TWM638862U - Washing device for removing ammonia gas and organics - Google Patents

Washing device for removing ammonia gas and organics Download PDF

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Publication number
TWM638862U
TWM638862U TW111210865U TW111210865U TWM638862U TW M638862 U TWM638862 U TW M638862U TW 111210865 U TW111210865 U TW 111210865U TW 111210865 U TW111210865 U TW 111210865U TW M638862 U TWM638862 U TW M638862U
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Taiwan
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liquid
filter
pickling
chamber
organic matter
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TW111210865U
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Chinese (zh)
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卓冠宏
張原豪
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奇鼎科技股份有限公司
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Publication of TWM638862U publication Critical patent/TWM638862U/en

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Abstract

本創作係有關一種去除氨氣及有機物之洗滌裝置,利用洗滌裝置內的第一過濾裝置及第二過濾裝置,依序進行循環酸洗模式(其pH值維持於5以下)及沖洗水洗模式,來同步去除因晶圓洗淨所產生的廢棄氣體中高濃度之氨氣及有機物。This creation is about a scrubbing device for removing ammonia gas and organic matter, using the first filtering device and the second filtering device in the scrubbing device to sequentially carry out the cyclic pickling mode (the pH value of which is maintained below 5) and the flushing and water washing mode, To simultaneously remove the high concentration of ammonia and organic matter in the waste gas generated by wafer cleaning.

Description

去除氨氣及有機物之洗滌裝置Washing device for removing ammonia and organic matter

本創作係有關一種洗滌裝置,尤其是一種用於晶圓洗淨製程中的去除氨氣及有機物之洗滌裝置。 The invention relates to a cleaning device, especially a cleaning device for removing ammonia gas and organic matter in the wafer cleaning process.

在超大型積體電路(ULSI)製程中,晶圓洗淨之技術及其潔淨度(Cleanliness)往往是影響晶圓製程的良率(Yield)、元件品質(Quality)以及其可靠度(Reliability)的重要因素之一。因此,在相關製程中需要對晶圓進行清洗來達到潔淨度的要求。 In the ultra-large integrated circuit (ULSI) process, the wafer cleaning technology and its cleanliness (Cleanliness) often affect the yield (Yield), component quality (Quality) and its reliability (Reliability) of the wafer process. one of the important factors. Therefore, the wafer needs to be cleaned in the related process to meet the cleanliness requirement.

而晶圓的清洗是將整批次或單一晶圓,藉由化學品浸泡或純水清洗來進行,主要是為了清除晶圓表面的污染物,如微粒子、有機汙染物、無機物、金屬離子等雜質。 The cleaning of wafers is carried out by soaking the whole batch or a single wafer with chemicals or pure water cleaning, mainly to remove pollutants on the wafer surface, such as fine particles, organic pollutants, inorganic substances, metal ions, etc. Impurities.

目前業界較常使用濕式清洗法,而最為被接受的是濕式清洗法中的RCA清潔法(RCA Clean),此RCA清潔法為1960年代由RCA公司所發展。其清潔原理在於使用於不同的化學配方來進行清潔,像是標準清潔液1(SC-1)及標準清潔液2(SC-2)等。 At present, the wet cleaning method is commonly used in the industry, and the most accepted one is the RCA cleaning method (RCA Clean) in the wet cleaning method. This RCA cleaning method was developed by the RCA company in the 1960s. The cleaning principle is to use different chemical formulas for cleaning, such as standard cleaning solution 1 (SC-1) and standard cleaning solution 2 (SC-2).

而在使用化學配方SC-1(APM)、SC-2(HPM)、SPM、DHF及BHF...等進行清潔的同時,常會帶有大量酸氣、鹼氣及揮發性有機物等製程混合廢氣排放。目前對於揮發性有機物的去除效率一直未能達到良好之效果。 While cleaning with chemical formulas SC-1 (APM), SC-2 (HPM), SPM, DHF, and BHF, etc., there will often be a large amount of process mixed waste gas such as acid gas, alkali gas, and volatile organic compounds. emission. At present, the removal efficiency of volatile organic compounds has not been able to achieve good results.

而揮發性有機物(又稱揮發性有機氣體污染物,Volatile Organic Compounds,VOCs),係指在一大氣壓下,沸點在250℃以下之有機化合物之空氣污染物總稱,其所造成的環境污染問題,廣泛地存在於各類型工業中。 Volatile organic compounds (also known as volatile organic gas pollutants, Volatile Organic Compounds, VOCs) refers to the general term for air pollutants of organic compounds with a boiling point below 250°C under atmospheric pressure, and the environmental pollution caused by them. It is widely used in various types of industries.

而工業上常見的揮發性有機物以丙酮(Acetone)、異丙酮(IPA)、丙二醇單甲基醚(PGME)、乙酸丙二醇單甲基醚酯(PGMEA)、二甲基亞碸(DMSO)、乙醇胺(MEA)、氮-甲基2-四氫吡咯酮(NMP)、二乙二醇單丁醚(BDG)、四甲基氫氧化銨(TMAH)等成份為多數。 The common volatile organic compounds in industry are acetone (Acetone), isopropyl ketone (IPA), propylene glycol monomethyl ether (PGME), propylene glycol monomethyl ether acetate (PGMEA), dimethylsulfoxide (DMSO), ethanolamine (MEA), nitrogen-methyl 2-tetrahydropyrrolone (NMP), diethylene glycol monobutyl ether (BDG), tetramethylammonium hydroxide (TMAH) and other ingredients are the majority.

在解決混合廢氣的問題上,多為導入濕式洗滌塔來處理廢氣中污染物(酸、鹼、有機物質),但對於有機氣體的去除效率卻一直未能達到良好之效果,尤其是在單晶圓清洗機上,有機性製程廢氣(主要為異丙醇)其去除效率一直未有良好之效果。 In solving the problem of mixed exhaust gas, most of them introduce wet scrubbers to deal with pollutants (acid, alkali, organic substances) in exhaust gas, but the removal efficiency of organic gases has not been able to achieve good results, especially in single On the wafer cleaning machine, the removal efficiency of organic process waste gas (mainly isopropanol) has not been good.

而現今濕式洗滌塔的清洗方式,除了有機性製程廢氣的去除效率一直無法提高外,亦無法在去除有機性製程廢氣的同時,同步去除高濃度腐蝕性製程廢氣。 However, the cleaning method of the current wet scrubber, in addition to the removal efficiency of organic process exhaust gas, has not been able to improve, and it is also unable to simultaneously remove high-concentration corrosive process exhaust gas while removing organic process exhaust gas.

為此,除了改善並提高濕式洗滌塔對異丙醇(IPA)等有機物之去除效率外,在去除異丙醇(IPA)等有機物的同時,亦製作出可同步去除高濃度腐蝕性製程廢氣之濕式洗滌塔,並且高濃度腐蝕性製程廢氣及有機污染物具有高去除效率,為本領域技術人員所欲解決的問題。 For this reason, in addition to improving and increasing the removal efficiency of wet scrubbers for organic substances such as isopropanol (IPA), while removing organic substances such as isopropanol (IPA), it is also possible to simultaneously remove high-concentration corrosive process exhaust gases. The wet scrubber, and the high concentration of corrosive process waste gas and organic pollutants have high removal efficiency, which is a problem that those skilled in the art want to solve.

本創作之主要目的,係提供一種去除氨氣及有機物之洗滌裝置,藉由第一過濾裝置的循環酸洗模式(其pH值維持於5以下)及第二過濾裝置的沖洗水洗模式的設置,來同步去除廢棄氣體中高濃度之氨氣及有機物。 The main purpose of this creation is to provide a washing device for removing ammonia gas and organic matter. By setting the cyclic pickling mode (its pH value is maintained below 5) of the first filter device and the flushing water washing mode of the second filter device, To simultaneously remove high concentrations of ammonia and organic matter in waste gas.

