KR970024243A - Manufacturing method of chromium / chromium oxide multilayer film black matrix for color filter - Google Patents

Manufacturing method of chromium / chromium oxide multilayer film black matrix for color filter Download PDF

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Publication number
KR970024243A
KR970024243A KR1019950033887A KR19950033887A KR970024243A KR 970024243 A KR970024243 A KR 970024243A KR 1019950033887 A KR1019950033887 A KR 1019950033887A KR 19950033887 A KR19950033887 A KR 19950033887A KR 970024243 A KR970024243 A KR 970024243A
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KR
South Korea
Prior art keywords
chromium
glass substrate
chromium oxide
black matrix
photoresist
Prior art date
Application number
KR1019950033887A
Other languages
Korean (ko)
Other versions
KR100358795B1 (en
Inventor
이병학
Original Assignee
윤종용
삼성전관 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by 윤종용, 삼성전관 주식회사 filed Critical 윤종용
Priority to KR1019950033887A priority Critical patent/KR100358795B1/en
Publication of KR970024243A publication Critical patent/KR970024243A/en
Application granted granted Critical
Publication of KR100358795B1 publication Critical patent/KR100358795B1/en

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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • General Physics & Mathematics (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Optical Filters (AREA)

Abstract

유리기판 위에 포토레지스터를 도포하고 노광, 현상하여 일정한 패턴을 형성하는 공정과, 상기의 패턴이 형성된 유리기판상에 크롬 옥사이드박막을 증착하는 공정과, 상기의 유리기판상에 크롬박막을 증착하는 공정과, 상기의 유리기판상에 잔존하는 포토레지스터 및 포토레지스터 잔존부상의 크롬/크롬 옥사이드박막을 스트리퍼 및 초음파 진동의 동반 효과로 제거하는 공정에 따라 제조된 칼라 필터용 크롬/크롬 옥사이드 다층막 블랙 매트릭스의 제조방법은 공정원가의 절감 및 불량률 감소효과를 기대할 수 있고, 블랙 매트릭스의 패턴을 미세하고, 균일하게 형성할 수 있으며, 환경오염 방지효과를 얻을 수 있다.Applying a photoresist on a glass substrate, exposing and developing a pattern to form a predetermined pattern, depositing a chromium oxide thin film on the glass substrate on which the pattern is formed, depositing a chromium thin film on the glass substrate, The method of manufacturing a chromium / chromium oxide multilayer black matrix for color filters manufactured by the step of removing the photoresist remaining on the glass substrate and the chromium / chromium oxide thin film on the photoresist remaining portion by a combined effect of a stripper and ultrasonic vibration Process cost reduction and defect rate reduction effect can be expected, the pattern of the black matrix can be finely and uniformly formed, and environmental pollution prevention effect can be obtained.

Description

칼라 필터용 크롬/크롬 옥사이드 다층막 블랙 매트릭스의 제조방법Manufacturing method of chromium / chromium oxide multilayer film black matrix for color filter

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음As this is a public information case, the full text was not included.

제2도는 본 발명의 크롬/크롬 옥사이드 다층막 블랙 매트릭스의 제조공정을 나타낸 공정도이다.2 is a process chart showing the manufacturing process of the chromium / chromium oxide multilayer black matrix of the present invention.

Claims (2)

유리기판 위에 포토레지스터막을 형성하는 공정과; 상기의 포토레지스터막이 형성된 유리기판을 패터닝 마스크를 통하여 노광 및 현상하는 공정과; 상기의 패턴이 형성된 유리기판상에 크롬 옥사이드막을 증착하는 공정과; 상기의 크롬 옥사이드막이 증착된 유리기판상에 크롬막을 증착하는 공정과; 상기한 유리기판상의 포토레지스터 잔존부 및 포토레지스터 잔존부상의 크롬 옥사이드/크롬막을 제거하는 공정을; 포함하는 하는 크롬/크롬 옥사이드 다층막 블랙 매트릭스의 제조방법.Forming a photoresist film on the glass substrate; Exposing and developing the glass substrate on which the photoresist film is formed through a patterning mask; Depositing a chromium oxide film on the glass substrate on which the pattern is formed; Depositing a chromium film on the glass substrate on which the chromium oxide film is deposited; Removing the photoresist residue on the glass substrate and the chromium oxide / chromium film on the photoresist residue; Method for producing a chromium / chromium oxide multilayer film comprising a black matrix. 제1항에 있어서, 상기한 포토레지스터 잔존부 및 포토레지스터 잔존부상의 크롬 옥사이드/크롬막을 제거하는 공정을 스트리퍼 및 초음파 진동으로 제거하는 것인 크롬/크롬 옥사이드 다층막 블랙 매트릭스의 제조방법.The method of manufacturing a chromium / chromium oxide multilayer film black matrix according to claim 1, wherein the step of removing the chromium oxide / chromium film on the photoresist remaining part and the photoresist remaining part is removed by a stripper and ultrasonic vibration. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019950033887A 1995-10-04 1995-10-04 Method for fabricating chrome used for color filter/chrome oxide multi-layer black matrix KR100358795B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1019950033887A KR100358795B1 (en) 1995-10-04 1995-10-04 Method for fabricating chrome used for color filter/chrome oxide multi-layer black matrix

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019950033887A KR100358795B1 (en) 1995-10-04 1995-10-04 Method for fabricating chrome used for color filter/chrome oxide multi-layer black matrix

Publications (2)

Publication Number Publication Date
KR970024243A true KR970024243A (en) 1997-05-30
KR100358795B1 KR100358795B1 (en) 2003-02-26

Family

ID=37490424

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019950033887A KR100358795B1 (en) 1995-10-04 1995-10-04 Method for fabricating chrome used for color filter/chrome oxide multi-layer black matrix

Country Status (1)

Country Link
KR (1) KR100358795B1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100635036B1 (en) * 2001-04-04 2006-10-17 삼성에스디아이 주식회사 Manufacturing Process for Color Filter Plate

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100635036B1 (en) * 2001-04-04 2006-10-17 삼성에스디아이 주식회사 Manufacturing Process for Color Filter Plate

Also Published As

Publication number Publication date
KR100358795B1 (en) 2003-02-26

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