KR101333739B1 - Color filter substrate for liquid crystal display - Google Patents

Abstract

The present invention provides a display device comprising: a substrate in which a display area and a non-display area are defined; A first black matrix including a first adhesive layer, a reflective shielding layer, and an absorption shielding layer in a display area on the substrate and formed in a lattice shape; The present invention provides a color filter substrate for a liquid crystal display device including a color filter layer overlapping the first black matrix and filling a region surrounded by the first black matrix.

Color filter substrate, color shift, optical leakage, liquid crystal display, black matrix

Description

Color filter substrate for liquid crystal display

1 is a schematic cross-sectional view of a general liquid crystal display device.

FIG. 2 shows a black matrix (second matrix) of a color filter substrate for a liquid crystal display device according to a first embodiment of the present invention, and a central black matrix (first black matrix) surrounding a pixel region in a display area displaying an image. Section which cut | disconnected the part in which) was formed.

3A and 3B are sectional views of a color filter substrate for a liquid crystal display device according to the first and second modifications of the first embodiment of the present invention.

FIG. 4 illustrates a portion in which an edge black matrix (second black matrix) of a color filter substrate for a liquid crystal display device and a central black matrix (first black matrix) surrounding a pixel area in a display area are formed according to a second embodiment of the present invention. The cut section.

5A and 5B are cross-sectional views showing first and second modifications according to the second embodiment of the present invention, respectively.

6A to 6F are cross-sectional views illustrating manufacturing steps of a color filter substrate for a liquid crystal display device according to a modification of the second exemplary embodiment of the present invention, wherein the cross-sectional views of the steps shown in FIG.

<Description of the symbols for the main parts of the drawings>

421 (color filter) Substrate 430: first chromium oxide layer

433: chromium layer 436: second chromium oxide layer

450: first black matrix 453: second black matrix

465: color filter layer 473: overcoat layer

AA: Display Area NA: Non-Display Area

The present invention relates to a color filter substrate for a liquid crystal display device, and more particularly, to a color filter substrate for a liquid crystal display device for effectively preventing light leakage and a manufacturing method thereof.

Recently, liquid crystal displays have been spotlighted as high-tech display devices with low power consumption, good portability, technology-intensive and high value-added.

The liquid crystal display device is formed by arranging two substrates having electrodes formed on one side thereof so that the electrodes face each other, injecting liquid crystal between the electrodes of the two substrates, and applying voltage to the electrodes formed on the substrates. By moving the liquid crystal molecules by the electric field is a device that represents the image by the transmittance of light that changes depending on the position change of the liquid crystal.

1 is a schematic cross-sectional view of a general liquid crystal display device.

As shown in the drawing, the general liquid crystal display device 10 includes a color filter substrate on the upper side, an array substrate on the lower side, and a liquid crystal layer interposed between these two substrates.

In the liquid crystal display device 10 having such a configuration, the array substrate 21 disposed below the plurality of gate lines (not shown) and the plurality of data lines (not shown) cross each other to define the pixel area P. Each pixel area P has a thin film transistor Tr as a switching element, and is connected to the thin film transistor Tr to form a pixel electrode 35.

In addition, the color filter substrate 41 formed to correspond to the array substrate having such a structure and spaced apart from the upper portion thereof has red, green, and blue color filter patterns 45a and 45b corresponding to each pixel region P of the array substrate. And a color filter layer 45 having 45c, and a black matrix 42 is provided to correspond to the boundary of each color filter pattern 45a, 45b, 45c of the color filter layer 45 and the thin film transistor. The common electrode 47 is formed as a transparent conductive material under the color filter layer 45 45c.

On the other hand, between the array substrate 21 and the color filter substrate 41 is provided with a liquid crystal layer 50 which changes in phase depending on the magnitude of the voltage applied to the pixel electrode 35 and the common electrode 47, In addition, a spacer (not shown) is further provided to allow the liquid crystal layer 50 formed between the two substrates 21 and 41 to maintain a constant gap.

In the color filter substrate 41 for a liquid crystal display device having such a configuration, the configuration and role of the black matrix 47 will be described in more detail.

The black matrix 47 is formed to correspond to a boundary of each pixel region P, that is, a gate wiring (not shown) and a data wiring (not shown), and a thin film transistor (Tr) that is a switching element. By preventing the light passing through the abnormally driven liquid crystal from passing through the color filter substrate 41, the image quality is prevented by uncontrolled light.

