LU67556A1 - - Google Patents

Info

Publication number
LU67556A1
LU67556A1 LU67556A LU67556DA LU67556A1 LU 67556 A1 LU67556 A1 LU 67556A1 LU 67556 A LU67556 A LU 67556A LU 67556D A LU67556D A LU 67556DA LU 67556 A1 LU67556 A1 LU 67556A1
Authority
LU
Luxembourg
Application number
LU67556A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of LU67556A1 publication Critical patent/LU67556A1/xx

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3171—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation for ion implantation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S438/00—Semiconductor device manufacturing: process
    • Y10S438/961—Ion beam source and generation

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Analytical Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physical Vapour Deposition (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Particle Accelerators (AREA)
  • Welding Or Cutting Using Electron Beams (AREA)
LU67556A 1972-05-09 1973-05-07 LU67556A1 (enrdf_load_stackoverflow)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19722222736 DE2222736A1 (de) 1972-05-09 1972-05-09 Verfahren zur ionenimplantation

Publications (1)

Publication Number Publication Date
LU67556A1 true LU67556A1 (enrdf_load_stackoverflow) 1973-07-13

Family

ID=5844509

Family Applications (1)

Application Number Title Priority Date Filing Date
LU67556A LU67556A1 (enrdf_load_stackoverflow) 1972-05-09 1973-05-07

Country Status (10)

Country Link
US (1) US3909305A (enrdf_load_stackoverflow)
JP (1) JPS4962076A (enrdf_load_stackoverflow)
BE (1) BE799319A (enrdf_load_stackoverflow)
CA (1) CA1011228A (enrdf_load_stackoverflow)
CH (1) CH578891A5 (enrdf_load_stackoverflow)
DE (1) DE2222736A1 (enrdf_load_stackoverflow)
FR (1) FR2183853B1 (enrdf_load_stackoverflow)
IT (1) IT987106B (enrdf_load_stackoverflow)
LU (1) LU67556A1 (enrdf_load_stackoverflow)
NL (1) NL7306419A (enrdf_load_stackoverflow)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4179312A (en) * 1977-12-08 1979-12-18 International Business Machines Corporation Formation of epitaxial layers doped with conductivity-determining impurities by ion deposition
DE2835121A1 (de) * 1978-08-10 1980-02-14 Fraunhofer Ges Forschung Verfahren und vorrichtung zum dotieren von halbleitern mittels ionenimplantation
EP0079931B1 (en) * 1981-05-26 1987-03-11 Hughes Aircraft Company Focused ion beam microfabrication column
EP0221897A1 (en) * 1985-05-17 1987-05-20 J.C. Schumacher Company Ion implant using alkali or alkaline earth metal tetrafluoroborate as boron ion source
US4721683A (en) * 1987-05-21 1988-01-26 American Cyanamid Company Use of alkylphosphines and alkylarsines in ion implantation
US5063294A (en) * 1989-05-17 1991-11-05 Kabushiki Kaisha Kobe Seiko Sho Converged ion beam apparatus
JP2863962B2 (ja) * 1992-04-10 1999-03-03 株式会社日立製作所 イオン打ち込み装置
US5837568A (en) * 1995-12-12 1998-11-17 Sanyo Electric Co., Ltd. Manufacturing method of semiconductor devices
US6521506B1 (en) * 2001-12-13 2003-02-18 International Business Machines Corporation Varactors for CMOS and BiCMOS technologies
US7361915B2 (en) * 2005-11-30 2008-04-22 Axcelis Technologies, Inc. Beam current stabilization utilizing gas feed control loop

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3484313A (en) * 1965-03-25 1969-12-16 Hitachi Ltd Method of manufacturing semiconductor devices
US3558376A (en) * 1966-01-07 1971-01-26 Siemens Ag Method for controlled doping by gas of foreign substance into semiconductor materials
US3442725A (en) * 1966-05-05 1969-05-06 Motorola Inc Phosphorus diffusion system
US3437734A (en) * 1966-06-21 1969-04-08 Isofilm Intern Apparatus and method for effecting the restructuring of materials
US3477887A (en) * 1966-07-01 1969-11-11 Motorola Inc Gaseous diffusion method
US3547074A (en) * 1967-04-13 1970-12-15 Block Engineering Apparatus for forming microelements
US3737346A (en) * 1971-07-01 1973-06-05 Bell Telephone Labor Inc Semiconductor device fabrication using combination of energy beams for masking and impurity doping

Also Published As

Publication number Publication date
CA1011228A (en) 1977-05-31
FR2183853B1 (enrdf_load_stackoverflow) 1977-02-11
NL7306419A (enrdf_load_stackoverflow) 1973-11-13
CH578891A5 (enrdf_load_stackoverflow) 1976-08-31
DE2222736A1 (de) 1973-11-22
BE799319A (fr) 1973-08-31
US3909305A (en) 1975-09-30
JPS4962076A (enrdf_load_stackoverflow) 1974-06-15
FR2183853A1 (enrdf_load_stackoverflow) 1973-12-21
IT987106B (it) 1975-02-20

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