LU74634A1 - - Google Patents

Info

Publication number
LU74634A1
LU74634A1 LU74634A LU74634A LU74634A1 LU 74634 A1 LU74634 A1 LU 74634A1 LU 74634 A LU74634 A LU 74634A LU 74634 A LU74634 A LU 74634A LU 74634 A1 LU74634 A1 LU 74634A1
Authority
LU
Luxembourg
Application number
LU74634A
Inventor
B C Benson
D R Dixon
Original Assignee
Ici Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ici Ltd filed Critical Ici Ltd
Publication of LU74634A1 publication Critical patent/LU74634A1/xx

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F291/00Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00
    • C08F291/18Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00 on to irradiated or oxidised macromolecules
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F271/00Macromolecular compounds obtained by polymerising monomers on to polymers of nitrogen-containing monomers as defined in group C08F26/00
    • C08F271/02Macromolecular compounds obtained by polymerising monomers on to polymers of nitrogen-containing monomers as defined in group C08F26/00 on to polymers of monomers containing heterocyclic nitrogen
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031Organic compounds not covered by group G03F7/029

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Polymerisation Methods In General (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
LU74634A 1975-03-26 1976-03-24 LU74634A1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB12676/75A GB1547998A (en) 1975-03-26 1975-03-26 Photopolymersisable compositions

Publications (1)

Publication Number Publication Date
LU74634A1 true LU74634A1 (fr) 1977-05-06

Family

ID=10009084

Family Applications (1)

Application Number Title Priority Date Filing Date
LU74634A LU74634A1 (fr) 1975-03-26 1976-03-24

Country Status (20)

Country Link
JP (1) JPS51120802A (fr)
AT (1) AT354084B (fr)
AU (1) AU1234276A (fr)
BE (1) BE840110A (fr)
CA (1) CA1079561A (fr)
CH (1) CH603745A5 (fr)
DE (1) DE2612525A1 (fr)
DK (1) DK131876A (fr)
ES (1) ES446395A1 (fr)
FI (1) FI760797A (fr)
FR (1) FR2305443A1 (fr)
GB (1) GB1547998A (fr)
LU (1) LU74634A1 (fr)
MC (1) MC1098A1 (fr)
NL (1) NL7603121A (fr)
NO (1) NO761006L (fr)
NZ (1) NZ180383A (fr)
PT (1) PT64948B (fr)
SE (1) SE7603634L (fr)
ZA (1) ZA761700B (fr)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4454219A (en) * 1981-04-27 1984-06-12 Hitachi Chemical Company, Ltd. Photosensitive resin composition comprised of a polymer obtained from an aliphatic amino group-containing monomer as a comonomer
DE3215513C3 (de) * 1981-04-27 1994-07-14 Hitachi Chemical Co Ltd Photoempfindliche Harzmasse
JPH066603B2 (ja) * 1984-08-13 1994-01-26 日本合成化学工業株式会社 硬化性樹脂組成物

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3961961A (en) * 1972-11-20 1976-06-08 Minnesota Mining And Manufacturing Company Positive or negative developable photosensitive composition

Also Published As

Publication number Publication date
NZ180383A (en) 1978-09-20
ATA224576A (de) 1979-05-15
DK131876A (da) 1976-09-27
CH603745A5 (fr) 1978-08-31
ES446395A1 (es) 1977-06-16
ZA761700B (en) 1977-04-27
NO761006L (fr) 1976-09-28
NL7603121A (nl) 1976-09-28
FI760797A (fr) 1976-09-27
AT354084B (de) 1979-12-27
PT64948A (en) 1976-04-01
FR2305443A1 (fr) 1976-10-22
BE840110A (fr) 1976-09-27
AU1234276A (en) 1977-10-20
GB1547998A (en) 1979-07-04
FR2305443B1 (fr) 1980-04-30
CA1079561A (fr) 1980-06-17
PT64948B (en) 1977-08-25
JPS51120802A (en) 1976-10-22
DE2612525A1 (de) 1976-10-14
SE7603634L (sv) 1976-09-27
MC1098A1 (fr) 1977-02-04

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