The black matrix 42 that plays such a role is made of a single layer of chromium (Cr), which is usually made of metal.

However, when the black matrix 42 is formed using chromium (Cr), problems such as tearing due to poor adhesion between chromium (Cr) and the substrate 41, which is usually made of glass, are caused.

In addition, since the surface of the chromium (Cr) is very smooth and has a mirror surface, it has a property of reflecting light, thereby reflecting light incident from the backlight back to the bottom thereof, so that the reflected light is reflected on the semiconductor layer of the thin film transistor Tr. When entering (25), colors such as pinkish phenomenon, greenish greenish phenomenon or yellowish yellowish phenomenon which are generally pinkish when expressing white color by light leakage Color shift occurs to reduce the display quality, and the light leakage causes a problem of lowering the characteristics of the thin film transistor Tr itself.

SUMMARY OF THE INVENTION The present invention has been made to solve the above-described problems, and by using chromium having excellent light blocking ability while reducing the reflection characteristic, color shift due to light leakage due to incident light reflected by the thin film transistor is reflected. It is an object of the present invention to provide a color filter substrate for a liquid crystal display device which suppresses defects and improves image quality.

According to an aspect of the present invention, there is provided a color filter substrate for a liquid crystal display device, the substrate including a display area and a non-display area; A first black matrix including a first adhesive layer, a reflective shielding layer, and an absorption shielding layer in a display area on the substrate and formed in a lattice shape; And a color filter layer formed to overlap the first black matrix and fill an area surrounded by the first black matrix.

In this case, the non-display area on the substrate includes the first adhesive layer and the reflective shielding layer along an edge of the substrate, and the second black matrix further includes the absorption shielding layer formed on the reflective shielding layer. It is characterized by having the same structure as 1 black matrix. In this case, a common electrode may be further formed on the front surface of the color filter layer and the second black matrix, and each of the first and second black matrices may have a second adhesive layer between the first adhesive layer and the reflective shielding layer. A third adhesive layer is further formed between the layer and the absorption shielding layer.

In addition, the reflective shielding layer has a conductive property, a second adhesive layer is further formed between the first adhesive layer and the reflective shielding layer of the second black matrix, the first adhesive layer of the first black matrix And a second adhesive layer is further formed between the reflective shielding layer, and a third adhesive layer is further formed between the reflective shielding layer and the absorption shielding layer of the first black matrix.

In addition, the second black matrix is exposed on the color filter layer, and an overcoat layer is further formed.

In addition, the first adhesive layer and the absorption shielding layer is characterized by consisting of chromium oxide (CrOx), the reflective shielding layer is characterized by consisting of chromium (Cr).

In addition, the second and third adhesive layer is characterized in that made of chromium nitride (CrNx).

A method for manufacturing a color filter substrate for a liquid crystal display according to the present invention includes a first adhesive layer, a reflective shielding layer, and an absorption shielding layer formed in a lattice shape in the display area on a substrate on which a display area and a non-display area are defined. Forming a first black matrix and a second black matrix including the first adhesive layer and the reflective shielding layer along an edge of the substrate in the non-display area; And forming a color filter layer formed in the display area, wherein the color filter layer overlaps the first black matrix and fills an area surrounded by the first black matrix.

The forming of the first and second black matrices may include sequentially stacking a first adhesive layer, a reflective shielding layer, and an absorption shielding layer on the entire surface of the substrate; Patterning the absorption shielding layer, the reflective shielding layer, and the first adhesive layer to form first and second black matrices including the first adhesive layer, the reflective shielding layer, and the absorption shielding layer in the display area; And removing the absorbing shielding layer of the black mattress to expose the reflective shielding layer beneath it.

Hereinafter, a color filter substrate for a liquid crystal display device will be described in an embodiment of the present invention with reference to the accompanying drawings.

&Lt; Embodiment 1 >

FIG. 2 shows a black matrix (second matrix) of a color filter substrate for a liquid crystal display device according to a first embodiment of the present invention, and a central black matrix (first black matrix) surrounding a pixel region in a display area displaying an image. It is sectional drawing which cut | disconnected the part in which () was formed.

As illustrated, the first black matrix 150 has a triple layer structure on a transparent insulating substrate 121, for example, a glass substrate, and has a plurality of openings formed in a lattice form in the display area AA. The second black matrix 153 having a triple layer structure is formed on the non-display area NA outside the display area and borders the substrate 121.

