KR970063418A - Reticle for semiconductor device fabrication - Google Patents
Reticle for semiconductor device fabrication Download PDFInfo
- Publication number
- KR970063418A KR970063418A KR1019960004784A KR19960004784A KR970063418A KR 970063418 A KR970063418 A KR 970063418A KR 1019960004784 A KR1019960004784 A KR 1019960004784A KR 19960004784 A KR19960004784 A KR 19960004784A KR 970063418 A KR970063418 A KR 970063418A
- Authority
- KR
- South Korea
- Prior art keywords
- semiconductor device
- reticle
- patterns
- manufacturing
- device fabrication
- Prior art date
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- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
본 발명은 반도체 소자 제조용 래티클에 관한 것으로, 웨이퍼의 오정렬로 인해 발생되는 패턴의 균일도 저하를 방지 하기 위하여 노광 필드부의 외측 각 모서리 부분에 크기가 서로 다른 다수의 패턴이 형성된 모니터링부를 형성하므로써 웨이퍼의 수평도 및 촛점 거리를 정확하고 빠르게 조절할 수 있으며, 또한 패턴의 균일도 향상으로 소자의 수율이 증대될 수 있도록 한 반도체 소자 제조용 래티클에 관한 것이다.The present invention relates to a reticle for manufacturing a semiconductor device, in which a monitoring part having a plurality of patterns having different sizes is formed at an outer corner of an exposure field part in order to prevent a uniformity of patterns generated due to misalignment of wafers, To a reticle for manufacturing a semiconductor device capable of precisely and quickly adjusting a horizontal and a focal length, and increasing the yield of a device by improving pattern uniformity.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is a trivial issue, I did not include the contents of the text.
제1도는 본 발명에 따른 반도체 소자 제조용 래티클의 평면도.FIG. 1 is a plan view of a reticle for manufacturing a semiconductor device according to the present invention. FIG.
Claims (5)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019960004784A KR970063418A (en) | 1996-02-27 | 1996-02-27 | Reticle for semiconductor device fabrication |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019960004784A KR970063418A (en) | 1996-02-27 | 1996-02-27 | Reticle for semiconductor device fabrication |
Publications (1)
Publication Number | Publication Date |
---|---|
KR970063418A true KR970063418A (en) | 1997-09-12 |
Family
ID=66222367
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019960004784A KR970063418A (en) | 1996-02-27 | 1996-02-27 | Reticle for semiconductor device fabrication |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR970063418A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100492908B1 (en) * | 1997-12-27 | 2005-08-25 | 주식회사 하이닉스반도체 | Auto focus / flatness adjustment method considering lens aberration effect |
-
1996
- 1996-02-27 KR KR1019960004784A patent/KR970063418A/en not_active Application Discontinuation
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100492908B1 (en) * | 1997-12-27 | 2005-08-25 | 주식회사 하이닉스반도체 | Auto focus / flatness adjustment method considering lens aberration effect |
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Legal Events
Date | Code | Title | Description |
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A201 | Request for examination | ||
E902 | Notification of reason for refusal | ||
E601 | Decision to refuse application |