JPS5585026A - Cleaning device - Google Patents

Cleaning device

Info

Publication number
JPS5585026A
JPS5585026A JP15749378A JP15749378A JPS5585026A JP S5585026 A JPS5585026 A JP S5585026A JP 15749378 A JP15749378 A JP 15749378A JP 15749378 A JP15749378 A JP 15749378A JP S5585026 A JPS5585026 A JP S5585026A
Authority
JP
Japan
Prior art keywords
unit
frame
pure water
air blowing
temperature air
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP15749378A
Other languages
Japanese (ja)
Inventor
Kunihiro Tsubosaki
Yutaka Iwata
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP15749378A priority Critical patent/JPS5585026A/en
Publication of JPS5585026A publication Critical patent/JPS5585026A/en
Pending legal-status Critical Current

Links

Landscapes

  • Cleaning By Liquid Or Steam (AREA)
  • Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
  • Cleaning Or Drying Semiconductors (AREA)

Abstract

PURPOSE: To eliminate the organic and inorganic contaminations of a semiconductor device by constructing a cleaning device for cleaning the semiconductor before it is sealed the cleaning device comprising an organic solvent cleaning unit, a pure water cleaning unit, a normal temperature air blowing unit and a high temperature air blowing drying unit.
CONSTITUTION: A completely assembled lead frame is supplied to a frame loader 1, and sequentially fed along a frame guide to right side. The lead frame is first fed into a chlorofluoromethane spray unit 2, sprayed with the chlorofluoromethane liquid elevationally from a spray nozzle 9, and blown from the liquid through a normal temperature air blowing unit 3. Then, after the frame is washed with pure water at a pure water cleaning unit 4, it is fed to normal temperature air blowing units 5 and 6 to remove pure water adhered to the lead frame therefrom. Finally, the element, lead frame are completely dried at a hot air blower 14, and then contained in a frame unloader 8.
COPYRIGHT: (C)1980,JPO&Japio
JP15749378A 1978-12-22 1978-12-22 Cleaning device Pending JPS5585026A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15749378A JPS5585026A (en) 1978-12-22 1978-12-22 Cleaning device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15749378A JPS5585026A (en) 1978-12-22 1978-12-22 Cleaning device

Publications (1)

Publication Number Publication Date
JPS5585026A true JPS5585026A (en) 1980-06-26

Family

ID=15650885

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15749378A Pending JPS5585026A (en) 1978-12-22 1978-12-22 Cleaning device

Country Status (1)

Country Link
JP (1) JPS5585026A (en)

Cited By (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58135643A (en) * 1982-02-08 1983-08-12 Nippon Telegr & Teleph Corp <Ntt> Wafer cleaner
JPS5931241U (en) * 1982-08-23 1984-02-27 スピ−ドフアム株式会社 drying equipment
JPS59166885U (en) * 1983-04-25 1984-11-08 宮崎　三郎 cleaning equipment
JPS6159837A (en) * 1984-08-31 1986-03-27 Toshiba Ceramics Co Ltd Continuous washing device of wafer
JPH04126578A (en) * 1990-09-18 1992-04-27 Japan Field Kk Cleaning method and apparatus for cleaning object using nonaqueous flammable solvent
EP0490501A2 (en) * 1990-12-11 1992-06-17 Imperial Chemical Industries Plc Cleaning of articles
JPH062182A (en) * 1992-04-20 1994-01-11 Mitsubishi Kasei Corp Oil deposition washing method, washing device and detergent
JPH0612468U (en) * 1992-02-20 1994-02-18 株式会社精工舎 Washing / drying device
JPH06256984A (en) * 1993-12-21 1994-09-13 Mitsubishi Kasei Corp Washing device for object stained with oil
JPH06256983A (en) * 1993-12-16 1994-09-13 Mitsubishi Kasei Corp Washing device for object stained with oil
JPH0686336U (en) * 1993-05-21 1994-12-13 住友精密工業株式会社 Carrier cleaning equipment
JPH073481A (en) * 1993-12-21 1995-01-06 Mitsubishi Chem Corp Equipment for cleaning greasy parts
JPH078870A (en) * 1993-06-29 1995-01-13 Koi Seisakusho:Kk Method and device for washing and drying hydrocarbon washing liquid
JPH07100444A (en) * 1993-10-06 1995-04-18 Hitachi Zosen Corp Method and device for cleaning