In this case, the first and second black matrices 150 and 153 of the triple layer structure each include a first chromium oxide layer 130, a chromium layer 133, and a second chromium oxide layer 136 from the substrate 121. It is characterized by being.

On the other hand, chromium (Cr) is a metal material and its surface is very smooth and forms a mirror surface, which has excellent light blocking ability, but also has a high tendency to reflect against incident light, while chromium oxide (CrOx) has an insulating material. It has the ability to block light to some extent and has a strong tendency to absorb light rather than a property to reflect light, and in particular, the surface and adhesion of the glass substrate is much better than the chromium (Cr) of the metallic material.

In the first embodiment of the present invention, the first and second black matrices 150 and 153 are formed as a triple layer of the first chromium oxide layer 130 / chromium layer 133 / the second chromium oxide layer 136. By forming the structure, that is, forming the first chromium oxide layer 130 between the chromium layer 133 and the substrate 121 to improve the adhesion to the substrate 121, and further the light on the chromium layer 133 By further configuring the second chromium oxide layer 136 having excellent absorption rate, the light emitted from the backlight is absorbed without incident upon the first and second black matrices 150 and 153 when the incident light enters the first and second black matrices 150 and 153. In other words, color shift defects due to light leakage caused by light incident on the first black matrix positioned in the display area and re-incident to the thin film transistor on the array substrate can be suppressed.

Meanwhile, as shown in FIGS. 3A and 3B in addition to the triple layer black matrix 150 and 153 structures proposed by the first embodiment described above, the first chromium oxide layer as the first modification (see FIG. 3A). A first chromium nitride layer 233 is further formed between the 230 and the chromium layers 236 so that the first or second black matrix 250 and 253 may have the first chromium oxide layer 230 and the first chromium nitride layer. The first and second black matrices 250 and 253 having a four-layer structure of (233) / chromium layer 236 / second chromium oxide layer 239 may be constituted, and the second modification (see FIG. 3B). ), The first chromium oxide layer 330, the first chromium nitride layer 333, the chromium layer 336, the second chromium nitride layer 339, and the second chromium oxide layer 342. And a second chromium nitride layer 339 between the chromium layer 336 and the second chromium oxide layer 342 in addition to the first chromium nitride layer 333 to have the second black matrix 350 and 353. It can also be configured to include more.

Thus, as in the first and second modifications of the first embodiment, between the first chromium oxide layers 230 and 330 and the chromium layers 236 and 336 or between the chromium layer 336 and the second chromium oxide layer 342. The reason for forming the first or second chromium nitride layers 233, 333, and 339 is to improve adhesion between the first and second chromium oxide layers 230, 330, 239, and 342 and the chromium layer 336. to be.

The chromium oxide (CrOx) has the best adhesion to chromium (Cr) and chromium nitride (CrNx) with respect to the glass substrate surface, and thus the chromium layer 236, 236, on the glass substrates 221 and 321 Prior to forming 336, the first chromium oxide layers 230 and 330 are formed first, and the first chromium nitride layers 233 and 333 are formed on the first chromium oxide layers 230 and 330. The reason is that the first chromium nitride layer between the first chromium oxide layers 230 and 330 and the chromium layers 236 and 336 rather than the adhesion between the first chromium oxide layers 230 and 330 and the chromium layers 236 and 336. The first chromium oxide layers 230 and 330, the first chromium nitride layers 233 and 333, the first chromium nitride layers 233 and 333, and the chromium layers 236 and 336 are formed through the first and second layers 233 and 333. It is because the adhesion is more excellent to achieve the interface between the liver.

In addition, in the second modification, the second chromium nitride layer 339 is formed between the chromium layer 336 and the second chromium oxide layer 342. The first chromium oxide layer 330 and the chromium layer ( This is to improve the adhesive force for the same reason as the first chromium nitride layer 333 formed between the 336.

The following describes the first embodiment with reference to FIG. 2.

First and second black matrices 150 and 153 having such a triple layer (first embodiment) or quadruple layer (first modification of the first embodiment) or five layer (second modification of the first embodiment) structure. And a color filter layer 165 including red, green, and blue color filter patterns 165a, 165b, and 165c which are sequentially repeated inside the display area AA, and above the color filter layer 165. The common electrode 170 is formed as a transparent conductive material on the color filter substrate 121. In this case, a plurality of patterned spacers (not shown) spaced apart corresponding to the first black matrix 150 may be further provided on the common electrode 170.