為了達到上述之目的,本創作揭示了一種去除氨氣及有機物之洗滌裝置,其係設置於一腔體內,該腔體兩側分別設有一進氣口及一出氣口,其結構包含:一第一過濾裝置,其係設置於該腔體內,並位於該進氣口之一側,該第一過濾裝置係包含;以及一酸洗腔室,該酸洗腔室之兩側分別設置一第一過濾進氣口以及一第一過濾出氣口,該進氣口係透過一進氣連通道連通該第一過濾進氣口;一第一過濾件,其設置於該酸洗腔室之內側,並位於該第一過濾進氣口之上方;一第一噴灑裝置,其設置於該酸洗腔室之內側,並位於該第一過濾件之上方,該第一噴灑裝置包含至少一第一噴頭及一第一管路,該第一管路係一端連接該至少一第一噴頭,另一端穿設該酸洗腔室並連通一液體切換閥;以及一循環管路,其位於該酸洗腔室之下方並穿設該酸洗腔室,其一端連通該液體切換閥,該循環管路係用以運輸一第一液體經由該液體切換閥進入該第一管路,使該第一噴灑裝置於該第一過濾件上噴灑該第一液體,該第一液體係酸性液體;一第二過濾裝置,其係設置於該腔體內,並位於該出氣口之一側,該第二過濾裝置係包含;一水洗腔室,該水洗腔室之兩側分別設置一第二過濾進氣口以及一第二過濾出氣口,該第一過濾出氣口係經由一氣體連通道連通該第二過濾進氣口,該第二過濾出氣口係連通該出氣口;一第二過濾件,其設置於該水洗腔室之內側,並位於該第二過濾進氣口之上方;以及一第二噴灑裝置,其設置於該水洗腔室之內側,並位於該第二過濾件之上方,該第二噴灑裝置包含至少一第二噴頭及一第二管路,該第二管路係一端連接該至少一第二噴頭,另一端穿設該水洗腔室並連通一水洗液體供應裝置。 In order to achieve the above purpose, this creation discloses a washing device for removing ammonia gas and organic matter, which is installed in a cavity, and an air inlet and an air outlet are respectively arranged on both sides of the cavity, and its structure includes: a first A filtering device, which is arranged in the chamber and located on one side of the air inlet, the first filtering device includes; and a pickling chamber, the two sides of the pickling chamber are respectively provided with a first A filter air inlet and a first filter air outlet, the air inlet is connected to the first filter air inlet through an air inlet connecting channel; a first filter element is arranged on the inside of the pickling chamber, and Located above the first filter air inlet; a first spraying device, which is arranged inside the pickling chamber and above the first filter element, the first spraying device includes at least one first spray head and A first pipeline, one end of the first pipeline is connected to the at least one first spray head, the other end passes through the pickling chamber and communicates with a liquid switching valve; and a circulation pipeline, which is located in the pickling chamber The pickling chamber is placed under the pickling chamber, one end of which is connected to the liquid switching valve, and the circulation pipeline is used to transport a first liquid through the liquid switching valve into the first pipeline, so that the first spraying device The first liquid is sprayed on the first filter, and the first liquid is an acidic liquid; a second filter device is arranged in the cavity and is located on one side of the air outlet, and the second filter device includes ; A water washing chamber, the two sides of the water washing chamber are respectively provided with a second filter air inlet and a second filter air outlet, the first filter air outlet is connected to the second filter air inlet through a gas connection channel , the second filter air outlet is connected to the air outlet; a second filter, which is arranged on the inside of the washing chamber, and is located above the second filter air inlet; and a second spraying device, which is set Inside the washing chamber and above the second filter element, the second spraying device includes at least one second spray head and a second pipeline, and one end of the second pipeline is connected to the at least one second spray head , the other end passes through the washing chamber and communicates with a washing liquid supply device.

本創作提供一實施例,其內容在於當一廢棄氣體進入該酸洗腔室,該廢棄氣體係包含一氨氣及一有機物,該氨氣之濃度大於800ppm及該有機物之濃度大於1000ppm,當該廢棄氣體通過該第一過濾件後去除該氨氣,並經由該第一過濾出氣口排出該酸洗腔室,後續經由該氣體連通道進入該水洗腔室,並通過該第二過濾件去除該有機物後,該廢棄氣體經由該第二過濾出氣口排出該水洗腔室,再者,該第一液體經由該第一管路進入該酸洗腔室,並通過該至少一第一噴頭噴灑於經過該第一過濾件之該廢棄氣體後,該第一液體排出該酸洗腔室並流入該循環管路,且一第二液體經由該第二管路進入該水洗腔室,並通過該至少一第二噴頭噴灑於經過該第二過濾件之該廢棄氣體後,該第二液體排出該水洗腔室。 This creation provides an embodiment, the content of which is that when a waste gas enters the pickling chamber, the waste gas system contains an ammonia gas and an organic matter, the concentration of the ammonia gas is greater than 800ppm and the concentration of the organic matter is greater than 1000ppm, when the The waste gas passes through the first filter element to remove the ammonia gas, and exits the pickling chamber through the first filter gas outlet, then enters the water washing chamber through the gas connection channel, and removes the ammonia gas through the second filter element. After removing the organic matter, the waste gas is discharged from the water washing chamber through the second filtered air outlet, and the first liquid enters the pickling chamber through the first pipeline, and is sprayed on the passing through the at least one first spray head. After the waste gas of the first filter element, the first liquid is discharged from the pickling chamber and flows into the circulation pipeline, and a second liquid enters the water washing chamber through the second pipeline, and passes through the at least one After the second spray head sprays the waste gas passing through the second filter element, the second liquid is discharged from the washing chamber.

本創作提供一實施例,其內容在於該第一過濾裝置係進一步包含一監控模組(一第一傳輸元件)、一酸鹼檢測儀、一排酸控制裝置(一第二傳輸元件、一計時元件)及一酸洗液體供應裝置(一第三傳輸元件)。 This creation provides an embodiment, and its content is that this first filter system further comprises a monitoring module (a first transmission element), an acid-base detector, an acid discharge control device (a second transmission element, a timing element) and a pickling liquid supply device (a third transmission element).

本創作提供一實施例,其內容在於當該酸鹼檢測儀檢測該第一液體之酸鹼值大於5時,該酸鹼檢測儀通知該監控模組,該監控模組傳送一排除訊息至該排酸控制裝置並排除該酸洗腔室之該第一液體,且該排酸控制裝置傳送一補充訊息至該酸洗液體供應裝置,該酸洗液體供應裝置補充該第一液體至一液體供應管路,該液體供應管路之一端連通該液體切換閥,另一端連通該酸洗液體供應裝置。 This creation provides an embodiment, the content of which is that when the acid-base detector detects that the pH value of the first liquid is greater than 5, the acid-base detector notifies the monitoring module, and the monitoring module sends an exclusion message to the The acid discharge control device removes the first liquid from the pickling chamber, and the acid discharge control device sends a replenishment message to the pickling liquid supply device, and the pickling liquid supply device replenishes the first liquid to a liquid supply pipeline, one end of the liquid supply pipeline communicates with the liquid switching valve, and the other end communicates with the pickling liquid supply device.

本創作提供一實施例,其內容在於當該計時元件到達一預定時間值時,該排酸控制裝置自動排除該酸洗腔室之該第一液體,且該排酸控制裝置 傳送該補充訊息至該酸洗液體供應裝置,該酸洗液體供應裝置補充該第一液體至該液體供應管路。 The invention provides an embodiment, the content of which is that when the timing element reaches a predetermined time value, the acid discharge control device automatically removes the first liquid in the pickling chamber, and the acid discharge control device The supplementary message is sent to the pickling liquid supply device, and the pickling liquid supply device replenishes the first liquid to the liquid supply pipeline.

本創作提供一實施例,其內容在於該第二過濾裝置係進一步包含一排水裝置,其係設置於該水洗腔室之下方,該排水裝置係用以排出該第二液體。 The invention provides an embodiment, the content of which is that the second filtering device further includes a drainage device, which is arranged under the washing chamber, and the drainage device is used to discharge the second liquid.

