KR970053119A - Chamber cleaning method of dry etching equipment - Google Patents
Chamber cleaning method of dry etching equipment Download PDFInfo
- Publication number
- KR970053119A KR970053119A KR1019950057141A KR19950057141A KR970053119A KR 970053119 A KR970053119 A KR 970053119A KR 1019950057141 A KR1019950057141 A KR 1019950057141A KR 19950057141 A KR19950057141 A KR 19950057141A KR 970053119 A KR970053119 A KR 970053119A
- Authority
- KR
- South Korea
- Prior art keywords
- cleaning method
- chamber
- dry etching
- plasma
- oxygen gas
- Prior art date
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- Drying Of Semiconductors (AREA)
Abstract
플라즈마를 이용한 건식식각 장비의 챔버 세정방법에 관하여 개시한다. 본 발명은 반도체 소자의 제조시 사용되는 건식식각 장비의 챔버 세정방법에 있어서, 상기 챔버 내부에 성장한 폴리머층을 플라즈마를 이용하여 세정하는 것을 특징으로 하는 건식식각 장비의 챔버 세정방법을 제공한다. 상기 플라즈마의 소스로 산소 가스를 사용하거나 산소가스에 CF4,CHF3 및 Ar을 혼합하되 산소가스의 비율이 전체 가스량의 50% 이상으로 조절한다. 본 발명에 의하면, 챔버에 성장된 폴리머층을 산소 플라즈마를 이용하여 효과적으로 제거할 수 있다.A chamber cleaning method of a dry etching apparatus using plasma is disclosed. The present invention provides a chamber cleaning method of a dry etching apparatus for cleaning a semiconductor device used in the manufacture of a semiconductor device, wherein the polymer layer grown inside the chamber is cleaned using plasma. Oxygen gas is used as the source of the plasma or CF4, CHF3 and Ar are mixed with the oxygen gas, but the ratio of the oxygen gas is adjusted to 50% or more of the total gas amount. According to the present invention, the polymer layer grown in the chamber can be effectively removed using oxygen plasma.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음As this is a public information case, the full text was not included.
제2도는 본 발명에 의한 건식세정의 효과를 나타낸 그래프이다.2 is a graph showing the effect of dry cleaning according to the present invention.
Claims (2)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019950057141A KR970053119A (en) | 1995-12-26 | 1995-12-26 | Chamber cleaning method of dry etching equipment |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019950057141A KR970053119A (en) | 1995-12-26 | 1995-12-26 | Chamber cleaning method of dry etching equipment |
Publications (1)
Publication Number | Publication Date |
---|---|
KR970053119A true KR970053119A (en) | 1997-07-29 |
Family
ID=66619009
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019950057141A KR970053119A (en) | 1995-12-26 | 1995-12-26 | Chamber cleaning method of dry etching equipment |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR970053119A (en) |
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1995
- 1995-12-26 KR KR1019950057141A patent/KR970053119A/en not_active Application Discontinuation
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WITN | Withdrawal due to no request for examination |