The color filter substrate according to the first embodiment having the above-described configuration and the first and second modifications thereof includes a common electrode formed on the front surface thereof, which is used in a twisted nematic mode liquid crystal display, and crosses each other. A liquid crystal display is configured by interposing a liquid crystal layer between the two substrates, facing an array substrate including a gate and data wiring, a thin film transistor connected to the wiring and a pixel electrode connected thereto.

In this case, since the liquid crystal display has a first chromium oxide layer having a characteristic of absorbing light on the uppermost surface of the first black matrix formed corresponding to the switching element, the light incident from the backlight is a thin film transistor as the switching element. Since the reflection of the furnace is suppressed, color shift defects due to light leakage can be reduced.

&Lt; Embodiment 2 >

The color filter substrate according to the second exemplary embodiment of the present invention is used in a transverse electric field type liquid crystal display device, does not include a common electrode, and has a structure of a first black matrix formed inside the display area and outside the display area. It is characterized by varying the stacked configuration of the two black matrices.

In the case of a transverse electric field type liquid crystal display, since the common electrode is formed on the array substrate together with the pixel electrode, there is no component that can discharge the static electricity when static electricity is generated. Therefore, the color filter substrate for a liquid crystal display device according to the second embodiment of the present invention is characterized in that it has a structure capable of effectively discharging static electricity while preventing color shift defects due to light leakage.

FIG. 4 illustrates a portion in which an edge black matrix (second black matrix) of a color filter substrate for a liquid crystal display device and a central black matrix (first black matrix) surrounding a pixel area in a display area are formed according to a second embodiment of the present invention. This is a cross-sectional view cut. In this case, for convenience of description, the black matrix formed inside the display area and formed in a lattice shape is defined as a first black matrix and a black matrix formed by bordering the color filter substrate outside the display area as a second black matrix.

As shown, the first chromium oxide layer 430 and the chromium layer 433 and the second chromium oxide are inside the display area AA where an image is displayed on a transparent substrate 421, for example, a glass substrate. A first black matrix 450 having a triple layer structure of the layer 436 is formed in a lattice form, connected to the first black matrix 450 having the triple layer structure, and is disposed outside the display area AA. A second black matrix 453 formed around the 421 and having a double layer structure of the first chromium oxide layer 430 and the chromium layer 433 is formed.

Accordingly, the first black matrix 450 formed in the display area AA becomes the first chromium oxide layer 430 made of chromium oxide (CrOx), the uppermost layer of which has insulating properties and absorbs light. The second black matrix 453 formed in the non-display area NA outside the display area AA is characterized in that the uppermost layer is a chromium layer 433 having conductive properties.

Next, the color filter layer 465 overlapping the first black matrix 450 of the third middle layer structure and including red, green, and blue color filter patterns 465a, 465b, and 465c which are sequentially repeated in the display area AA. ) Is formed. In this case, the color filter layer 465 extends from the outermost part of the display area AA so that a portion of the color filter layer 465 partially overlaps the second black matrix 453, but the second black matrix ( 453) most of them are exposed to the outside of the color filter layer 465.

In addition, an overcoat layer 473 is further formed on the color filter layer 465 to protect the color filter layer 465. In this case, the overcoat layer 473 is formed by exposing the second black matrix 453 positioned at the outermost portion of the substrate 421.

Although not shown in the drawing, the patterned spacers (not shown) of the columnar shape may be further spaced apart from each other to correspond to the first black matrix 450 on the overcoat layer 473.

In the case of the color filter substrate 421 according to the second exemplary embodiment of the present invention, the first black matrix having a triple layer structure having the second chromium oxide layer 436 as the uppermost layer is formed inside the display area AA. 450 is formed so that the first black matrix 450 absorbs the light from the backlight without reflecting it when the transverse field type liquid crystal display is used to form a transverse electric field type liquid crystal display device, and is a switching element that is covered by the first black matrix 450. Since the incident light caused by the reflection on the surface of the first black matrix 450 to the thin film transistor is suppressed, color shift defects due to light leakage can be suppressed. In addition, in the second black matrix 453 formed in the non-display area NA outside the display area AA, a chromium layer 433 having conductive characteristics is positioned on the uppermost layer, and the color filter layer 465 and the overcoat layer 170 are disposed. By having a structure that is not completely obscured by the ()) it is electrically connected to the wiring of the array substrate through the conductive ball in contact with it and finally connected to the ground of the printed circuit board (PCB) attached to the array substrate It is characterized by a structure that can effectively discharge static electricity through the ground.