本創作提供一實施例,其內容在於該第一過濾件包含一第一殼體、至少一第一多孔元件及至少一第一離子吸附元件,該至少一第一多孔元件(上方設置一第一觸媒材料)及該至少一第一離子吸附元件係依序堆疊設置於該第一殼體內,且該至少一第一多孔元件位於該第一過濾進氣口之一側,該至少一第一離子吸附元件位於該第一過濾出氣口之一側。 This creation provides an embodiment, the content of which is that the first filter element includes a first housing, at least one first porous element and at least one first ion adsorption element, and the at least one first porous element (a The first catalytic material) and the at least one first ion adsorption element are stacked in sequence in the first housing, and the at least one first porous element is located on one side of the first filter inlet, and the at least one A first ion adsorption element is located at one side of the first filtered air outlet.

本創作提供一實施例,其內容在於該第二過濾件包含一第二殼體、至少一第二多孔元件及至少一第二離子吸附元件,該至少一第二多孔元件(上方設置一第二觸媒材料)及該至少一第二離子吸附元件係依序堆疊設置於該第二殼體內,且該至少一第二多孔元件位於該第二過濾進氣口之一側,該至少一第二離子吸附元件位於該第二過濾出氣口之一側。 This creation provides an embodiment, the content of which is that the second filter element includes a second housing, at least one second porous element and at least one second ion adsorption element, and the at least one second porous element (a The second catalyst material) and the at least one second ion adsorption element are stacked in sequence in the second housing, and the at least one second porous element is located on one side of the second filter inlet, the at least one A second ion adsorption element is located at one side of the second filtered air outlet.

1:洗滌裝置 1: washing device

10:腔體 10: Cavity

12:進氣口 12: air inlet

121:進氣連通道 121: Intake connecting channel

122:氣體連通道 122: gas connecting channel

14:出氣口 14: Air outlet

20:第一過濾裝置 20: The first filter device

21:酸洗腔室 21: pickling chamber

211:第一過濾進氣口 211: The first filter air inlet

212:第一過濾出氣口 212: The first filter air outlet

22:第一過濾件 22: The first filter

221:第一殼體 221: The first shell

222:第一多孔元件 222: first porous element

2221:第一觸媒材料 2221: The first catalyst material

223:第一離子吸附元件 223: The first ion adsorption element

23:第一噴灑裝置 23: The first sprinkler

231:第一噴頭 231: The first nozzle

232:第一管路 232: The first pipeline

233:液體切換閥 233: liquid switching valve

24:循環管路 24:Circulation pipeline

25:監控模組 25:Monitoring module

251:第一傳輸元件 251: the first transmission element

26:酸鹼檢測儀 26: Acid-base detector

27:排酸控制裝置 27: Acid discharge control device

271:計時元件 271: timing element

272:第二傳輸元件 272: Second transmission element

28:酸洗液體供應裝置 28: Pickling liquid supply device

281:第三傳輸元件 281: The third transmission element

282:液體供應管路 282: Liquid supply line

30:第二過濾裝置 30: Second filter device

31:水洗腔室 31: washing chamber

311:第二過濾進氣口 311: Second filter air inlet

312:第二過濾出氣口 312: Second filter air outlet

32:第二過濾件 32: Second filter element

321:第二殼體 321: second shell

322:第二多孔元件 322: second porous element

3221:第二觸媒材料 3221: Second catalyst material

323:第二離子吸附元件 323: the second ion adsorption element

33:第二噴灑裝置 33: Second sprinkler

331:第二噴頭 331: Second nozzle

332:第二管路 332: Second pipeline

34:水洗液體供應裝置 34: Washing liquid supply device

35:排水裝置 35: Drainage device

A:廢棄氣體 A: waste gas

N:氨氣 N: Ammonia

P:間距 P: Pitch

S1:排除訊息 S1: Exclude message

S2:補充訊息 S2: Supplementary information

VOC:有機物 VOC: organic matter

W1:第一液體 W1: first liquid

W2:第二液體 W2: second liquid

θ:角度 θ: angle

第1A圖:其係本創作之實施例之結構示意圖;第1B圖:其係本創作之實施例之結構運作示意圖;第2圖:其係本創作之離子吸附元件之結構放大示意圖;第3A圖:其係本創作之酸鹼監測模式之訊號傳輸示意圖;以及第3B圖:其係本創作之定時監測模式之訊號傳輸示意圖。 Figure 1A: It is a structural schematic diagram of an embodiment of this creation; Figure 1B: It is a schematic diagram of the structure and operation of an embodiment of this creation; Figure 2: It is a schematic diagram of an enlarged structure of an ion adsorption element of this creation; Figure 3A Figure: It is a schematic diagram of signal transmission in the acid-base monitoring mode of this creation; and Figure 3B: it is a schematic diagram of signal transmission in the timing monitoring mode of this creation.

為使貴審查委員對本創作之特徵及所達成之功效有更進一步之瞭解與認識,謹佐以實施例及配合說明,說明如後:有鑑於無法在去除有機汙染物(其去除效率不高)的同時,同步去除高濃度腐蝕性製程廢氣的問題。據此,本創作遂提出一種去除氨氣及有機物之洗滌裝置,以解決習知技術所造成之問題。 In order to enable your review committee to have a further understanding and understanding of the characteristics of this creation and the effects achieved, the examples and accompanying explanations are hereby provided as follows: In view of the fact that it is impossible to remove organic pollutants (the removal efficiency is not high) At the same time, it simultaneously removes the problem of high-concentration corrosive process exhaust gas. Accordingly, this creation then proposes a washing device for removing ammonia and organic matter to solve the problems caused by the prior art.

以下將進一步說明本創作之去除氨氣及有機物之洗滌裝置其包含之特性、所搭配之結構及方法:首先,請參閱第1A圖,其係本創作之實施例之結構示意圖。如第1A圖所示,本創作之去除氨氣及有機物之洗滌裝置1,其係設置於一腔體10內,該腔體10兩側分別設有一進氣口12及一出氣口14,其結構包含一第一過濾裝置20及一第二過濾裝置30。 The following will further illustrate the characteristics, matching structure and method of the washing device for removing ammonia and organic matter of this creation: first, please refer to Figure 1A, which is a structural schematic diagram of an embodiment of this creation. As shown in Fig. 1A, the washing device 1 for removing ammonia gas and organic matter of the present creation is arranged in a cavity 10, and an air inlet 12 and an air outlet 14 are respectively arranged on both sides of the cavity 10, and its The structure includes a first filter device 20 and a second filter device 30 .

本實施例之該第一過濾裝置20其係設置於該腔體10內,並位於該進氣口12之一側,其結構包含:一酸洗腔室21、一第一過濾件22、一第一噴灑裝置23及一循環管路24。其中該酸洗腔室21之兩側分別設置一第一過濾進氣口211以及一第一過濾出氣口212,該進氣口12係透過一進氣連通道121連通該第一過濾進氣口211。 The first filtering device 20 of this embodiment is arranged in the cavity 10 and is located on one side of the air inlet 12. Its structure includes: a pickling chamber 21, a first filter element 22, a The first spraying device 23 and a circulation pipeline 24 . Wherein the two sides of this pickling chamber 21 are respectively provided with a first filtered air inlet 211 and a first filtered air outlet 212, and the air inlet 12 is communicated with the first filtered air inlet through an air inlet connecting channel 121 211.

而本實施例之該第一過濾件22設置於該酸洗腔室21之內側,並位於該第一過濾進氣口211之上方,其中該第一過濾件22包含一第一殼體221、至少一第一多孔元件222及至少一第一離子吸附元件223。 In this embodiment, the first filter element 22 is disposed inside the pickling chamber 21 and above the first filter inlet 211, wherein the first filter element 22 includes a first housing 221, At least one first porous element 222 and at least one first ion adsorption element 223 .

而該至少一第一多孔元件222及該至少一第一離子吸附元件223係依序堆疊設置於該第一殼體221內,且該至少一第一多孔元件221位於該第一過濾進氣口211之一側,該至少一第一離子吸附元件223(係為塑膠、玻璃纖維、金屬板或陶瓷填充材料以單一或複合材料之方式製成板式波浪狀之平板構造,使板與板之間形成氣體通道)位於該第一過濾出氣口212之一側。 The at least one first porous element 222 and the at least one first ion adsorption element 223 are sequentially stacked in the first casing 221, and the at least one first porous element 221 is located in the first filter inlet On one side of the air port 211, the at least one first ion adsorption element 223 (is made of plastic, glass fiber, metal plate or ceramic filling material in a single or composite material to form a plate-shaped corrugated flat structure, so that the plate and plate Forming a gas passage therebetween) is located on one side of the first filtered gas outlet 212 .