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5389671A (en) * 1977-01-19 1978-08-07 Hitachi Ltd Continuous treating apparatus

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5389671A (en) * 1977-01-19 1978-08-07 Hitachi Ltd Continuous treating apparatus

Cited By (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58135643A (en) * 1982-02-08 1983-08-12 Nippon Telegr & Teleph Corp <Ntt> Wafer cleaner
JPH045264B2 (en) * 1982-02-08 1992-01-30
JPS5931241U (en) * 1982-08-23 1984-02-27 スピ−ドフアム株式会社 drying equipment
JPS6242534Y2 (en) * 1982-08-23 1987-10-31
JPS59166885U (en) * 1983-04-25 1984-11-08 宮崎　三郎 cleaning equipment
JPS6159837A (en) * 1984-08-31 1986-03-27 Toshiba Ceramics Co Ltd Continuous washing device of wafer
JPH04126578A (en) * 1990-09-18 1992-04-27 Japan Field Kk Cleaning method and apparatus for cleaning object using nonaqueous flammable solvent
EP0490501A3 (en) * 1990-12-11 1992-08-12 Imperial Chemical Industries Plc Cleaning of articles
EP0490501A2 (en) * 1990-12-11 1992-06-17 Imperial Chemical Industries Plc Cleaning of articles
JPH0612468U (en) * 1992-02-20 1994-02-18 株式会社精工舎 Washing / drying device
JPH062182A (en) * 1992-04-20 1994-01-11 Mitsubishi Kasei Corp Oil deposition washing method, washing device and detergent
JPH0686336U (en) * 1993-05-21 1994-12-13 住友精密工業株式会社 Carrier cleaning equipment
JPH078870A (en) * 1993-06-29 1995-01-13 Koi Seisakusho:Kk Method and device for washing and drying hydrocarbon washing liquid
JPH07100444A (en) * 1993-10-06 1995-04-18 Hitachi Zosen Corp Method and device for cleaning
JPH06256983A (en) * 1993-12-16 1994-09-13 Mitsubishi Kasei Corp Washing device for object stained with oil
JPH06256984A (en) * 1993-12-21 1994-09-13 Mitsubishi Kasei Corp Washing device for object stained with oil
JPH073481A (en) * 1993-12-21 1995-01-06 Mitsubishi Chem Corp Equipment for cleaning greasy parts

Similar Documents

Publication Publication Date Title
JPS5585026A (en) Cleaning device
GB909421A (en) Ultrasonic process and apparatus for cleaning film
JPS5212576A (en) Wafer washing drying device
JPS6431497A (en) Printed circuit board cleaning system
JPH1034094A (en) Washing method for substrate cassette rack
JPS52140179A (en) Vibrating conveyor
JPS55115332A (en) Washing and drying apparatus for photomask
JPS5632727A (en) Mask washing apparatus
JPS5295967A (en) Wafer washing and drying unit
JPS55143041A (en) Manufacture of electronic device
JPS5750876A (en) Equipment for washing fruits
JPS5450615A (en) Cleaning of spinneret
JPH0420551Y2 (en)
JPS5498039A (en) Dust removing device
JPS5546576A (en) Device for preventing semiconductor device from contaminating
JPS5599725A (en) Method and device for manufacturing semiconductor device
JPS5394766A (en) Rotation-system processor of semiconductor wafer
JPS5328944A (en) Apparatus of cleaning air for tunnels
JPS53128160A (en) Vertical supersonic wave cleaner
JP2595143Y2 (en) Flat plate drying equipment
JPS57154836A (en) Washing method for semiconductor wafer, mask, etc.
JPS51138065A (en) Vehicle washing apparatus
JP2599905Y2 (en) Water-based bumper cleaning equipment
JPS5499358A (en) Washer
JPH0351031A (en) Ultrasonic washer