KR100635036B1 - Manufacturing Process for Color Filter Plate - Google Patents

Abstract

The present invention relates to a black matrix of a color filter substrate, which is harmless to a human body and has a black mattress superimposed on the edges of red, green, and blue patterns (R), (G), and (B) in a grid shape. It is formed by oxidizing a metal of Mo system (pure Mo or Mo alloy) having almost no absorption of reflected light.

Then, since the black matrix can be formed of a single layer of Mo oxide, the manufacturing cost of the product can be reduced.

In addition, since the heavy metal is not used as a material for forming the black matrix, environmental pollution can be minimized.

Color filter substrate, black matrix, Mo-based metal, Mo oxide film

Description

Manufacturing Process of Color Filter Substrate {Manufacturing Process for Color Filter Plate}

1A to 2 are views illustrating a process of forming a black matrix according to a first embodiment of the present invention.

3 is a cross-sectional view showing a state in which a color filter pattern is formed in accordance with a first embodiment of the present invention.

4 is a cross-sectional view illustrating a planarization protective film and a common electrode formed according to a first embodiment of the present invention.

5A to 5C are cross-sectional views illustrating a process of forming a black matrix according to a second embodiment of the present invention.

6 is a cross-sectional view illustrating a planarization protective film and a common electrode formed according to a second embodiment of the present invention.

The present invention relates to a method for manufacturing a color filter substrate, and more particularly, to a black mattress that is superimposed on the edges of red, green, and blue patterns (R), (G) and (B) in a grid shape, harmless to a human body. The present invention relates to a method of manufacturing a color filter substrate for minimizing environmental pollution and reducing costs by oxidizing a metal of an Mo system (pure Mo or Mo alloy) having almost no environmental pollution and excellent absorption of reflected light.

Recently, as interest in miniaturization and high quality of a display device as a transmission medium of image information, new flat panel display devices have been developed that can solve the large and heavy disadvantages of CRT (cathode ray tube), which has been used until now. One of the flat panel display devices, the liquid crystal display device has the advantages of light and thin, it can solve the large and heavy disadvantages of the CRT.

A general active matrix liquid crystal display device can be divided into a TFT substrate having a TFT, which is a switching element, and a color filter substrate attached to face the TFT substrate with a liquid crystal interposed therebetween, and having a color filter pattern of red, green, and blue, The light passing through the pixel electrode connected to the TFT passes through the color filter pattern corresponding to each pixel electrode and displays a desired color image.

Here, in order to block the reflected light which adversely affects the image display, a multilayer black matrix composed of CrOx and Cr layers is formed in a lattice shape in a region other than the portion corresponding to the pixel electrode of the TFT substrate in the color filter substrate. The black matrix serves to block reflected light in areas other than the pixel electrode portion and to suppress light leakage current of the TFT.

As described above, when the multilayer black matrix formed of CrOx and Cr layers was formed, low reflection of the panel could be achieved, but there is a problem in that a defect generation rate and manufacturing cost increase due to complexity of the manufacturing process.

In addition, since a black matrix is formed using chromium, which is a heavy metal, there is a problem that it is difficult to avoid environmental regulations due to heavy metal contaminants generated during the manufacturing process.

Therefore, an object of the present invention is to form a black matrix using a metal that is harmless to the human body and is hardly affected by environmental regulations.

Another object of the present invention is to simplify the manufacturing process of the color filter substrate to reduce the cost of the product.

Still other objects of the present invention will become more apparent from the following detailed description and the accompanying drawings.

In order to achieve the above object, the present invention forms a Mo oxide film by oxidizing a Mo-based metal to form a lattice-like black matrix on a color filter substrate, and a red, green, and blue color resist is formed in an empty space of the black matrix. Red, green, and blue color filter patterns are sequentially formed, a protective film is formed on the entire surface of the substrate including the black matrix, red, green, and blue color filter patterns, and a transparent metal is deposited on the protective film to form a liquid crystal together with the pixel electrode. To form a common electrode for driving.

Preferably, the black matrix may be formed of a Mo oxide single layer, or may be formed of a multilayer in which the Mo oxide film and the Mo film are laminated.