並於該至少一第一多孔元件222(其材質係為不鏽鋼、鈦、鉑或鋁,但不已此為限)之上表面設置一第一觸媒材料2221(係為二氧化鈦、氧化矽、氧化鋁或鉑,但不已此為限)。 And on the surface of the at least one first porous element 222 (its material is stainless steel, titanium, platinum or aluminum, but not limited to this), a first catalyst material 2221 (titanium dioxide, silicon oxide, oxide aluminum or platinum, but not limited to).

再者,本實施例之該第一噴灑裝置23其設置於該酸洗腔室21之內側,並位於該第一過濾件22之上方,該第一噴灑裝置23包含至少一第一噴頭231及一第一管路232,該第一管路232係一端連接該至少一第一噴頭231,另一端穿設該酸洗腔室21並連通一液體切換閥233(係為球閥或球向閥之結構,包含二通閥或三通閥或四通閥等,本實施例中係以三通球閥進行說明,但不以此為限)。 Furthermore, the first spraying device 23 of this embodiment is arranged inside the pickling chamber 21 and above the first filter element 22. The first spraying device 23 includes at least one first spraying head 231 and A first pipeline 232, one end of the first pipeline 232 is connected to the at least one first nozzle 231, and the other end passes through the pickling chamber 21 and communicates with a liquid switching valve 233 (which is a ball valve or a ball valve) structure, including a two-way valve, a three-way valve, or a four-way valve, etc., a three-way ball valve is used for illustration in this embodiment, but it is not limited thereto).

其中該至少一第一噴頭231係噴灑一第一液體W1(係酸性液體,本實施例選用硫酸,但不已此為限,並依據一氨氣N之濃度對該第一液體W1之pH值用水進行調整,並維持低於pH 5以下)於該第一過濾件22上,使該第一過濾件22呈現酸性狀態(維持低於pH 5以下)。 Wherein the at least one first shower head 231 sprays a first liquid W1 (is an acidic liquid, the present embodiment selects sulfuric acid for use, but not limited to this, and the pH value of the first liquid W1 is watered according to the concentration of ammonia N) adjust, and maintain below pH 5) on the first filter element 22, so that the first filter element 22 presents an acidic state (maintain below pH 5).

再者,該第一過濾裝置20之該循環管路24其位於該酸洗腔室21之下方並穿設該酸洗腔室21,其一端連通該液體切換閥233,該循環管路24係用以運輸該第一液體W1經由該液體切換閥233再次進入該第一管路232,使該第一噴灑裝置23於該第一過濾件33上噴灑該第一液體W1,並再進入該循環管路24中進行循環。 Furthermore, the circulation line 24 of the first filtering device 20 is located below the pickling chamber 21 and passes through the pickling chamber 21, one end of which communicates with the liquid switching valve 233, and the circulation line 24 is Used to transport the first liquid W1 to enter the first pipeline 232 again through the liquid switching valve 233, so that the first spraying device 23 sprays the first liquid W1 on the first filter element 33, and then enters the cycle again Circulation is carried out in the pipeline 24.

而本實施例之該第二過濾裝置30,其係設置於該腔體10內,並位於該出氣口14之一側,該第二過濾裝置30係包含:一水洗腔室31、一第二過濾件32及一第二噴灑裝置33。其中該水洗腔室31之兩側分別設置一第二過濾進氣口311以及一第二過濾出氣口312,該第一過濾出氣口311係經由一氣體連通道122連通該第二過濾進氣口311,該第二過濾出氣口312係連通該出氣口14。 And this second filtering device 30 of present embodiment, it is arranged in this cavity 10, and is positioned at one side of this air outlet 14, and this second filtering device 30 is comprised: a washing chamber 31, a second The filter element 32 and a second spraying device 33 . Wherein the both sides of this washing chamber 31 are respectively provided with a second filtered air inlet 311 and a second filtered air outlet 312, and the first filtered air outlet 311 is connected to the second filtered air inlet through a gas connection channel 122 311 , the second filtered air outlet 312 is connected to the air outlet 14 .

而該第二過濾件32其設置於該水洗腔室31之內側,並位於該第二過濾進氣口311之上方,其中該第二過濾件32包含一第二殼體321、至少一第二多孔元件322及至少一第二離子吸附元件323。 And the second filter element 32 is arranged inside the washing chamber 31 and above the second filter inlet 311, wherein the second filter element 32 includes a second housing 321, at least one second The porous element 322 and at least one second ion adsorption element 323 .

而該至少一第二多孔元件322及該至少一第二離子吸附元件323係依序堆疊設置於該第二殼體321內,且該至少一第二多孔元件322位於該第二過 濾進氣口311之一側,該至少一第二離子吸附元件323(係為塑膠、玻璃纖維、金屬板或陶瓷填充材料以單一或複合材料之方式製成板式波浪狀之平板構造,使板與板之間形成氣體通道)位於該第二過濾出氣口312之一側。 The at least one second porous element 322 and the at least one second ion adsorption element 323 are sequentially stacked in the second casing 321, and the at least one second porous element 322 is located in the second process One side of the filter air inlet 311, the at least one second ion adsorption element 323 (is a plastic, glass fiber, metal plate or ceramic filling material made of a plate-type corrugated flat structure in the form of a single or composite material, so that the plate A gas channel is formed between the plate and the plate) is located on one side of the second filtered gas outlet 312.

並於該至少一第二多孔元件322(其材質係為不鏽鋼、鈦、鉑或鋁,但不已此為限)之上表面設置一第二觸媒材料3221(係為二氧化鈦、氧化矽、氧化鋁或鉑,但不已此為限)。 And on the surface of the at least one second porous element 322 (its material is stainless steel, titanium, platinum or aluminum, but not limited to this), a second catalyst material 3221 (titanium dioxide, silicon oxide, oxide aluminum or platinum, but not limited to).

再者,本實施例之該第二噴灑裝置33其設置於該水洗腔室31之內側,並位於該第二過濾件32之上方,該第二噴灑裝置33包含至少一第二噴頭331及一第二管路332,該第二管路332係一端連接該至少一第二噴頭331,另一端穿設該水洗腔室31並連通一水洗液體供應裝置34。 Furthermore, the second spraying device 33 of the present embodiment is arranged inside the water washing chamber 31 and above the second filter element 32. The second spraying device 33 includes at least one second spray head 331 and one The second pipeline 332 , one end of the second pipeline 332 is connected to the at least one second spray head 331 , and the other end passes through the washing chamber 31 and communicates with a washing liquid supply device 34 .

其中該至少一第二噴頭331係噴灑一第二液體W2(本實施例選用水,但不已此為限)於該第二過濾件32上,使該第二過濾件32呈現濕性狀態。 Wherein the at least one second spray head 331 sprays a second liquid W2 (water is used in this embodiment, but not limited thereto) on the second filter element 32 to make the second filter element 32 present a wet state.

並,請進一步參閱第1B圖,其係本創作之實施例之結構運作示意圖。首先,由晶圓清洗製程產生的一廢棄氣體A(該廢棄氣體A係包含該氨氣N及一有機物VOC,該氨氣N之濃度大於800ppm及該有機物VOC之濃度大於1000ppm)進入位於該第一過濾裝置20中之該酸洗腔室21(隨著第1B圖之大箭頭行進),並通過該第一過濾件22時,會透過該第一過濾件22之該第一液體W1(由該至少一第一噴頭23噴出所造成)來去除吸附該廢棄氣體A中之高濃度之該氨氣N(此時該第一過濾件22因該第一液體W1呈現酸性狀態),過濾掉該氨氣N之該廢棄氣體A接續經由該第一過濾出氣口211排出該酸洗腔室21,並進入該第二過濾裝置30。 And, please refer to Fig. 1B further, it is the structural operation diagram of the embodiment of this creation. First, a waste gas A (the waste gas A contains the ammonia N and an organic VOC, the concentration of the ammonia N is greater than 800ppm and the concentration of the organic VOC is greater than 1000ppm) generated by the wafer cleaning process enters the This pickling chamber 21 in a filtering device 20 (advance along with the big arrow of Fig. 1B), and when passing through this first filter element 22, can pass through this first liquid W1 of this first filter element 22 (by The at least one first spray head 23 sprays out) to remove the high concentration of ammonia N in the waste gas A (at this time, the first filter element 22 is in an acidic state due to the first liquid W1), and the ammonia gas N is filtered out. The waste gas A of ammonia gas N is then discharged from the pickling chamber 21 through the first filtered gas outlet 211 and enters the second filter device 30 .

