C30B29/06—Silicon
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B31/00—Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor
- C30B31/20—Doping by irradiation with electromagnetic waves or by particle radiation
- C30B31/22—Doping by irradiation with electromagnetic waves or by particle radiation by ion-implantation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
- H01L31/1892—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof methods involving the use of temporary, removable substrates
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- General Physics & Mathematics (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Crystallography & Structural Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Weting (AREA)
- Photovoltaic Devices (AREA)
- Drying Of Semiconductors (AREA)
Abstract
A METHOD IS PRESENTED FOR FABRICATION OF A THREE-DIMENSIONAL THIN-FILM SOLAR CELL SEMICONDUCTOR SUBSTRATE FROM A TEMPLATE. A SEMICONDUCTOR TEMPLATE HAVING THREE-DIMENSIONAL SURFACE FEATURES COMPRISING A TOP SURFACES SUBSTANTIALLY ALIGNED ALONG A (100) CRYSTALLOGRAPHIC PLANE OF SEMICONDUCTOR TEMPLATE AND A PLURALITY OF INVERTED PYRAMIDAL CAVITIES DEFINED BY SIDEWALLS SUBSTANTIALLY ALIGNED ALONG A (111) CRYSTALLOGRAPHIC PLANE IS FORMED ACCORDING TO AN ANISOTROPIC ETCHING PROCESS. A DOSE OF RELATIVELY OF HIGH ENERGY LIGHT-MASS SPECIES IS IMPLANTED IN THE TEMPLATE AT A UNIFORM DEPTH AND PARALLEL TO THE TOP SURFACES AND SAID SIDEWALLS DEFINING THE INVERTED PYRAMIDAL CAVITIES OF THE TEMPLATE. THE SEMICONDUCTOR TEMPLATE IS ANNEALED TO CONVERT THE DOSE OF RELATIVELY OF HIGH ENERGY LIGHT-MASS SPECIES TO A MECHANICALLY-WEAK-THIN LAYER. THE SEMICONDUCTOR TEMPLATE IS CLEAVED ALONG THE MECHANICALLY-WEAK-THIN LAYER TO RELEASE A THREE-DIMENSIONAL THIN-FILM SEMICONDUCTOR SUBSTRATE FROM THE SEMICONDUCTOR TEMPLATE. THE MOST ILLUSTRATIVE DRAWING:
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US16283009P | 2009-03-24 | 2009-03-24 |
Publications (1)
Publication Number | Publication Date |
---|---|
MY159267A true MY159267A (en) | 2016-12-30 |
Family
ID=42781482
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
MYPI2011004548A MY159267A (en) | 2009-03-24 | 2010-03-24 | Method for fabricating a three-dimensional thin-film semiconductor substrate from a template |
Country Status (3)
Country | Link |
---|---|
EP (1) | EP2412029A4 (en) |
MY (1) | MY159267A (en) |
WO (1) | WO2010111417A1 (en) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2010057060A2 (en) | 2008-11-13 | 2010-05-20 | Solexel, Inc. | Methods and systems for manufacturing thin-film solar cells |
US9318644B2 (en) | 2009-05-05 | 2016-04-19 | Solexel, Inc. | Ion implantation and annealing for thin film crystalline solar cells |
WO2012166749A2 (en) * | 2011-05-27 | 2012-12-06 | Solexel, Inc. | Ion implantation and annealing for high efficiency back-contact back-junction solar cells |
CN103137811B (en) * | 2011-12-03 | 2015-11-25 | 清华大学 | Light-emitting diode |
CN103137812B (en) * | 2011-12-03 | 2015-11-25 | 清华大学 | Light-emitting diode |
CN103137803B (en) * | 2011-12-03 | 2015-08-26 | 清华大学 | Light-emitting diode |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH1140832A (en) * | 1997-07-17 | 1999-02-12 | Ion Kogaku Kenkyusho:Kk | Thin-film solar cell and manufacture therefor |
CA2246087A1 (en) * | 1998-08-28 | 2000-02-28 | Northern Telecom Limited | Method of cleaving a semiconductor wafer |
AUPR174800A0 (en) * | 2000-11-29 | 2000-12-21 | Australian National University, The | Semiconductor processing |
US20090107545A1 (en) * | 2006-10-09 | 2009-04-30 | Soltaix, Inc. | Template for pyramidal three-dimensional thin-film solar cell manufacturing and methods of use |
US20080128641A1 (en) * | 2006-11-08 | 2008-06-05 | Silicon Genesis Corporation | Apparatus and method for introducing particles using a radio frequency quadrupole linear accelerator for semiconductor materials |
-
2010
- 2010-03-24 MY MYPI2011004548A patent/MY159267A/en unknown
- 2010-03-24 EP EP10756809.9A patent/EP2412029A4/en not_active Withdrawn
- 2010-03-24 WO PCT/US2010/028534 patent/WO2010111417A1/en active Application Filing
Also Published As
Publication number | Publication date |
---|---|
WO2010111417A1 (en) | 2010-09-30 |
EP2412029A4 (en) | 2013-10-02 |
EP2412029A1 (en) | 2012-02-01 |
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