For example, a Mo oxide film is formed on a color filter substrate by depositing a Mo-based metal on a color filter substrate in a 2O ₂ (or O ₂ + N ₂ ) atmosphere.

As another example, the Mo oxide film is formed by depositing Mo-based metal on the color filter substrate and heat-treating Mo or Mo alloy deposited on the color filter substrate in an O ₂ (or O ₂ + N ₂ ) atmosphere.

Hereinafter, a preferred embodiment of the present invention will be described with reference to FIGS. 1 to 6.

1A to 4 illustrate a method of forming a color filter for an LCD according to a first embodiment of the present invention. Referring to this, the manufacturing process is largely divided into three steps.

The first step is to form a monolayer black matrix that blocks unwanted reflected light.

First, as a light blocking film for blocking unnecessary reflected light deteriorating image quality, as shown in FIG. by heat treating the metal film of Mo grid deposited on a color filter substrate 110 in the O ₂ or O _2, N ₂ atmosphere, thereby oxidizing the metal of the grid Mo deposited on a color filter substrate (110).

Subsequently, a predetermined portion of the color filter substrate 110 is deposited on the color filter substrate as shown in FIG. 1B and then oxidized to form an oxidized Mo oxide film 120a as shown in FIG. 2 through a photolithography process and an etching process. This exposed lattice-shaped black matrix 120 is formed.

As described above, the Mo-based film 120a may be obtained by depositing Mo-based metal on the color filter substrate 110 and then oxidizing the Mo-based metal by heat treatment in an O ₂ (or O ₂ + N ₂ ) atmosphere. However, by depositing a Mo-based metal on the color filter substrate 110 in an O ₂ (or O ₂ + N ₂ ) atmosphere, the Mo oxide film 120a may be formed simultaneously with the deposition.

The second step is to form a color filter pattern 130 that determines the color of light transmitted through the TFT substrate (not shown) and the liquid crystal (not shown).

 As shown in FIG. 3, a red color resist is coated on the color filter substrate 110 on which the black matrix 120 is formed, and soft baked the red color resist for a predetermined time on a hot plate at 80 to 110 ° C. It exposes using a photomask, and develops a red color resist. Thereafter, the developed red color resist is post-baked to form red color filter patterns 132 in the voids 125 of the black matrix 120 including the edges of the black matrix 120.

Subsequently, the red color filter patterns 132 and the red color filter patterns 132 are formed in the empty space 125 of the black matrix 120 including the edge of the black matrix 120 in the same manner as the formation process of the red color filter pattern 132 described above. A green color filter pattern 134 is formed to be separated.

Subsequently, the red and green color filter patterns 132 and 134 are formed in the empty space 125 of the black matrix 120 including the edge of the black matrix 120 in the same manner as the formation process of the red color filter pattern 132 described above. ) To form blue color filter patterns 136.

The third step is a liquid crystal together with a pixel electrode (not shown) formed on the TFT substrate and the planarization protective layer 140 which protects the black matrix 120 and the color filter patterns 130 from external impact and external environment and improves smoothness. A step of forming a common electrode 150 for driving a liquid crystal by applying power to the substrate is performed.

As shown in FIG. 4, after forming an organic transparent resin such as acrylic, polyimide, polyacrylate, polyurethane, etc. having a high surface hardness and excellent light transmittance to a predetermined thickness, a temperature of about 200 ° C. The planarization protective film 140 is formed by heating in a bake oven for about 1 hour.

Subsequently, a common metal 150 is formed on the entire surface of the planarization protective layer 140 by depositing a transparent metal, for example, ITO, at a thickness of 1500 Å or less.

5A through 6 illustrate a method of forming a color filter for LCDs according to a second embodiment of the present invention. The manufacturing process will be described below with reference to the accompanying drawings. Here, the second embodiment is directed to a method of forming a multilayer black matrix.

First, as a light blocking film for blocking unnecessary reflected light deteriorating image quality, as shown in FIG. The Mo-based metal deposited on the color filter substrate is oxidized by heat-treating the Mo-based metal film deposited on the color filter substrate in an O ₂ (or O ₂ + N ₂ ) atmosphere.