後續,過濾掉該氨氣N之該廢棄氣體A經由該氣體連通道122進入該第二過濾裝置30之該水洗腔室31,並透過該第二過濾件32之該第二液體W2(由該至少一第二噴頭22噴灑)來去除吸附該有機物VOC後(此時該第二過濾件32因該第二液體W2呈現濕性狀態),該廢棄氣體A(已去除高濃度之該氨氣N及該有機物VOC)經由該第二過濾出氣口312排出該水洗腔室31,並接續排出洗滌裝置10。 Subsequently, the waste gas A that has filtered out the ammonia gas N enters the water washing chamber 31 of the second filter device 30 through the gas connection channel 122, and passes through the second liquid W2 of the second filter element 32 (by the After at least one second spray nozzle 22 sprays) removes and adsorbs this organic matter VOC (at this moment, this second filter element 32 presents wet state because of this second liquid W2), this waste gas A (removed this ammonia gas N of high concentration and the organic matter VOC) are discharged from the water washing chamber 31 through the second filter air outlet 312, and then discharged from the washing device 10.

再者,本實施例之該第一液體W1先經由一酸洗液體供應裝置28透過一液體供應管路282進入該液體切換閥233後,再透過該第一管路232進入該酸洗腔室21,並通過該至少一第一噴頭23噴灑於該第一過濾件22(呈現酸性狀態),並吸附排除該廢棄氣體A中之該氨氣N後,該第一液體W1會排出該酸洗腔室21並流入該循環管路24,再接續透過該液體切換閥233轉換至該第一管路232進入該酸洗腔室21,以此達到酸性循環的模式。 Moreover, the first liquid W1 of this embodiment first enters the liquid switching valve 233 through a pickling liquid supply device 28 through a liquid supply pipeline 282, and then enters the pickling chamber through the first pipeline 232. 21, and spray on the first filter element 22 (in an acidic state) through the at least one first spray head 23, and after absorbing and removing the ammonia gas N in the waste gas A, the first liquid W1 will be discharged from the pickling The chamber 21 flows into the circulation pipeline 24 , and then switches to the first pipeline 232 to enter the pickling chamber 21 through the liquid switching valve 233 , so as to achieve an acid circulation mode.

而,本實施例之該第二液體W2先經由該水洗液體供應裝置34透過該第二管路332進入該水洗腔室31,並通過該至少一第二噴頭331噴灑於該第二過濾件32(呈現濕性狀態),並吸附排除該廢棄氣體A中之該有機物VOC後,該第二液體W2透過一排水裝置35(係設置於該水洗腔室31之下方,用以排出該第二液體W2)排出該水洗腔室31,不再進行循環。 However, the second liquid W2 of this embodiment first enters the water washing chamber 31 through the water washing liquid supply device 34 through the second pipeline 332, and is sprayed on the second filter element 32 through the at least one second spray head 331. (showing a wet state), and after absorbing and removing the organic matter VOC in the waste gas A, the second liquid W2 passes through a drainage device 35 (which is arranged below the water washing chamber 31 to discharge the second liquid W2) Evacuate the water washing chamber 31 and no longer circulate.

又,請參閱第2圖,其係本創作之離子吸附元件之結構放大示意圖,如第2圖所示,本實施例以該第二過濾件32做為範例(其本創作之該第一過濾件22之結構配置及運作模式亦相同於該第二過濾件32,故不在此贅述),該至少一第二離子吸附元件323之間形成複數個氣體通道,且該些個氣體通道(相互具有一間距P,該間距P係為3mm至30mm之間)採取斜向配置外,亦採連續轉彎方向,向左或向右傾斜,如此對於已溶解後再次逸散之該廢棄氣體A可達再次補集之功效,可有效提高汙染物質去除率,減少二次逸散之機率。且,該間距P之設置還可防止氣體壓損過大的問題產生。 Also, please refer to Fig. 2, which is an enlarged schematic diagram of the structure of the ion adsorption element of the present creation, as shown in Fig. 2, the present embodiment takes the second filter element 32 as an example (the first filter of the present creation) The structural configuration and mode of operation of the element 22 are also the same as the second filter element 32, so it will not be described in detail here), a plurality of gas channels are formed between the at least one second ion adsorption element 323, and these gas channels (with mutual A distance P, the distance P is between 3mm and 30mm) adopts an oblique configuration, and also adopts a continuous turning direction, tilting to the left or right, so that the waste gas A that has been dissolved and escaped again can reach another The effect of replenishment can effectively improve the removal rate of pollutants and reduce the probability of secondary escape. Moreover, the setting of the distance P can also prevent the problem of excessive gas pressure loss.

再者,如第2圖所示,本實施例中將該至少一第二離子吸附元件323設計為該些個氣體通道之形式,使該第二液體W2可由上往下順著該至少一第二離子吸附元件323表面往下流,與該廢棄氣體A之方向相反,且角度可相衝突,可使該廢棄氣體A中之汙染物更容易被該第二液體W2所吸附,更可確保已溶解於吸收該第二液體W2之有機污染物不易再次被釋出於空氣中,以達高效率去除之功效。 Furthermore, as shown in Figure 2, in this embodiment, the at least one second ion adsorption element 323 is designed in the form of these gas channels, so that the second liquid W2 can flow along the at least one first ion from top to bottom. The surface of the two ion adsorption elements 323 flows downwards, opposite to the direction of the waste gas A, and the angles can conflict, so that the pollutants in the waste gas A can be more easily adsorbed by the second liquid W2, and can be guaranteed to be dissolved The organic pollutants absorbed in the second liquid W2 are not easy to be released into the air again, so as to achieve the effect of high efficiency removal.

更進一步,該些個氣體通道與該至少一第二多孔元件322形成一角度θ,該角度θ係介於30°至90°之間,可使該廢棄氣體A在通過該些個氣 體通道時,更易直接衝擊吸收該第二液體W2,從而被該第二液體W2所吸收。 Furthermore, the gas passages and the at least one second porous element 322 form an angle θ, the angle θ is between 30° and 90°, so that the waste gas A can pass through the gas passages. When the body channel is used, it is easier to directly impact and absorb the second liquid W2, thereby being absorbed by the second liquid W2.

又,為維持其去除率,請進一步參閱第3A圖,其係本創作之酸鹼監測模式之訊號傳輸示意圖。如第3A圖所示,本創作之去除氨氣及有機物之洗滌裝置1之該第一過濾裝置20係進一步包含一監控模組25(係一種酸鹼值控製器,如微電腦酸鹼度分析儀,用於監控pH值)、一酸鹼檢測儀26(係一種工業用酸鹼度三合一電極酸鹼pH計,用於量測該第一液體W1加入時之酸鹼值)、一排酸控制裝置27(係一種氣動閥件,可以控制開關,並藉由氣動閥件的開關時間(如計時元件271)來控制該第一液體W1的量)及該酸洗液體供應裝置28(係用泵供應該第一液體W1進入該洗滌裝置1之該第一過濾裝置20)。 Also, in order to maintain the removal rate, please refer to Figure 3A, which is a schematic diagram of signal transmission in the acid-base monitoring mode of this creation. As shown in Fig. 3A, the first filtering device 20 of the washing device 1 for removing ammonia gas and organic matter of the present invention further includes a monitoring module 25 (a kind of pH value controller, such as a microcomputer pH analyzer, used for monitoring the pH value), an acid-base detector 26 (an industrial acid-base three-in-one electrode acid-base pH meter, used to measure the pH value when the first liquid W1 is added), an acid-discharging control device 27 (it is a kind of pneumatic valve, which can control the switch, and the amount of the first liquid W1 is controlled by the switching time of the pneumatic valve (such as timing element 271)) and the pickling liquid supply device 28 (uses the pump to supply the The first liquid W1 enters the first filter device 20 of the washing device 1 ).

