KR970028814A - Reticles for Semiconductor Device Manufacturing - Google Patents
Reticles for Semiconductor Device Manufacturing Download PDFInfo
- Publication number
- KR970028814A KR970028814A KR1019950044265A KR19950044265A KR970028814A KR 970028814 A KR970028814 A KR 970028814A KR 1019950044265 A KR1019950044265 A KR 1019950044265A KR 19950044265 A KR19950044265 A KR 19950044265A KR 970028814 A KR970028814 A KR 970028814A
- Authority
- KR
- South Korea
- Prior art keywords
- alignment mark
- reticle
- step alignment
- semiconductor device
- mark
- Prior art date
Links
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- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
반도체 장치 제조에 사용되는 레티클(reticle)에 대하여 기재하고 있다. 본 발명은 소자 형성을 위한 메인 칩(main chip) 영역; 상기 칩 영역을 분리하는 스크라이브 라인(scribe line)영역; 및 상기 스크라이브 라인의 외각에 위치하여 레티클과 노광장비간의 기준점을 설정해 주는 레티클 정렬마크(reticle alignment mark), 상기 레티클을 회전정렬시켜주는 스텝 정렬마크(step alignment mark) 및 상기 노광장비에 대해 이미 정렬되어 있는 레티클과 공정 웨이퍼를 정렬시키기 위한 웨이퍼 정렬마크(wafer alignment mark)로 구성된 레티클 마크를 구비하여 반도체 장치의 사진공정에 사용되는 레티클에 있어서, 상기 스텝 정렬마크는 형성 가능한 위치중의 최외각에 형성되는 것을 특징으로 하는 레티클을 제공한다. 본 발명에 의하면 스텝 정렬마크가 형성 가능한 위치 중의 최외각에 형성되므로 현미경으로 상기 스텝 정렬마크를 찾는 경우에 외곽부부터 검색하면 되므로 검색시간이 단축된다. 또한, 상기 스텝 정렬마크의 양변부에는 소자 명칭 및 스텝 정렬마크의 좌표, 또는 공정 명칭 및 스텝 정렬마크의 좌표가 형성되어 있으므로 일단 찾아낸 스텝 정렬마크를 신뢰하고 작업을 진행할 수 있다. 따라서, 사진공정의 작업성 및 생산성이 향상된다.A reticle used for manufacturing a semiconductor device is described. The present invention provides a main chip region for forming a device; A scribe line region separating the chip region; And a reticle alignment mark positioned at an outer surface of the scribe line to set a reference point between the reticle and the exposure apparatus, a step alignment mark for rotating the reticle, and an alignment with respect to the exposure apparatus. A reticle for use in the photographic process of a semiconductor device having a reticle mark composed of a reticle and a wafer alignment mark for aligning the process wafer, wherein the step alignment mark is located at the outermost position of the position where the reticle can be formed. It provides a reticle characterized in that it is formed. According to the present invention, since the step alignment mark is formed at the outermost position among the positions where the step alignment mark can be formed, the search time can be shortened since the step alignment mark can be searched from the outer part when searching for the step alignment mark with a microscope. In addition, since both sides of the step alignment mark are formed with the coordinates of the device name and the step alignment mark, or the coordinates of the process name and the step alignment mark, the step alignment mark once found can be reliably processed. Therefore, workability and productivity of the photographic process are improved.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음As this is a public information case, the full text was not included.
제2도는 본 발명에 따른 레티클의 일 실시예를 도시한 레이아웃도.2 is a layout showing one embodiment of a reticle according to the present invention.
Claims (2)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1019950044265A KR970028814A (en) | 1995-11-28 | 1995-11-28 | Reticles for Semiconductor Device Manufacturing |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1019950044265A KR970028814A (en) | 1995-11-28 | 1995-11-28 | Reticles for Semiconductor Device Manufacturing |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| KR970028814A true KR970028814A (en) | 1997-06-24 |
Family
ID=66588898
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1019950044265A KR970028814A (en) | 1995-11-28 | 1995-11-28 | Reticles for Semiconductor Device Manufacturing |
Country Status (1)
| Country | Link |
|---|---|
| KR (1) | KR970028814A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100699109B1 (en) * | 2005-12-29 | 2007-03-21 | 동부일렉트로닉스 주식회사 | Alignment mark of exposing equipment and measuring method for semiconductor manufacturing |
-
1995
- 1995-11-28 KR KR1019950044265A patent/KR970028814A/en not_active Application Discontinuation
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100699109B1 (en) * | 2005-12-29 | 2007-03-21 | 동부일렉트로닉스 주식회사 | Alignment mark of exposing equipment and measuring method for semiconductor manufacturing |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| WITN | Withdrawal due to no request for examination |