When the Mo oxide film 220a is formed on the color filter substrate 210 as described above, as shown in FIG. 5B, a Mo-based metal film is deposited on the upper surface of the Mo oxide film 220a to form the Mo-based metal film 220b. A lattice-shaped black matrix in which Mo oxide film 220a and Mo-based metal film 220b are exposed to a predetermined portion of the color filter substrate 210 through a photolithography process and an etching process as shown in FIG. 5C. To form 220.

As described above, the Mo-based film 220a may be obtained by depositing Mo-based metal on the color filter substrate 210 and heat-treating and oxidizing the Mo-based metal in an O ₂ (or O ₂ + N ₂ ) atmosphere. However, by depositing a Mo-based metal on the color filter substrate 210 in an O ₂ (or O ₂ + N ₂ ) atmosphere, the Mo oxide film 220a may be formed simultaneously with the deposition.

When the black matrix 220 is formed as described above, red, green, and blue color resists are sequentially applied and patterned, and thus the black matrix 220 is formed to include the edges of the black matrix 220 as shown in FIG. 6. Red, green, and blue color filter patterns 230 are formed in the empty space 225.

Subsequently, a material having high surface hardness and excellent light transmittance is coated on the color filter pattern 230 including the black matrix 220 to protect the black matrix 220 and the color filter pattern 230 from external impact and external environment. The planarization protective film 240 which improves smoothness is formed.

A transparent metal is deposited on the entire surface of the planarization protective layer 240 to form a common electrode 250 for driving the liquid crystal by applying power to the liquid crystal together with the pixel electrode formed on the TFT substrate.

As described in the first and second embodiments of the present invention, if the Mo-based metal is deposited on the front surface of the color filter substrate and oxidized to form a single-layer black matrix, the manufacturing cost of the product may be reduced. .

In addition, since the heavy metal is not used as a material for forming the black matrix, it is effective to minimize environmental pollution.

Claims (10)

Forming a Mo oxide film by oxidizing a metal of the Mo system to form a light blocking film for absorbing light on the color filter substrate, and patterning the light blocking film to form a lattice-like black matrix on the color filter substrate; Sequentially forming red, green, and blue color filter patterns using red, green, and blue color resists in an empty space of the black matrix including an edge of the black matrix; A protective film is applied to the entire surface of the color filter substrate including the black matrix and the red, green and blue color filter patterns to protect the black matrix and the red, green and blue color filter patterns from the external environment. Forming; Depositing a transparent metal that transmits light on the upper surface of the passivation layer to form a common electrode, The Mo oxide film is a method of manufacturing a color filter substrate, characterized in that formed by depositing a Mo-based metal on the color filter substrate in an O ₂ atmosphere. The method of claim 1, wherein the black matrix is formed of a Mo oxide single layer. The method of claim 1, wherein the black matrix is formed by sequentially stacking an Mo oxide film and a metal of Mo system. delete delete The method according to any one of claims 1 to 3, wherein the Mo-based metal is any one metal selected from pure Mo and Mo alloy. Forming a Mo oxide film by oxidizing a metal of the Mo system to form a light blocking film for absorbing light on the color filter substrate, and patterning the light blocking film to form a lattice-like black matrix on the color filter substrate; Sequentially forming red, green, and blue color filter patterns using red, green, and blue color resists in an empty space of the black matrix including an edge of the black matrix; A protective film is applied to the entire surface of the color filter substrate including the black matrix and the red, green and blue color filter patterns to protect the black matrix and the red, green and blue color filter patterns from the external environment. Forming; Depositing a transparent metal that transmits light on the upper surface of the passivation layer to form a common electrode, The Mo oxide film is formed by depositing a Mo-based metal on the color filter substrate, and then heat-treating the Mo-based metal deposited on the color filter substrate in an O ₂ atmosphere. 8. The method of claim 7, wherein the black matrix is formed of a Mo oxide single layer. The method of claim 7, wherein the black matrix is formed by sequentially stacking an Mo oxide film and a metal of an Mo system. The method of manufacturing a color filter substrate according to any one of claims 7 to 9, wherein the Mo-based metal is any one metal selected from pure Mo and Mo alloy.

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