KR970067588A - 반도체 제조용 레지스트 라미네이트 및 패턴 형성 방법 - Google Patents

반도체 제조용 레지스트 라미네이트 및 패턴 형성 방법 Download PDF

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Publication number
KR970067588A
KR970067588A KR1019970011279A KR19970011279A KR970067588A KR 970067588 A KR970067588 A KR 970067588A KR 1019970011279 A KR1019970011279 A KR 1019970011279A KR 19970011279 A KR19970011279 A KR 19970011279A KR 970067588 A KR970067588 A KR 970067588A
Authority
KR
South Korea
Prior art keywords
tertiary amyl
compound
resist
emitter
copolymer
Prior art date
Application number
KR1019970011279A
Other languages
English (en)
Korean (ko)
Inventor
노부까즈 다까하시
노부노리 아베
아끼라 오이까와
수이찌 미야따
Original Assignee
나까노 가쓰히꼬
니뽄 제온 가부시끼가이샤
세끼자와 다다시
후지쓰 가부시끼가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 나까노 가쓰히꼬, 니뽄 제온 가부시끼가이샤, 세끼자와 다다시, 후지쓰 가부시끼가이샤 filed Critical 나까노 가쓰히꼬
Publication of KR970067588A publication Critical patent/KR970067588A/ko

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0381—Macromolecular compounds which are rendered insoluble or differentially wettable using a combination of a phenolic resin and a polyoxyethylene resin

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  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1019970011279A 1996-03-29 1997-03-28 반도체 제조용 레지스트 라미네이트 및 패턴 형성 방법 KR970067588A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP8077274A JPH09269597A (ja) 1996-03-29 1996-03-29 半導体製造用レジスト積層体およびパターン形成方法
JP96-77274 1996-03-29

Publications (1)

Publication Number Publication Date
KR970067588A true KR970067588A (ko) 1997-10-13

Family

ID=13629288

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019970011279A KR970067588A (ko) 1996-03-29 1997-03-28 반도체 제조용 레지스트 라미네이트 및 패턴 형성 방법

Country Status (2)

Country Link
JP (1) JPH09269597A (ja)
KR (1) KR970067588A (ja)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR19990055188A (ko) * 1997-12-27 1999-07-15 김영환 감광막 패턴 형성을 위한 반사방지막

Also Published As

Publication number Publication date
JPH09269597A (ja) 1997-10-14

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Legal Events

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WITN Withdrawal due to no request for examination