KR970008312A - 자외선 조사장치 - Google Patents

자외선 조사장치 Download PDF

Info

Publication number
KR970008312A
KR970008312A KR1019950020640A KR19950020640A KR970008312A KR 970008312 A KR970008312 A KR 970008312A KR 1019950020640 A KR1019950020640 A KR 1019950020640A KR 19950020640 A KR19950020640 A KR 19950020640A KR 970008312 A KR970008312 A KR 970008312A
Authority
KR
South Korea
Prior art keywords
ultraviolet
heating block
vacuum chuck
wafer
ultraviolet lamp
Prior art date
Application number
KR1019950020640A
Other languages
English (en)
Other versions
KR0151074B1 (ko
Inventor
고균희
김철희
이병관
김승옥
Original Assignee
김광호
삼성전자 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 김광호, 삼성전자 주식회사 filed Critical 김광호
Priority to KR1019950020640A priority Critical patent/KR0151074B1/ko
Priority to JP09703096A priority patent/JP3859259B2/ja
Priority to US08/679,084 priority patent/US5872365A/en
Publication of KR970008312A publication Critical patent/KR970008312A/ko
Application granted granted Critical
Publication of KR0151074B1 publication Critical patent/KR0151074B1/ko
Priority to JP2006222028A priority patent/JP2006352155A/ja

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67098—Apparatus for thermal treatment
    • H01L21/67115—Apparatus for thermal treatment mainly by radiation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67132—Apparatus for placing on an insulating substrate, e.g. tape
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6838—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Dicing (AREA)
  • Drying Of Semiconductors (AREA)

Abstract

자외선 조사장치가 개시되어 있다. 본 발명은 챔버 내에 설치되어 자외선을 발생시키는 자외선 램프, 상기 자외선 램프의 하부에 웨이퍼를 지지하면서 이동시키기 위하여 설치된 진공 척, 및 상기 진공 척 부분에 자외선을 집중시키기 위하여 상기 자외선 램프를 둘러싸도록 설치된 반사경을 포함하는 자외선 조사장치에 있어서, 상기 진공 척 양 옆에 각각 온도조절이 가능한 히팅 블록(heating block)을 구비하는 것을 특징으로 하는 자외선 조사장치를 제공한다.
본 발명에 의하면, 웨이퍼를 지지하는 척 양 옆에 온도 조절이 가능한 히팅 블록을 설치함으로써, 척에 의해 지지되는 웨이퍼 주위의 온도를 일정하게 유지시킬 수 있다. 따라서, 웨이퍼의 앞면에 부착된 보호용테이프에 자외선을 조사할 때 보호용테이프의 접착제를 최적조건에서 화학반응시킬 수 있어 보호용테이프를 용이하게 제거시킬 수 있다.

Description

자외선 조사장치
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 본 발명에 의한 자외선 조사장치의 정면도이다. 제2도는 본 발명에 의한 자외선 조사장치의 측면도이다.

Claims (3)

  1. 챔버 내에 설치되어 자외선을 발생시키는 자외선 램프, 상기 자외선 램프의 하부에 웨이퍼를 지지하면서 이동시키기 위하여 설치된 진공 척, 상기 진공 척 부분에 자외선을 집중시키기 위하여 상기 자외선 램프를 둘러싸도록 설치된 반사경을 포함하는 자외선 조사장치에 있어서, 상기 진공 척 양 옆에 각각 온도조절이 가능한 히팅 블록(heating block)을 구비하는 것을 특징으로 하는 자외선 조사장치.
  2. 제1항에 있어서, 상기 하나의 히팅 블록은 많은 열을 방출시키기 위하여 윗면이 요철 형태를 갖는 방열판; 상기 방열판의 아랫면 및 상기 진공 척 반대편의 측벽에 상기 방열판으로부터 방출되는 열을 차단시키기 위하여 부착된 단열판; 상기 단열판이 부착된 상기 방열판의 측벽에 형성된 적어도 하나 이상의 홈; 및 상기 홈에 끼워져 장착되고 온도조절이 가능한 히터를 포함하는 것을 특징으로 하는 자외선 조사장치.
  3. 제1항에 있어서, 상기 히팅 블록은 착탈이 가능하도록 형성된 것을 특징으로 하는 자외선 조사장치.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019950020640A 1995-07-13 1995-07-13 자외선 조사장치 KR0151074B1 (ko)

