KR970067722A - Semiconductor mask cleaning apparatus - Google Patents

Semiconductor mask cleaning apparatus Download PDF

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Publication number
KR970067722A
KR970067722A KR1019960005459A KR19960005459A KR970067722A KR 970067722 A KR970067722 A KR 970067722A KR 1019960005459 A KR1019960005459 A KR 1019960005459A KR 19960005459 A KR19960005459 A KR 19960005459A KR 970067722 A KR970067722 A KR 970067722A
Authority
KR
South Korea
Prior art keywords
mask
cleaning apparatus
cleaning liquid
cleaning
chuck
Prior art date
Application number
KR1019960005459A
Other languages
Korean (ko)
Inventor
최성진
Original Assignee
문정환
엘지반도체 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 문정환, 엘지반도체 주식회사 filed Critical 문정환
Priority to KR1019960005459A priority Critical patent/KR970067722A/en
Publication of KR970067722A publication Critical patent/KR970067722A/en

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  • Cleaning Or Drying Semiconductors (AREA)

Abstract

본 발명은 마스크가 고정되는 마스크척과, 마스크척이 일정간격으로 양끝단에 설치되고, 마스크의 크기에 따라 마스크척의 간격이 조절되는 셋팅부가 외곽에 설치된 반응챔버와, 반응챔버에 설치되어 중앙에는 세정액분사라인이, 가장자리에는 가스분사라인이 설치되어 회전되는 세정부와, 가스분사라인에 공급되는 가스가 필터링 되는 필터와, 반응챔버의 하단에 설치되어, 세정액이 배기되는 배기관으로 이루어지는 반도체 마스크의 세정장치에 관한 것이다.The present invention relates to a masking apparatus comprising a mask chuck to which a mask is fixed, a reaction chamber provided at both ends of the mask chuck at regular intervals and provided with a setting unit on the outer side of which a setting unit for adjusting the interval of the mask chuck is adjusted according to the size of the mask, A cleaning unit for cleaning the semiconductor mask, the cleaning unit being disposed at the lower end of the reaction chamber and including an exhaust pipe through which the cleaning liquid is exhausted; ≪ / RTI >

Description

반도체 마스크의 세정장치Semiconductor mask cleaning apparatus

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is a trivial issue, I did not include the contents of the text.

제1도는 본 발명의 세정장치를 설명하기 위해 도시한 도면이다.FIG. 1 is a view for explaining a cleaning apparatus of the present invention.

Claims (4)

반도체 마스크의 세정장치에 있어서, 마스크가 고정되는 마스크척과, 상기 마스크척이 일정간격으로 양끝단에 설치되고, 상기 마스크의 크기에 따라 상기 마스크척의 간격이 조절되는 셋팅부가 외곽에 설치된 반응챔버와 상기 반응챔버에 설치되어, 중앙에는 세정액분사라인이, 가장자리에는 가스분사라인이 설치되어 회전되는 세정부와, 상기 가스분사라인에 공급되는 가스가 필터링되는 필터와, 상기 반응챔버의 하단에 설치되어, 세정액이 배기되는 배기관으로 이루어지는 반도체 마스크의 세정장치.A cleaning apparatus for a semiconductor mask, comprising: a mask chuck to which a mask is fixed; a reaction chamber in which the mask chuck is installed at both ends at predetermined intervals, and a setting unit in which an interval between the mask chucks is adjusted according to the size of the mask, A cleaner installed in the reaction chamber and having a cleaning liquid injection line at a center and a gas injection line at an edge thereof and rotated; a filter for filtering gas supplied to the gas injection line; And an exhaust pipe through which the cleaning liquid is exhausted. 제1항에 있어서, 상기 마스크척의 재질은 테프론계로 형성되는 것을 특징으로 하는 반도체 마스크의 세정장치.The cleaning apparatus of claim 1, wherein the material of the mask chuck is a Teflon-based material. 제1항에 있어서, 상기 세정액으로는 수산화암모늄과 순수와 과산화수소가 2대 10대1의 비율로 혼합되어 사용되는 것을 특징으로 하는 반도체 마스크의 세정장치.The cleaning apparatus of claim 1, wherein the cleaning liquid is a mixture of ammonium hydroxide, pure water, and hydrogen peroxide in a ratio of 2: 10: 1. 제1항에 있어서, 상기 세정액이 분사된 세정액분사라인은 순수로 린스하여 건조시키되, 건조온도범위는 60℃에서 70℃ 사이인 것을 특징으로 하는 반도체 마스크의 세정장치.The cleaning apparatus according to claim 1, wherein the cleaning liquid jetting line in which the cleaning liquid is sprayed is rinsed with pure water and dried, and the drying temperature range is from 60 ° C to 70 ° C.
KR1019960005459A 1996-03-02 1996-03-02 Semiconductor mask cleaning apparatus KR970067722A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1019960005459A KR970067722A (en) 1996-03-02 1996-03-02 Semiconductor mask cleaning apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019960005459A KR970067722A (en) 1996-03-02 1996-03-02 Semiconductor mask cleaning apparatus

Publications (1)

Publication Number Publication Date
KR970067722A true KR970067722A (en) 1997-10-13

Family

ID=66222487

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019960005459A KR970067722A (en) 1996-03-02 1996-03-02 Semiconductor mask cleaning apparatus

Country Status (1)

Country Link
KR (1) KR970067722A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100782535B1 (en) * 2006-07-12 2007-12-06 임종환 Mask washing device for pcb

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100782535B1 (en) * 2006-07-12 2007-12-06 임종환 Mask washing device for pcb

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