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Application filed by Государственный Университет Молд0filedCriticalГосударственный Университет Молд0
Priority to MDS20180098ApriorityCriticalpatent/MD1307Z/en
Publication of MD1307YpublicationCriticalpatent/MD1307Y/en
Publication of MD1307ZpublicationCriticalpatent/MD1307Z/en
The invention relates to the field of polymer nanomaterials and photosensitive structures based thereon, which can be used in optoelectronics for creating photovoltaic devices and electrophotographic information carriers.The photosensitive layer based on carbazole polymer comprises poly-N-epoxypropylcarbazole or carbazolyl-ethyl methacrylate:octyl methacrylate copolymer sensitized with 12…15 wt.% of 2,4,7-trinitrofluorenone and 5.0…50.0 wt.% of zinc or cobalt tetrahydroxyphthalocyanine, the thickness of the photosensitive layer being of 2.0…6.0 µm.
MDS20180098A2017-12-132017-12-13Photosensitive layer based on carbazole polymer
MD1307Z
(en)
Cu2zn0.14sn0.25te2.34 nanocrystalline solution and preparation method thereof , photosensitive resin solution and black matrix preparation method, and color film substrate