KR970013031A - Method of forming contact window of semiconductor device - Google Patents
Method of forming contact window of semiconductor device Download PDFInfo
- Publication number
- KR970013031A KR970013031A KR1019950025719A KR19950025719A KR970013031A KR 970013031 A KR970013031 A KR 970013031A KR 1019950025719 A KR1019950025719 A KR 1019950025719A KR 19950025719 A KR19950025719 A KR 19950025719A KR 970013031 A KR970013031 A KR 970013031A
- Authority
- KR
- South Korea
- Prior art keywords
- insulating layer
- interlayer insulating
- forming
- contact window
- semiconductor device
- Prior art date
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- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Drying Of Semiconductors (AREA)
Abstract
접촉창을 형성하는 방법에 대해 기재되어 있다. 이는 반도기판상에 층간절연층을 형성하는 제1 공정, 충간절연층 상에, 접촉창이 형성될 부분의 층간절연층을 노출시키는 모양의 포토네지스트 패턴을 형성하는 제2공정, 결과물 기판 전면 상에, 플라즈마가 증강된 화학기상 증착방식으로 절연막을 형성하는 제3 공정 및 절연막 및 층간절연층을 식각대상물로 한 건식식각을 행함으로써 충간절연층에 접촉창을 형성하는 제4 공정을 포함하는 것을 특징으로 한다. 따라서, 접촉창의 입구부가 과다하게 커지는 것을 방지할 수 있다.A method of forming a contact window is described. This is a first step of forming an interlayer insulating layer on a semiconductor substrate, a second step of forming a photonegative pattern of a shape exposing an interlayer insulating layer of a portion where a contact window is to be formed on the interlayer insulating layer, and on the entire substrate. And a fourth step of forming an insulating film by a chemical vapor deposition method in which plasma is enhanced, and a fourth step of forming a contact window in the interlayer insulating layer by performing dry etching using the insulating film and the interlayer insulating layer as an etching target. It features. Therefore, the inlet of the contact window can be prevented from becoming excessively large.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.
제2A도 내지 제2C도는 본 발명의 방법에 의한 반도체 장치의 접촉창 형성방법을 설형하기 위해 도시한 단면도들이다.2A to 2C are cross-sectional views for explaining a method for forming a contact window of a semiconductor device according to the method of the present invention.
Claims (2)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019950025719A KR970013031A (en) | 1995-08-21 | 1995-08-21 | Method of forming contact window of semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019950025719A KR970013031A (en) | 1995-08-21 | 1995-08-21 | Method of forming contact window of semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
KR970013031A true KR970013031A (en) | 1997-03-29 |
Family
ID=66595912
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019950025719A KR970013031A (en) | 1995-08-21 | 1995-08-21 | Method of forming contact window of semiconductor device |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR970013031A (en) |
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1995
- 1995-08-21 KR KR1019950025719A patent/KR970013031A/en not_active Application Discontinuation
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