Priority Applications (4)

Application Number Priority Date Filing Date Title
KR1019950020640A KR0151074B1 (ko) 1995-07-13 1995-07-13 자외선 조사장치
JP09703096A JP3859259B2 (ja) 1995-07-13 1996-04-18 紫外線照射装置
US08/679,084 US5872365A (en) 1995-07-13 1996-07-12 UV irradiation apparatus
JP2006222028A JP2006352155A (ja) 1995-07-13 2006-08-16 紫外線照射装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019950020640A KR0151074B1 (ko) 1995-07-13 1995-07-13 자외선 조사장치

Publications (2)

Publication Number Publication Date
KR970008312A true KR970008312A (ko) 1997-02-24
KR0151074B1 KR0151074B1 (ko) 1998-12-01

Family

ID=19420552

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019950020640A KR0151074B1 (ko) 1995-07-13 1995-07-13 자외선 조사장치

Country Status (1)

Country Link
KR (1) KR0151074B1 (ko)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100460675B1 (ko) * 1996-03-27 2005-04-08 우시오덴키 가부시키가이샤 자외선조사장치
US7478252B2 (en) 2004-12-16 2009-01-13 Samsung Electronics Co., Ltd. Power off controllers and memory storage apparatus including a power-polling time control circuit

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW502293B (en) * 2000-06-20 2002-09-11 Tokyo Electron Ltd Substrate processing device and substrate processing method

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100460675B1 (ko) * 1996-03-27 2005-04-08 우시오덴키 가부시키가이샤 자외선조사장치
US7478252B2 (en) 2004-12-16 2009-01-13 Samsung Electronics Co., Ltd. Power off controllers and memory storage apparatus including a power-polling time control circuit

Also Published As

Publication number Publication date
KR0151074B1 (ko) 1998-12-01

Similar Documents

Publication Publication Date Title
US5861633A (en) Irradiator apparatus
US6717158B1 (en) Heating device for heating semiconductor wafers in thermal processing chambers
JP2889094B2 (ja) カートンを滅菌するための装置
WO2002050875A3 (en) Heating configuration for use in thermal processing chambers
KR940006190A (ko) 내장된 프로세스 제어 감지기를 갖고 있는 다구역 조명기
JPH025294B2 (ko)
JP2007247068A5 (ko)
KR940006200A (ko) 반도체 처리장치
KR950006955A (ko) 열 처리장치 및 열처리방법
US6881964B2 (en) Integral filter support and shutter stop for UV curing system
KR970008312A (ko) 자외선 조사장치
WO2005052988A3 (en) Focused photon energy heating chamber
KR970065408A (ko) 캐리어 본체(Cerrier body)를 가열하는 방법 및 그 장치
EP0211138A3 (en) Base for microscope stand
KR960005823A (ko) 반도체 기판의 건조장치
JP2006294717A (ja) 基板加熱装置
JPS6474717A (en) Formation of thin film
WO1994024840A3 (en) Thin film heat treatment apparatus
JP2001035775A (ja) 紫外線照射装置
KR920006415A (ko) 친수성 고분자필름의 제조방법 및 그 장치
KR970008313A (ko) 자외선 조사장치
KR101380470B1 (ko) 광 조사 장치
ATE309029T1 (de) Bestrahlungsgerät
JPS6135248A (ja) 感熱製版装置
KR900010915A (ko) 광화학증착장치용 적외선 가열장치

Legal Events

Date Code Title Description
A201 Request for examination
E701 Decision to grant or registration of patent right
GRNT Written decision to grant
FPAY Annual fee payment

Payment date: 20110531

Year of fee payment: 14

LAPS Lapse due to unpaid annual fee