5A and 5B are cross-sectional views illustrating first and second modifications according to the second exemplary embodiment of the present invention, respectively, and include pixel areas in the display area AA including the second black matrix located in the non-display area, respectively. 4 is a view illustrating a portion where a first black matrix is formed surrounding the surface. Except for the structures of the first and second black matrices, only the structures of the first and second black matrices will be described since they have the same structure as the second embodiment described above.

As shown in FIG. 5A, in the color filter substrate 521 for a transverse electric field type liquid crystal display device according to the first modification of the second embodiment of the present invention, the first black matrix 550 may include a first chromium oxide layer ( 530 / chromium nitride layer 533 / chromium layer 536 / second chromium oxide layer 539, and the second black matrix 553 has a first chromium oxide layer 530 / chromium nitride. It is characterized by having a triple layer structure of the layer 533 / chrome layer 536. In this case, the reason why the chromium nitride layer 533 is formed between the first chromium oxide layer 530 and the chromium layer 536 is to improve the adhesion between the first chromium oxide layer 530 and the chromium layer 536. For sake.

Next, referring to FIG. 5B, the color filter substrate 621 for the transverse electric field type liquid crystal display device according to the second modification of the second embodiment of the present invention may include a first black matrix 650 formed in the display area AA. It has a five-layer structure of the first chromium oxide layer 630, the first chromium nitride layer 633, the chromium layer 636, the second chromium nitride layer 639, and the second chromium oxide layer 642, and is non-displayed. The second black matrix 653 configured in the region NA has a triple layer structure of the first chromium oxide layer 630 / the first chromium nitride layer 633 / the chromium layer 636.

In this case, the first chromium nitride layer 633 is formed between the first chromium oxide layer 630 and the chromium layer 636, and the second chromium nitride layer 639 is formed of the chromium layer 636 and the second. The reason for the formation between the chromium oxide layer 642 or the same as described above, the adhesion between the first chromium oxide layer 630 and the chromium layer 636 or the chromium layer 636 and the second chromium oxide layer 642 To improve.

Hereinafter, a method of manufacturing a color filter substrate for a transverse electric field type liquid crystal display device according to a second modification of the second embodiment including the first and second black matrices having the most complicated stacking configuration will be described.

6A to 6G are cross-sectional views illustrating manufacturing steps of a color filter substrate for a liquid crystal display according to a modification of the second exemplary embodiment, and are cross-sectional views illustrating manufacturing steps of a portion shown in FIG. 5B.

First, as illustrated in FIG. 6A, chromium oxide (CrOx) is deposited on a transparent glass insulating substrate 621 to form a first chromium oxide material layer 629, and then the first chromium oxide is continuously formed. The first chromium nitride material layer 632, the chromium material layer 635, the second chromium nitride material layer 638, and the second chromium oxide material layer 641 are sequentially formed on the material layer 629. Finally, the five layers of material layers are formed.

Thereafter, a photoresist, which is a photosensitive organic material, is coated on the second chromium oxide material layer 641 to form a photoresist layer. The photoresist layer has a transmissive area TA, a transflective area HTA, and a blocking area BA thereon. After the exposure mask 691 is positioned, exposure through the exposure mask 691 is performed.

In this case, the exposure mask 691 is characterized in that the transmittance of light in the transflective area (HTA) has a level of 20% to 80% of the transmittance of light in the transmissive area (TA), and thus such characteristics In order to have the transflective area (HTA) is characterized by consisting of a plurality of slits or a plurality of coating layers configured to weaken the transmittance of a plurality of light transmission.

When exposure is performed using the exposure mask 691 having such a characteristic, as shown in FIG. 6B, diffraction exposure or halftone exposure is performed in the transflective area TA. Therefore, after such exposure is performed, When the developing process is performed, a first thickness t1 having a predetermined width with respect to the edge of the substrate 621 of the non-display area NA outside the portion corresponding to the transflective area HTA, that is, the display area AA. First photoresist pattern 681a is formed, and a second photoresist pattern 681b having a second thickness t2 thicker than the first thickness t1 is formed as a lattice structure corresponding to the display area AA. Will be formed.