其中該監控模組25及該酸鹼檢測儀26皆設置於該酸洗腔室21之內側,並位於該第一過濾件22之下方,該監控模組25進一步包含:一第一傳輸元件251(其係設置於該監控模組25之內),而該酸鹼檢測儀26係電性連接該監控模組25,並用於檢測通過該第一過濾件22之該第一液體W1之酸鹼值。 Wherein the monitoring module 25 and the acid-base detector 26 are all arranged inside the pickling chamber 21 and below the first filter 22, the monitoring module 25 further includes: a first transmission element 251 (it is installed in the monitoring module 25), and the acid-base detector 26 is electrically connected to the monitoring module 25, and is used to detect the acid-base of the first liquid W1 passing through the first filter element 22 value.

而該排酸控制裝置27(包含一計時元件271及一第二傳輸元件272)設置於該酸洗腔室21之外側,係電性連接該監控模組25。而該酸洗液體供應裝置28(設置於該洗滌裝置1之外側,並包含一第三傳輸元件281),其係電性連接該排酸控制裝置27。 The acid discharge control device 27 (including a timing element 271 and a second transmission element 272 ) is disposed outside the pickling chamber 21 and is electrically connected to the monitoring module 25 . The pickling liquid supply device 28 (disposed outside the washing device 1 and including a third transmission element 281 ) is electrically connected to the acid discharge control device 27 .

酸鹼監測模式:當該酸鹼檢測儀26檢測該第一液體W1之酸鹼值大於5時,該酸鹼檢測儀26會傳送一警示訊息通知該監控模組25,該監控模組25傳送一排除訊息S1至該排酸控制裝置27,在該排酸控制裝置27排除該酸洗腔室21之該第一液體W1時,該排酸控制裝置27會傳送一補充訊息S2至該酸洗液體供應裝置28,該酸洗液體供應裝置28補充該第一液體W1至該液體供應管路282(其一端連通該液體切換閥233,另一端連通該酸洗液體供應裝置28),並透過該液體切換閥233提供該第一液體W1至該第一管路232,以便維持該第一過濾裝置20內部之該第一液體W1之酸鹼值小於5。 Acid-base monitoring mode: when the acid-base detector 26 detects that the pH value of the first liquid W1 is greater than 5, the acid-base detector 26 will send a warning message to notify the monitoring module 25, and the monitoring module 25 will send A discharge message S1 to the acid discharge control device 27, when the acid discharge control device 27 discharges the first liquid W1 of the pickling chamber 21, the acid discharge control device 27 will send a supplementary message S2 to the pickling chamber The liquid supply device 28, the pickling liquid supply device 28 supplements the first liquid W1 to the liquid supply pipeline 282 (one end of which communicates with the liquid switching valve 233, and the other end communicates with the pickling liquid supply device 28), and through the The liquid switching valve 233 provides the first liquid W1 to the first pipeline 232 so as to maintain the pH value of the first liquid W1 inside the first filter device 20 to be less than 5.

藉由上述模式,可以由該酸鹼檢測儀26來控制該第一液體W1之添加量來維持該酸洗腔室21內的pH值,也可以針對不同濃度之該氨氣N來直接調整該第一液體W1之添加量。 With the above-mentioned mode, the addition amount of the first liquid W1 can be controlled by the acid-base detector 26 to maintain the pH value in the pickling chamber 21, and the ammonia gas N can be directly adjusted for different concentrations. Addition amount of the first liquid W1.

又,除了酸鹼監測模式外,亦會對酸性循環模式進行時間監控。請進一步參閱第3B圖,其係本創作之定時監測模式之訊號傳輸示意圖。如第3B圖所示,定時監測模式:當該計時元件271到達一預定時間值(本實施例較佳為4-8小時,可依據使用者之需求進行調整)時,該排酸控制裝置27將自動排除該酸洗腔室21之該第一液體W1,且該排酸控制裝置27傳送該補充訊息S2至該酸洗液體供應裝置28,該酸洗液體供應裝置28補充該第一液體W1至該液體供應管路282,並透過該液體切換閥233提供該第一液體W1至該第一管路232,以便維持該第一過濾裝置20內部之該第一液體W1之酸鹼值。 Also, in addition to the acid-base monitoring mode, time monitoring will also be performed on the acid cycle mode. Please refer to Figure 3B further, which is a schematic diagram of signal transmission in the timing monitoring mode of this creation. As shown in Figure 3B, timing monitoring mode: when the timing element 271 reaches a predetermined time value (preferably 4-8 hours in this embodiment, which can be adjusted according to the needs of the user), the acid discharge control device 27 The first liquid W1 of the pickling chamber 21 will be automatically removed, and the acid discharge control device 27 sends the replenishment message S2 to the pickling liquid supply device 28, and the pickling liquid supply device 28 replenishes the first liquid W1 to the liquid supply pipeline 282 , and provide the first liquid W1 to the first pipeline 232 through the liquid switching valve 233 , so as to maintain the pH value of the first liquid W1 inside the first filter device 20 .

接續,請參閱下表,其係本實施例之實驗結果表。 Next, please refer to the following table, which is the experimental result table of this embodiment.

Figure 111210865-A0305-02-0014-2
Figure 111210865-A0305-02-0014-2

根據行政院環保署公布的「半導體製造業空氣污染管制及排放標準中」中第4條提及「半導體製造業產生之空氣污染物應由密閉排氣系統導入污染防制設備,並處理至符合下表規定後始得排放。」而其表中提及了揮發性有機物 之排放標準為:排放削減率應大於90%或工廠總排放量應小於0.6kg/hr(以甲烷為計算基準)。 According to Article 4 of the "Semiconductor Manufacturing Air Pollution Control and Emission Standards" issued by the Environmental Protection Agency of the Executive Yuan, it is mentioned that "the air pollutants generated by the semiconductor manufacturing industry should be introduced into the pollution prevention equipment through a closed exhaust system and treated to meet the requirements Emissions shall not be allowed until the following table is specified." and the table mentions VOCs The emission standard is: the emission reduction rate should be greater than 90% or the total emission of the factory should be less than 0.6kg/hr (based on methane).

然由,由上表可知,對照組皆使用水來進行沖洗模式,並未使用酸性液體,也未將酸性液體進行循環模式。其結果可知,IPA(為有機物之異丙醇)需要加大(由10LPM變為16LPM)其供水量(LPM,升/分鐘)才能使去除率達到90%以上,如此便會浪費其水資源。 However, it can be seen from the above table that the control group used water for flushing mode, did not use acidic liquid, and did not use acidic liquid for circulation mode. As a result, it can be seen that IPA (isopropanol which is organic matter) needs to increase (from 10LPM to 16LPM) its water supply (LPM, liter/minute) to make the removal rate reach more than 90%, so it will waste its water resources.

而相比於本實施例之實驗組(除水沖洗外,使用酸性液體進行循環模式,其pH值分別為2.8、2.9),本實施例僅需使用10LPM便可以將IPA(異丙醇)去除率達到90%以上。 Compared with the experimental group in this example (in addition to water washing, acidic liquid is used for circulation mode, and its pH values are 2.8 and 2.9 respectively), this example only needs to use 10LPM to remove IPA (isopropanol) The rate reached more than 90%.

接續,根據行政院環保署公布的「固定污染源有害空氣污染物排放標準」中之附表二,其氨氣的容許濃度為小於50ppm。 Next, according to Schedule 2 of the "Emission Standards for Hazardous Air Pollutants from Stationary Pollution Sources" published by the Environmental Protection Agency of the Executive Yuan, the allowable concentration of ammonia gas is less than 50ppm.

