KR970063534A - Spin dryers for semiconductor wafers - Google Patents

Spin dryers for semiconductor wafers Download PDF

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Publication number
KR970063534A
KR970063534A KR1019960004418A KR19960004418A KR970063534A KR 970063534 A KR970063534 A KR 970063534A KR 1019960004418 A KR1019960004418 A KR 1019960004418A KR 19960004418 A KR19960004418 A KR 19960004418A KR 970063534 A KR970063534 A KR 970063534A
Authority
KR
South Korea
Prior art keywords
chamber
spin dryer
semiconductor wafer
cradle
spin
Prior art date
Application number
KR1019960004418A
Other languages
Korean (ko)
Inventor
박종배
Original Assignee
김광호
삼성전자 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 김광호, 삼성전자 주식회사 filed Critical 김광호
Priority to KR1019960004418A priority Critical patent/KR970063534A/en
Publication of KR970063534A publication Critical patent/KR970063534A/en

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  • Cleaning Or Drying Semiconductors (AREA)
  • Drying Of Solid Materials (AREA)

Abstract

반도체 웨이퍼의 스핀 드라이어에 대하여 기재하고 있다. 이는, 스핀 드라이버 챔버; 상기 스핀 드라이어 챔버 내부에 설치되고, 웨이퍼가 수납된 캐리어가 장착되어 있는 크래들; 상기 크래들8을 회전시키는 회전축; 상기 크래들을 업/다운시키기 위한 푸셔; 및 상기 푸셔의 앞부분에 장착된 롤러를 구비하는 반도체 웨이퍼 스핀 드라이어에 있어서, 챔버 클리닝을 위하여 물을 포함한 약액을 분사할 수 있도록, 상기 챔버 내벽에 설치된 다수개의 노즐을 구비하는 것을 특징으로 한다. 따라서, 스핀 드라이어의 기능을 극대화하여 생산성을 향상시킬 수있다.A spin dryer for a semiconductor wafer is described. This includes a spin driver chamber; A cradle installed in the spin dryer chamber and having a carrier loaded with a wafer; A rotating shaft for rotating the cradle 8; A pusher for up / down the cradle; And a roller mounted on a front portion of the pusher. The semiconductor wafer spin dryer includes a plurality of nozzles provided on an inner wall of the chamber so as to inject a chemical liquid containing water for cleaning the chamber. Therefore, the productivity of the spin dryer can be improved by maximizing the function of the spin dryer.

Description

반도체 웨이퍼의 스핀 드라이어Spin dryers for semiconductor wafers

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is a trivial issue, I did not include the contents of the text.

제2도는 본 발명의 일 실시예에 따른 스핀 드라이어를 개략적으로 나태낸 도면이다.FIG. 2 is a schematic view of a spin dryer according to an embodiment of the present invention.

Claims (4)

스핀 드라이버 챔버; 상기 스핀 드라이어 챔버 내부에 설치되고, 웨이퍼가 수납된 캐리어가 장착되어 있는 크래들; 상기 크래들을 회전시키는 회전축; 상기 크래들을 업/다운시키기 위한 푸셔; 및 상기 푸셔의 앞부분에 장착된 롤러를 구비하는 반도체 웨이퍼 스핀 드라이어에 있어서, 챔버 클리닝을 위하여 물을 포함한 약액을 분사할 수 있도록, 상기 챔버 내벽에 설치된 다수개의 노즐을 구비하는 것을 특징으로 하는 반도체 웨이퍼 스핀 드라이어.Spin driver chamber; A cradle installed in the spin dryer chamber and having a carrier loaded with a wafer; A rotating shaft for rotating the cradle; A pusher for up / down the cradle; And a roller mounted on a front portion of the pusher. The semiconductor wafer spin dryer includes a plurality of nozzles provided on an inner wall of the chamber so as to inject a chemical liquid containing water for cleaning the chamber. Spin dryers. 제1항에 있어서, 상기 노즐은 이소 프로필 알콜(IPA)를 분사하기 위한 순수(DI water)를 분사하기 위한 노즐로 구성된 것을 특징으로 하는 반도체 웨이퍼 스핀 드라이어.The semiconductor wafer spin dryer of claim 1, wherein the nozzle comprises a nozzle for spraying DI water for spraying isopropyl alcohol (IPA). 제2항에 있어서, 상기 이소 프로필용 노즐과 순수용 노즐이 교번하여 배치된 것을 특징으로 하는 반도체 웨이퍼 스핀 드라이어.3. The semiconductor wafer spin dryer as claimed in claim 2, wherein the isopropyl nozzle and the pure water nozzle are alternately arranged. 제1항에 있어서, 상기 롤러는 테플론 및 합성고무 소재 중 어느 하나의 재질로 만들어진 것을 특징으로 하는 반도체 웨이퍼 스핀 드라이어.2. The semiconductor wafer spin dryer as claimed in claim 1, wherein the roller is made of one of Teflon and synthetic rubber. ※ 참고사항 : 최초 출원 내용에 의하여 공개하는 것임.※ Note: It is disclosed by the contents of the first application.
KR1019960004418A 1996-02-24 1996-02-24 Spin dryers for semiconductor wafers KR970063534A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1019960004418A KR970063534A (en) 1996-02-24 1996-02-24 Spin dryers for semiconductor wafers

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019960004418A KR970063534A (en) 1996-02-24 1996-02-24 Spin dryers for semiconductor wafers

Publications (1)

Publication Number Publication Date
KR970063534A true KR970063534A (en) 1997-09-12

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Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019960004418A KR970063534A (en) 1996-02-24 1996-02-24 Spin dryers for semiconductor wafers

Country Status (1)

Country Link
KR (1) KR970063534A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100701997B1 (en) * 2000-11-27 2007-03-30 삼성전자주식회사 Spin dryer

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100701997B1 (en) * 2000-11-27 2007-03-30 삼성전자주식회사 Spin dryer

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