Next, as illustrated in FIG. 6C, the second chromium oxide material layer 641 of FIG. 6B exposed to the outside of the first and second photoresist patterns 681a and 681b in the display area AA. Underneath the second chromium nitride material layer (638 in FIG. 6B), the chromium material layer (635 in FIG. 6B), the first chromium nitride material layer (632 in FIG. 6B) and the first chromium oxide material layer (629 in FIG. 6B). ) By performing a first etching process to remove the first chromium oxide layer 630, the first chromium nitride layer 633, the chromium layer 363, the second chromium nitride layer 639, and the second oxide as a lattice structure. A first black matrix 650 having a five-layer structure of chromium layer 642 is formed. At this time, even in the non-display area NA, the second black matrix 652 having a five-layer structure is formed.

Next, as shown in FIG. 6D, the second chromium oxide layer in the non-display area NA is removed by ashing to remove the first photoresist pattern 681a of FIG. 6C. Expose (642). At this time, the second photoresist pattern 681b having a second thickness thicker than the first thickness is reduced, but still remains on the first black matrix 650 of the five-layer structure.

Next, as shown in FIG. 6E, only the second chromium oxide layer (642 in FIG. 6D) and the second chromium nitride layer (639 in FIG. 6D) exposed in the non-display area NA are removed. The second black matrix 653 having the triple layer structure of the first chromium oxide layer 630 / the first chromium nitride layer 633 / the chromium layer 636 is formed by performing the second etching process.

Next, as illustrated in FIG. 6F, the second photoresist pattern (681b of FIG. 6E) remaining on the first black matrix 650 having the five-layer structure is stripped and removed to remove the fifth layer structure. One black matrix 650 is exposed, and then a red color resist is applied to form a red color resist layer (not shown) and patterned, thereby surrounded by the first black matrix 650 in the display area AA. The red color filter pattern 665a is formed in a part of the pixel area, and the red color filter pattern 665a is successively performed to perform the same process as that of the red color filter pattern 665a. The color filter layer 665 including the green, blue, and blue color filter patterns 665a, 665b, and 665c is formed.

Next, as shown in FIG. 6G, the transparent organic insulating material is coated on the front surface of the color filter layer 665 and patterned to completely cover the color filter layer 665 to the side thereof and to cover the second black matrix 653. ) Forms an overcoat layer 673 in the form of exposure to complete the color filter substrate 621 for the transverse electric field type liquid crystal display device according to the second modification of the second embodiment of the present invention.

Although not shown in the drawings, an organic insulating material is coated and patterned on the overcoat layer 673 to further form a pillar-shaped patterned spacer (not shown) overlapping the first black matrix 650 and spaced apart from each other. It may be.

By proceeding similarly to the above-described manufacturing method, it is possible to manufacture the color filter substrate for the liquid crystal display device according to the first embodiment, its modifications, and the second embodiment of the present invention.

Hereinafter, a brief description will be made of a method for manufacturing a color filter substrate for a liquid crystal display device according to a first embodiment, a modification thereof, and a second modification of the second embodiment.

The manufacturing method of the color filter substrate for a transverse electric field type liquid crystal display device according to the second modification of the above-described second embodiment is modified so that in the case of the first embodiment, the first chromium oxide material layer / first chromium nitride material layer / After the chromium material layer / second chromium oxide material layer is formed, the first chromium oxide layer / first chromium nitride layer / chromium layer / agent is formed through the first and second etching after the aforementioned diffraction or halftone exposure. A first black matrix having a tetralayer structure of a chromium oxide layer and a second black matrix having a triple layer structure of a first chromium oxide layer / first chromium nitride layer / chromium layer can be formed.

Further, in the case of the first embodiment, a first chromium oxide material layer / chromium material layer / second oxynitride layer is formed on the substrate, and in the case of the first modification of the first embodiment, the first chromium oxide material layer / first nitride A chromium material layer / chromium material layer / second chromium oxide material layer is formed, and in the first modification of the first embodiment, the first chromium oxide material layer / first chromium nitride material layer / chromium material layer / second chromium nitride material A second layer of chromium oxide material is formed, and the photoresist pattern is formed by patterning and patterning the photoresist pattern by performing general exposure instead of diffraction exposure or halftone exposure. First and second black matrices can be formed.