但由上表可知,對照組使用水來進行沖洗模式,不論其供水量如何增加,將無法將NH3(氨氣)的去除率達到95%以上(皆未小於50ppm),顯示其對照組不僅浪費水資源外,也無法提高NH3(氨氣)的去除率達到95%以上。而相比於本實施例之實驗組(除水沖洗外,使用酸性液體進行循環模式,其pH值分別為2.8、2.9),本實施例因為使用了酸性循環模式,便僅需使用10LPM便可以將NH3(氨氣)去除率達到99%以上(NH3(氨氣)之濃度小於50ppm)。 However, it can be seen from the above table that the control group uses water for flushing mode, no matter how the water supply increases, the removal rate of NH 3 (ammonia gas) will not be able to reach more than 95% (none is less than 50ppm), showing that the control group is not only In addition to wasting water resources, it is impossible to increase the removal rate of NH 3 (ammonia) to more than 95%. Compared with the experimental group in this example (in addition to water washing, acidic liquid is used for circulation mode, and the pH values are 2.8 and 2.9 respectively), this example only needs to use 10 LPM because of the use of acid circulation mode. The removal rate of NH 3 (ammonia) is over 99% (the concentration of NH 3 (ammonia) is less than 50ppm).

由上述實驗可知,本創作將酸性循環模式搭配水沖洗模式的洗滌裝置,不僅在減省用水量的同時,還能將IPA(異丙醇)去除率達到90%以上外,也可以同步將NH3(氨氣)去除率達到99%以上。 From the above experiments, it can be known that this creation combines the acid circulation mode with the water flushing mode washing device, which not only saves water consumption, but also can remove IPA (isopropanol) to more than 90%, and can also simultaneously remove NH 3 (Ammonia) removal rate reaches over 99%.

故本創作實為一具有新穎性、進步性及可供產業上利用者,應符合我國專利法專利申請要件無疑,爰依法提出新型專利申請,祈 鈞局早日賜准專利,至感為禱。 Therefore, this creation is indeed novel, progressive and can be used in industry. It should meet the patent application requirements of our country's patent law.

惟以上所述者,僅為本創作之較佳實施例而已,並非用來限定本創作實施之範圍,舉凡依本創作申請專利範圍所述之形狀、構造、特徵及精神所為之均等變化與修飾,均應包括於本創作之申請專利範圍內。 However, the above is only a preferred embodiment of this creation, and it is not used to limit the scope of implementation of this creation. For example, all equal changes and modifications are made according to the shape, structure, characteristics and spirit described in the patent scope of this creation. , should be included in the scope of the patent application for this creation.

1:洗滌裝置 1: washing device

10:腔體 10: Cavity

12:進氣口 12: air inlet

121:進氣連通道 121: Intake connecting channel

122:氣體連通道 122: gas connecting channel

14:出氣口 14: Air outlet

20:第一過濾裝置 20: The first filter device

21:酸洗腔室 21: pickling chamber

211:第一過濾進氣口 211: The first filter air inlet

212:第一過濾出氣口 212: The first filter air outlet

22:第一過濾件 22: The first filter

221:第一殼體 221: The first shell

222:第一多孔元件 222: first porous element

2221:第一觸媒材料 2221: The first catalyst material

223:第一離子吸附元件 223: The first ion adsorption element

23:第一噴灑裝置 23: The first sprinkler

231:第一噴頭 231: The first nozzle

232:第一管路 232: The first pipeline

233:液體切換閥 233: liquid switching valve

24:循環管路 24:Circulation pipeline

25:監控模組 25:Monitoring module

26:酸鹼檢測儀 26: Acid-base detector

27:排酸控制裝置 27: Acid discharge control device

271:計時元件 271: timing element

28:酸洗液體供應裝置 28: Pickling liquid supply device

282:液體供應管路 282: Liquid supply line

30:第二過濾裝置 30: Second filter device

31:水洗腔室 31: washing chamber

311:第二過濾進氣口 311: Second filter air inlet

312:第二過濾出氣口 312: Second filter air outlet

32:第二過濾件 32: Second filter element

321:第二殼體 321: second shell

322:第二多孔元件 322: second porous element

3221:第二觸媒材料 3221: Second catalyst material

323:第二離子吸附元件 323: The second ion adsorption element

33:第二噴灑裝置 33: Second sprinkler

331:第二噴頭 331: Second nozzle

332:第二管路 332: Second pipeline

34:水洗液體供應裝置 34: Washing liquid supply device

35:排水裝置 35: Drainage device

W1:第一液體 W1: first liquid

W2:第二液體 W2: second liquid

Claims (11)

