MD2556G2 - Procedeu de obtinere a nanostructurilor semiconductoare - Google Patents
Procedeu de obtinere a nanostructurilor semiconductoare Download PDFInfo
- Publication number
- MD2556G2 MD2556G2 MDA20040138A MD20040138A MD2556G2 MD 2556 G2 MD2556 G2 MD 2556G2 MD A20040138 A MDA20040138 A MD A20040138A MD 20040138 A MD20040138 A MD 20040138A MD 2556 G2 MD2556 G2 MD 2556G2
- Authority
- MD
- Moldova
- Prior art keywords
- obtaining
- semiconductor
- mask
- semiconductor nanostructures
- carried out
- Prior art date
Links
- 239000004065 semiconductor Substances 0.000 title abstract 4
- 238000000034 method Methods 0.000 title abstract 2
- 239000002086 nanomaterial Substances 0.000 title 1
- 238000005554 pickling Methods 0.000 abstract 2
- 239000013078 crystal Substances 0.000 abstract 1
- 238000000206 photolithography Methods 0.000 abstract 1
Landscapes
- Weting (AREA)
Abstract
Invenţia se referă la tehnologia semiconductoarelor, în special la procedee de obţinere a nanostructurilor semiconductoare.Procedeul de obţinere a nanostructurilor semiconductoare constă în faptul că pe una din feţele unui cristal de semiconductor, prin fotolitografie, se depune o mască, se corodează electrochimic şi se înlătură masca. Noutateainvenţiei constă în faptul că după înlăturarea măştii, se efectuează suplimentar corodarea electrochimică prin iradierea cu lumina, energia cuantelor cărei este mai mare decât valoarea benzii interzise a semiconductorului.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| MDA20040138A MD2556G2 (ro) | 2004-06-01 | 2004-06-01 | Procedeu de obtinere a nanostructurilor semiconductoare |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| MDA20040138A MD2556G2 (ro) | 2004-06-01 | 2004-06-01 | Procedeu de obtinere a nanostructurilor semiconductoare |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| MD2556F1 MD2556F1 (ro) | 2004-09-30 |
| MD2556G2 true MD2556G2 (ro) | 2005-03-31 |
Family
ID=33095721
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| MDA20040138A MD2556G2 (ro) | 2004-06-01 | 2004-06-01 | Procedeu de obtinere a nanostructurilor semiconductoare |
Country Status (1)
| Country | Link |
|---|---|
| MD (1) | MD2556G2 (ro) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| MD3811G2 (ro) * | 2007-11-06 | 2009-08-31 | Институт Прикладной Физики Академии Наук Молдовы | Procedeu de obţinere a zonelor nanostructurale semiconductoare |
| MD152Z (ro) * | 2009-03-10 | 2010-09-30 | Институт Прикладной Физики Академии Наук Молдовы | Procedeu de formare a unei microstructuri tridimensionale |
| MD193Z (ro) * | 2009-06-04 | 2010-11-30 | Институт Прикладной Физики Академии Наук Молдовы | Procedeu de obţinere a peliculei polisulfidice |
| MD249Z (ro) * | 2009-04-29 | 2011-02-28 | Институт Электронной Инженерии И Промышленных Технологий Академии Наук Молдовы | Procedeu de fabricare a răcitorului termoelectric pentru substratul circuitului integrat |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6709880B2 (en) * | 2001-09-18 | 2004-03-23 | Hitachi, Ltd. | Semiconductor device and a manufacturing method of the same |
-
2004
- 2004-06-01 MD MDA20040138A patent/MD2556G2/ro not_active IP Right Cessation
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6709880B2 (en) * | 2001-09-18 | 2004-03-23 | Hitachi, Ltd. | Semiconductor device and a manufacturing method of the same |
Non-Patent Citations (2)
| Title |
|---|
| McCord et al. Lithography with the Scanning Tunneling Microscope. J. Vac. Science Technology, B 4, 86, 1986 * |
| S. H. Zaidi et al. Scalable Fabrication and Optical Characterization of nm Si Structures. Materials Research Society Symp. Proc., Vol. 358, p. 957-968, 1995 * |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| MD3811G2 (ro) * | 2007-11-06 | 2009-08-31 | Институт Прикладной Физики Академии Наук Молдовы | Procedeu de obţinere a zonelor nanostructurale semiconductoare |
| MD152Z (ro) * | 2009-03-10 | 2010-09-30 | Институт Прикладной Физики Академии Наук Молдовы | Procedeu de formare a unei microstructuri tridimensionale |
| MD249Z (ro) * | 2009-04-29 | 2011-02-28 | Институт Электронной Инженерии И Промышленных Технологий Академии Наук Молдовы | Procedeu de fabricare a răcitorului termoelectric pentru substratul circuitului integrat |
| MD193Z (ro) * | 2009-06-04 | 2010-11-30 | Институт Прикладной Физики Академии Наук Молдовы | Procedeu de obţinere a peliculei polisulfidice |
Also Published As
| Publication number | Publication date |
|---|---|
| MD2556F1 (ro) | 2004-09-30 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| WO2006093576A3 (en) | Method for treating feedwater, feedwater treatment composition containing a scale inhibitor, and apparatus for treating feedwater | |
| WO2013052509A3 (en) | Remote plasma burn-in | |
| DK1989740T3 (da) | Fremgangsmåde til solcellemarkering og solcelle | |
| TW200633240A (en) | Method and apparatus for forming a thin-film solar cell using a continuous process | |
| DE112004002879A5 (de) | Verfahren zur Behandlung von Substratoberflächen | |
| MX2010006778A (es) | Procedimiento y dispositivo de tratamiento de pastillas de silicio. | |
| TW200715398A (en) | Resist removing method and resist removing apparatus | |
| EA201190324A1 (ru) | Способ и реактор для биологической очистки сточных вод | |
| WO2010027938A3 (en) | Desalination apparatus and process | |
| WO2012013965A9 (en) | Method of producing a light emitting device | |
| TW200629416A (en) | Semiconductor device and fabrication method thereof | |
| JP2008270780A5 (ro) | ||
| ATE451165T1 (de) | Reinigung von materialien durch behandlung mit wasserstoffbasiertem plasma | |
| CR9865A (es) | Eliminacion de los iones de fluoruro de las soluciones acuosas | |
| WO2013103379A3 (en) | N-metal film deposition with initiation layer | |
| WO2009072406A1 (ja) | シリコンウェーハ洗浄方法およびその装置 | |
| FR2974194B1 (fr) | Procede de lithographie | |
| MD2556F1 (ro) | Procedeu de obtinere a nanostructurilor semiconductoare | |
| JP2013518446A5 (ro) | ||
| MY172318A (en) | Cleaning fluid for semiconductor, and cleaning method using the same | |
| ITRM20040578A1 (it) | Processo e impianto per il trattamento di pile esauste. | |
| TW200632156A (en) | Process for treating a semiconductor wafer with a gaseous medium, and semiconductor wafer treated by this process | |
| TW200724649A (en) | Composition and method for removing hard mask | |
| TW200718828A (en) | Interleaving paper for glass | |
| IL178084A (en) | Process for producing semi-conductor coated substrate |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MM4A | Patent for invention definitely lapsed due to non-payment of fees |