At this time, in the first embodiment and the first and second modifications thereof, the nematic mode liquid crystal display is formed by forming a color filter layer according to the above-described method, and forming a common electrode by depositing a transparent conductive material on the entire surface instead of the overcoat layer thereon. The color filter substrate for an apparatus can be completed. In this case, the organic insulating material may be coated on the common electrode and patterned to further form a plurality of pillar-shaped patterned spacers spaced apart from each other in correspondence with the first black matrix.

The color filter substrate for a liquid crystal display according to the present invention is a chromium oxide layer in which a thin film transistor and a first black matrix corresponding to the thin film transistor formed in each pixel region of an array substrate are formed so that the uppermost layer absorbs light. It is configured to be made. Therefore, by suppressing the incidence of light reflected from the surface of the first black matrix to the thin film transistor, there is an effect of suppressing the generation of color shift due to light leakage.

Further, in the first and second black matrices, a portion of the first black matrix to be bonded to the substrate is used to form a chromium oxide layer, thereby improving the adhesion to the substrate.

In addition, in the case of the color filter substrate according to the present invention constituting the transverse electric field type liquid crystal display device, the second black matrix is formed by differently configuring the first black matrix formed inside the display area and the second black matrix formed outside the display area. The surface of the chromium layer has a conductive chromium layer, and furthermore, the chromium layer has an exposed state, thereby achieving a structure that can be electrically connected to the array substrate bonded thereto.

Claims (17)

A substrate in which a display area and a non-display area are defined; A first black matrix including a first adhesive layer, a reflective shielding layer, and an absorption shielding layer in a display area on the substrate and formed in a lattice shape; A color filter layer formed to overlap the first black matrix and fill a region surrounded by the first black matrix; A second black matrix including the first adhesive layer and the reflective shielding layer along an edge of the substrate in a non-display area on the substrate; An overcoat layer formed on the color filter layer while exposing the second black matrix; The second black matrix is characterized in that the uppermost layer from the substrate is the reflective shielding layer, and is electrically connected to the array substrate through conductive balls. Color filter substrate for a liquid crystal display device comprising a. delete delete delete The method of claim 1, Each of the first and second black matrices further includes a second adhesive layer formed between the first adhesive layer and the reflective shielding layer. delete The method of claim 1, And the reflective shielding layer has a conductive characteristic. The method of claim 7, wherein And a second adhesive layer further formed between the first adhesive layer and the reflective shielding layer of the second black matrix. 9. The method of claim 8, And a second adhesive layer further formed between the first adhesive layer and the reflective shielding layer of the first black matrix. The method of claim 9, And a third adhesive layer further formed between the reflective shielding layer and the absorption shielding layer of the first black matrix. delete The method of claim 1, The first adhesive layer and the absorption shielding layer is chromium oxide (CrOx) characterized in that the color filter substrate for a liquid crystal display device. The method of claim 1, The reflective shielding layer is a color filter substrate, characterized in that made of chromium (Cr). 11. The method of claim 10, And the second and third adhesive layers are formed of chromium nitride (CrNx). A first black matrix including a first adhesive layer, a reflective shielding layer, and an absorption shielding layer in the display area on the substrate on which the display area and the non-display area are defined, and formed in a lattice shape, and along the edge of the substrate in the non-display area; Forming a second black matrix including the first adhesive layer and the reflective shielding layer, wherein a second black matrix is formed from the substrate and the uppermost layer is the reflective shielding layer; Forming a color filter layer on the display area, the color filter layer formed by filling a region surrounded by the first black matrix and overlapping the first black matrix; The second black matrix is electrically connected to the array substrate through the conductive ball. The manufacturing method of the color filter substrate for liquid crystal display devices characterized by the above-mentioned. 16. The method of claim 15, Forming the first and second black matrix, Sequentially stacking a first adhesive layer, a reflective shielding layer, and an absorption shielding layer on the entire surface of the substrate; Patterning the absorbing shielding layer, the reflecting shielding layer, and the first adhesive layer to form first and second black matrices comprising the first adhesive layer, the reflecting shielding layer, and the absorbing shielding layer in each of the display area and the non-display area; ; Removing the absorption shielding layer of the second black matrix to expose the reflective shielding layer below Method of manufacturing a color filter substrate for a liquid crystal display device comprising a. delete

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