一種去除氨氣及有機物之洗滌裝置,其係設置於一腔體內,該腔體兩側分別設有一進氣口及一出氣口,其結構包含:一第一過濾裝置,其係設置於該腔體內,並位於該進氣口之一側,該第一過濾裝置係包含;以及一酸洗腔室,該酸洗腔室之兩側分別設置一第一過濾進氣口以及一第一過濾出氣口,該進氣口係透過一進氣連通道連通該第一過濾進氣口;一第一過濾件,其設置於該酸洗腔室之內側,並位於該第一過濾進氣口之上方;一第一噴灑裝置,其設置於該酸洗腔室之內側,並位於該第一過濾件之上方,該第一噴灑裝置包含至少一第一噴頭及一第一管路,該第一管路係一端連接該至少一第一噴頭,另一端穿設該酸洗腔室並連通一液體切換閥;以及一循環管路,其位於該酸洗腔室之下方並穿設該酸洗腔室,其一端連通該液體切換閥,該循環管路係用以運輸一第一液體經由該液體切換閥進入該第一管路,使該第一噴灑裝置於該第一過濾件上噴灑該第一液體,該第一液體係酸性液體;一第二過濾裝置,其係設置於該腔體內,並位於該出氣口之一側,該第二過濾裝置係包含;一水洗腔室,該水洗腔室之兩側分別設置一第二過濾進氣口以及一第二過濾出氣口,該第一過濾出氣口係經由一氣體 連通道連通該第二過濾進氣口,該第二過濾出氣口係連通該出氣口;一第二過濾件,其設置於該水洗腔室之內側,並位於該第二過濾進氣口之上方;以及一第二噴灑裝置,其設置於該水洗腔室之內側,並位於該第二過濾件之上方,該第二噴灑裝置包含至少一第二噴頭及一第二管路,該第二管路係一端連接該至少一第二噴頭,另一端穿設該水洗腔室並連通一水洗液體供應裝置;其中,一廢棄氣體進入該酸洗腔室,該廢棄氣體係包含一氨氣及一有機物,當該廢棄氣體通過該第一過濾件後去除該氨氣,並經由該第一過濾出氣口排出該酸洗腔室,後續經由該氣體連通道進入該水洗腔室,並通過該第二過濾件去除該有機物後,該廢棄氣體經由該第二過濾出氣口排出該水洗腔室,再者,該第一液體經由該第一管路進入該酸洗腔室,並通過該至少一第一噴頭噴灑於經過該第一過濾件之該廢棄氣體後,該第一液體排出該酸洗腔室並流入該循環管路,且一第二液體經由該第二管路進入該水洗腔室,並通過該至少一第二噴頭噴灑於經過該第二過濾件之該廢棄氣體後,該第二液體排出該水洗腔室。 A washing device for removing ammonia gas and organic matter, which is installed in a cavity, and the two sides of the cavity are respectively provided with an air inlet and an air outlet, and its structure includes: a first filter device, which is installed in the cavity Inside the body, and located on one side of the air inlet, the first filtering device includes; Gas port, the air inlet communicates with the first filter air inlet through an air inlet connection channel; a first filter element, which is arranged inside the pickling chamber and above the first filter air inlet ; a first spraying device, which is arranged inside the pickling chamber and above the first filter element, the first spraying device includes at least one first spray head and a first pipeline, the first pipe One end of the pipeline is connected to the at least one first spray head, the other end passes through the pickling chamber and communicates with a liquid switching valve; and a circulation pipeline, which is located under the pickling chamber and passes through the pickling chamber , one end of which communicates with the liquid switching valve, the circulation pipeline is used to transport a first liquid through the liquid switching valve into the first pipeline, so that the first spraying device sprays the first liquid on the first filter element Liquid, the first liquid is an acidic liquid; a second filter device is arranged in the cavity and is located on one side of the gas outlet, and the second filter device includes; a water washing chamber, the water washing chamber A second filtered air inlet and a second filtered air outlet are respectively provided on both sides, and the first filtered air outlet is passed through a gas The connecting channel communicates with the second filter air inlet, and the second filter air outlet communicates with the air outlet; a second filter element is arranged inside the washing chamber and above the second filter air inlet and a second spraying device, which is arranged on the inside of the washing chamber and above the second filter element, the second spraying device includes at least one second spray head and a second pipeline, the second pipe One end of the path is connected to the at least one second spray head, and the other end passes through the washing chamber and communicates with a washing liquid supply device; wherein, a waste gas enters the pickling chamber, and the waste gas system includes an ammonia gas and an organic matter , when the waste gas passes through the first filter element, the ammonia gas is removed, and it is discharged from the pickling chamber through the first filter gas outlet, and then enters the water washing chamber through the gas connection channel, and passes through the second filter After removing the organic matter, the waste gas is discharged from the washing chamber through the second filtered gas outlet, and the first liquid enters the pickling chamber through the first pipeline and passes through the at least one first spray head After being sprayed on the waste gas passing through the first filter element, the first liquid is discharged from the pickling chamber and flows into the circulation pipeline, and a second liquid enters the water washing chamber through the second pipeline, and passes through the After the at least one second spray head sprays the waste gas passing through the second filter element, the second liquid is discharged from the washing chamber. 如請求項1所述之去除氨氣及有機物之洗滌裝置,其中該第一過濾裝置係進一步包含一監控模組及一酸鹼檢測儀,其設置於該酸洗腔室之內側,並位於該第一過濾件之下方,該監控模組包含:一第一傳輸元件,其係設置於該監控模組之內,該酸鹼檢測儀係 電性連接該監控模組,設置於該酸洗腔室之內側,並用於檢測通過該第一過濾件之該第一液體之酸鹼值。 The washing device for removing ammonia gas and organic matter as described in claim 1, wherein the first filter device further includes a monitoring module and an acid-base detector, which are arranged inside the pickling chamber and located in the Below the first filter element, the monitoring module includes: a first transmission element, which is arranged in the monitoring module, and the acid-base detector is Electrically connected to the monitoring module, set inside the pickling chamber, and used to detect the pH value of the first liquid passing through the first filter element. 如請求項2所述之去除氨氣及有機物之洗滌裝置,其中該第一過濾裝置係進一步包含:一排酸控制裝置,其設置於該酸洗腔室之外側,係電性連接該監控模組,並包含一第二傳輸元件及一計時元件;以及一酸洗液體供應裝置,其係電性連接該排酸控制裝置,並包含一第三傳輸元件;其中,當該酸鹼檢測儀檢測該第一液體之酸鹼值大於5時,該酸鹼檢測儀通知該監控模組,該監控模組傳送一排除訊息至該排酸控制裝置並排除該酸洗腔室之該第一液體,且該排酸控制裝置傳送一補充訊息至該酸洗液體供應裝置,該酸洗液體供應裝置補充該第一液體至一液體供應管路,該液體供應管路之一端連通該液體切換閥,另一端連通該酸洗液體供應裝置。 The washing device for removing ammonia gas and organic matter as described in claim 2, wherein the first filtering device further includes: an acid discharge control device, which is arranged outside the pickling chamber and is electrically connected to the monitoring module set, and includes a second transmission element and a timing element; and a pickling liquid supply device, which is electrically connected to the acid discharge control device, and includes a third transmission element; wherein, when the acid-base detector detects When the pH value of the first liquid is greater than 5, the acid-base detector notifies the monitoring module, and the monitoring module sends a removal message to the acid discharge control device and removes the first liquid in the pickling chamber, And the acid discharge control device sends a replenishment message to the pickling liquid supply device, the pickling liquid supply device replenishes the first liquid to a liquid supply pipeline, one end of the liquid supply pipeline is connected to the liquid switching valve, and the other One end communicates with the pickling liquid supply device. 如請求項3所述之去除氨氣及有機物之洗滌裝置,其中當該計時元件到達一預定時間值時,該排酸控制裝置自動排除該酸洗腔室之該第一液體,且該排酸控制裝置傳送該補充訊息至該酸洗液體供應裝置,該酸洗液體供應裝置補充該第一液體至該液體供應管路。 The washing device for removing ammonia gas and organic matter as described in claim 3, wherein when the timing element reaches a predetermined time value, the acid discharge control device automatically removes the first liquid in the pickling chamber, and the acid discharge The control device sends the replenishment message to the pickling liquid supply device, and the pickling liquid supply device replenishes the first liquid to the liquid supply pipeline. 如請求項2所述之去除氨氣及有機物之洗滌裝置,其中該第二過濾裝置係進一步包含:一排水裝置,其係設置於該水洗腔室之下方,該排水裝置係用以排出該第二液體。 The washing device for removing ammonia gas and organic matter as described in claim 2, wherein the second filtering device further includes: a drainage device, which is arranged below the washing chamber, and the drainage device is used to discharge the second filtering device Two liquids. 如請求項1所述之去除氨氣及有機物之洗滌裝置,其中該第一過濾件包含一第一殼體、至少一第一多孔元件及至少一第一離子吸附元件,該至少一第一多孔元件及該至少一第一離子吸附元件係依序堆疊設置於該第一殼體內,且該至少一第一多孔元件位於該第一過濾進氣口之一側,該至少一第一離子吸附元件位於該第一過濾出氣口之一側。 The washing device for removing ammonia gas and organic matter as described in claim 1, wherein the first filter element includes a first housing, at least one first porous element and at least one first ion adsorption element, and the at least one first The porous element and the at least one first ion adsorption element are sequentially stacked in the first casing, and the at least one first porous element is located on one side of the first filter air inlet, and the at least one first The ion adsorption element is located at one side of the first filtered air outlet. 如請求項6所述之去除氨氣及有機物之洗滌裝置,其中該至少一第一多孔元件上設置一第一觸媒材料。 The scrubbing device for removing ammonia gas and organic matter according to claim 6, wherein a first catalytic material is disposed on the at least one first porous element. 如請求項1所述之去除氨氣及有機物之洗滌裝置,其中該第二過濾件包含一第二殼體、至少一第二多孔元件及至少一第二離子吸附元件,該至少一第二多孔元件及該至少一第二離子吸附元件係依序堆疊設置於該第二殼體內,且該至少一第二多孔元件位於該第二過濾進氣口之一側,該至少一第二離子吸附元件位於該第二過濾出氣口之一側。 The washing device for removing ammonia gas and organic matter as described in claim 1, wherein the second filter element includes a second housing, at least one second porous element and at least one second ion adsorption element, and the at least one second The porous element and the at least one second ion adsorption element are sequentially stacked and arranged in the second casing, and the at least one second porous element is located on one side of the second filter inlet, and the at least one second The ion adsorption element is located at one side of the second filtered air outlet. 如請求項8所述之去除氨氣及有機物之洗滌裝置,其中該至少一第二多孔元件上設置一第二觸媒材料。 The scrubbing device for removing ammonia gas and organic matter as described in claim 8, wherein a second catalyst material is disposed on the at least one second porous element. 如請求項7所述之去除氨氣及有機物之洗滌裝置,其中該至少一第一多孔元件之材質係為不鏽鋼、鈦、鉑或鋁,進一步,該第一觸媒材料係為二氧化鈦、氧化矽、氧化鋁或鉑。 The cleaning device for removing ammonia gas and organic matter as described in claim 7, wherein the material of the at least one first porous element is stainless steel, titanium, platinum or aluminum, and further, the first catalyst material is titanium dioxide, oxide Silicon, alumina or platinum. 如請求項9所述之去除氨氣及有機物之洗滌裝置,其中該至少一第二多孔元件之材質係為不鏽鋼、鈦、鉑或鋁,進一步,該第二觸媒材料係為二氧化鈦、氧化矽、氧化鋁或鉑。 The washing device for removing ammonia and organic matter as described in claim 9, wherein the material of the at least one second porous element is stainless steel, titanium, platinum or aluminum, and further, the second catalyst material is titanium dioxide, oxide Silicon, alumina or platinum.
TW111210865U 2022-10-04 2022-10-04 Washing device for removing ammonia gas and organics TWM638862U (en)

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