KR970004422B1 - Phase shift mask and manufacturing method - Google Patents

Phase shift mask and manufacturing method Download PDF

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Publication number
KR970004422B1
KR970004422B1 KR93028888A KR930028888A KR970004422B1 KR 970004422 B1 KR970004422 B1 KR 970004422B1 KR 93028888 A KR93028888 A KR 93028888A KR 930028888 A KR930028888 A KR 930028888A KR 970004422 B1 KR970004422 B1 KR 970004422B1
Authority
KR
South Korea
Prior art keywords
transparent material
coating
shift mask
phase shift
phase shifting
Prior art date
Application number
KR93028888A
Other languages
English (en)
Other versions
KR950021038A (ko
Inventor
Ik-Bum Hu
Original Assignee
Hyundai Electronics Ind
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hyundai Electronics Ind filed Critical Hyundai Electronics Ind
Priority to KR93028888A priority Critical patent/KR970004422B1/ko
Publication of KR950021038A publication Critical patent/KR950021038A/ko
Application granted granted Critical
Publication of KR970004422B1 publication Critical patent/KR970004422B1/ko

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
KR93028888A 1993-12-21 1993-12-21 Phase shift mask and manufacturing method KR970004422B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR93028888A KR970004422B1 (en) 1993-12-21 1993-12-21 Phase shift mask and manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR93028888A KR970004422B1 (en) 1993-12-21 1993-12-21 Phase shift mask and manufacturing method

Publications (2)

Publication Number Publication Date
KR950021038A KR950021038A (ko) 1995-07-26
KR970004422B1 true KR970004422B1 (en) 1997-03-27

Family

ID=19371971

Family Applications (1)

Application Number Title Priority Date Filing Date
KR93028888A KR970004422B1 (en) 1993-12-21 1993-12-21 Phase shift mask and manufacturing method

Country Status (1)

Country Link
KR (1) KR970004422B1 (ko)

Also Published As

Publication number Publication date
KR950021038A (ko) 1995-07-26

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