KR970017921A - 진공 트위저를 사용하는 반도체 제조장치 - Google Patents

진공 트위저를 사용하는 반도체 제조장치 Download PDF

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Publication number
KR970017921A
KR970017921A KR1019950029834A KR19950029834A KR970017921A KR 970017921 A KR970017921 A KR 970017921A KR 1019950029834 A KR1019950029834 A KR 1019950029834A KR 19950029834 A KR19950029834 A KR 19950029834A KR 970017921 A KR970017921 A KR 970017921A
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KR
South Korea
Prior art keywords
vacuum
manufacturing apparatus
line
vacuum line
tweezer
Prior art date
Application number
KR1019950029834A
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English (en)
Other versions
KR0175013B1 (ko
Inventor
전기현
김용수
Original Assignee
김광호
삼성전자 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 김광호, 삼성전자 주식회사 filed Critical 김광호
Priority to KR1019950029834A priority Critical patent/KR0175013B1/ko
Priority to JP12967596A priority patent/JPH0982782A/ja
Priority to TW085106921A priority patent/TW439169B/zh
Priority to US08/713,037 priority patent/US5791709A/en
Publication of KR970017921A publication Critical patent/KR970017921A/ko
Application granted granted Critical
Publication of KR0175013B1 publication Critical patent/KR0175013B1/ko

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6838—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S414/00—Material or article handling
    • Y10S414/135—Associated with semiconductor wafer handling
    • Y10S414/141—Associated with semiconductor wafer handling includes means for gripping wafer

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Manipulator (AREA)

Abstract

진공 트위저를 사용하는 반도체 제조장치에 대해 기재되어 있다. 이는, 진공라인의 본선과; 웨이퍼를 핸들링하는 진공 트위저와; 웨이퍼에 대하여 소정의 제조공정을 수행하는 제조장치와; 진공라인의 본선과 진공 트위저를 연결하기 위한 진공라인을 구비하는 반도체장치에 있어서, 진공라인은, 진공라인의 본선과 직접 연결되어 있는 제1진공라인과, 일단은 제1진공라인과 연결되고, 타단은 제조장치에 설치된 연결 코넥터를 개재하여 진공트위저와 연결되며, 그 몸체는 제조장치에 설치되어 있는 제2진공라인으로 구성된 것을 특징으로 한다. 따라서, 웨이퍼의 부서짐 및 긁힘을 최소화할 수 있으므로 제품의 특성향상은 물론 안정된 작업 및 공정수율을 얻을 수 있다.

Description

진공 트위저를 사용하는 반도체 제조장치
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제2도는 본 발명에 따른 진공 트위저와 그 주변부를 도시한 개략도이다.

Claims (4)

  1. 진공라인의 본선과; 웨이퍼를 핸들링하는 진공 트위저와; 상기 웨이퍼에 대하여 소정의 제조공정을 수행하는 제조장치와 상기 진공라인의 본선과 상기 진공 트위저를 연결하기 위한 진공라인을 구비하는 반도체장치에 있어서, 상기 진공라인은, 상기 진공라인의 본선과 직접 연결되어 있는 제1진공라인과; 일단은 상기 제1진공라인과 연결되고, 타단은 상기 제조장치에 설치된 연결 코넥터를 개재하여 상기 진공 트위저와 연결되며, 그 몸체는 상기 제조장치에 설치되어 있는 제2진공라인으로 구성된 것을 특징으로 하는 진공 트위저를 사용하는 반도체 제조장치.
  2. 제1항에 있어서, 상기 연결 코넥터의 위치는 상기 제조장치에서 행해지는 제조공정에 따라 정해지는 것을 특징으로 하는 진공 트위저를 사용하는 반도체 제조장치.
  3. 제2항에 있어서, 상기 연결 코넥터는 상기 제조장치의 좌 및 우측에 위치하는 것을 특징으로 하는 진공 트위저를 사용하는 반도체 제조장치.
  4. 제1항에 있어서, 상기 연결 코넥터의 크기는 상기 웨이퍼의 크기에 따라 변화되는 것을 특징으로 하는 진공 트위저를 사용하는 반도체 제조장치.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019950029834A 1995-09-13 1995-09-13 진공 트위저를 사용하는 반도체 제조장치 KR0175013B1 (ko)

Priority Applications (4)

Application Number Priority Date Filing Date Title
KR1019950029834A KR0175013B1 (ko) 1995-09-13 1995-09-13 진공 트위저를 사용하는 반도체 제조장치
JP12967596A JPH0982782A (ja) 1995-09-13 1996-05-24 吸着手段を有する半導体製造装置
TW085106921A TW439169B (en) 1995-09-13 1996-06-08 Semiconductor manufacturing apparatus having suctorial means
US08/713,037 US5791709A (en) 1995-09-13 1996-09-12 Semiconductor manufacturing apparatus having suctorial means for handling wafers

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019950029834A KR0175013B1 (ko) 1995-09-13 1995-09-13 진공 트위저를 사용하는 반도체 제조장치

Publications (2)

Publication Number Publication Date
KR970017921A true KR970017921A (ko) 1997-04-30
KR0175013B1 KR0175013B1 (ko) 1999-04-01

Family

ID=19426658

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019950029834A KR0175013B1 (ko) 1995-09-13 1995-09-13 진공 트위저를 사용하는 반도체 제조장치

Country Status (4)

Country Link
US (1) US5791709A (ko)
JP (1) JPH0982782A (ko)
KR (1) KR0175013B1 (ko)
TW (1) TW439169B (ko)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2016076633A1 (ko) * 2014-11-11 2016-05-19 기초과학연구원 중이온 가속기의 ssr1 저온유지장치

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6450860B1 (en) 1999-10-28 2002-09-17 Strasbaugh Pad transfer apparatus for chemical mechanical planarization

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3720433A (en) * 1970-09-29 1973-03-13 Us Navy Manipulator apparatus for gripping submerged objects
JPS5937736U (ja) * 1982-08-31 1984-03-09 白光金属工業株式会社 集積回路の取外し装置
US4428815A (en) * 1983-04-28 1984-01-31 Western Electric Co., Inc. Vacuum-type article holder and methods of supportively retaining articles
US4557514A (en) * 1984-07-18 1985-12-10 At&T Technologies, Inc. Vacuum pick and place robotic hand
JPS6339770A (ja) * 1986-08-01 1988-02-20 高橋　清 全弗素樹脂製真空ピンセツト
US4773687A (en) * 1987-05-22 1988-09-27 American Telephone And Telegraph Company, At&T Technologies, Inc. Wafer handler
DE3737506A1 (de) * 1987-11-05 1989-05-24 Ibm Deutschland Vorrichtung zur bestueckung insbesondere von leiterplatten
US5207467A (en) * 1990-08-31 1993-05-04 International Business Machines Corporation Monitor for detecting the absence of an electronic component on a vacuum pickup

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2016076633A1 (ko) * 2014-11-11 2016-05-19 기초과학연구원 중이온 가속기의 ssr1 저온유지장치

Also Published As

Publication number Publication date
TW439169B (en) 2001-06-07
JPH0982782A (ja) 1997-03-28
US5791709A (en) 1998-08-11
KR0175013B1 (ko) 1999-04-01

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