KR960704672A - 투과형 액정마스크마커(transmission type liqutd crystal mask marker) - Google Patents

투과형 액정마스크마커(transmission type liqutd crystal mask marker)

Info

Publication number
KR960704672A
KR960704672A KR1019960701573A KR19960701573A KR960704672A KR 960704672 A KR960704672 A KR 960704672A KR 1019960701573 A KR1019960701573 A KR 1019960701573A KR 19960701573 A KR19960701573 A KR 19960701573A KR 960704672 A KR960704672 A KR 960704672A
Authority
KR
South Korea
Prior art keywords
light
liquid crystal
crystal mask
still image
transmissive liquid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
KR1019960701573A
Other languages
English (en)
Korean (ko)
Inventor
유키히로 쯔다
타쿠 야마자키
아키라 모리
유키노리 마쯔무라
Original Assignee
안자키 사토루
카부시키가이샤 코마쯔세이사쿠쇼
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP5269966A external-priority patent/JP2663238B2/ja
Priority claimed from JP5312876A external-priority patent/JP2651995B2/ja
Application filed by 안자키 사토루, 카부시키가이샤 코마쯔세이사쿠쇼 filed Critical 안자키 사토루
Publication of KR960704672A publication Critical patent/KR960704672A/ko
Withdrawn legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/064—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
    • B23K26/066—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms by using masks
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • Liquid Crystal (AREA)
  • Laser Beam Processing (AREA)
KR1019960701573A 1993-09-30 1994-09-26 투과형 액정마스크마커(transmission type liqutd crystal mask marker) Withdrawn KR960704672A (ko)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP93-269966 1993-09-30
JP5269966A JP2663238B2 (ja) 1993-09-30 1993-09-30 液晶マスク式レーザマーカ
JP93-312876 1993-11-19
JP5312876A JP2651995B2 (ja) 1993-05-13 1993-11-19 透過型液晶マスクマーカ及びレーザ刻印方法
PCT/JP1994/001574 WO1995009067A1 (en) 1993-09-30 1994-09-26 Transmission type liquid crystal mask marker

Publications (1)

Publication Number Publication Date
KR960704672A true KR960704672A (ko) 1996-10-09

Family

ID=26549006

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019960701573A Withdrawn KR960704672A (ko) 1993-09-30 1994-09-26 투과형 액정마스크마커(transmission type liqutd crystal mask marker)

Country Status (4)

Country Link
US (1) US5663826A (enExample)
EP (1) EP0724928A1 (enExample)
KR (1) KR960704672A (enExample)
WO (1) WO1995009067A1 (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2860765B2 (ja) * 1995-03-07 1999-02-24 株式会社小松製作所 レーザ刻印装置の制御装置
JP3413645B2 (ja) * 1995-03-22 2003-06-03 株式会社小松製作所 レーザ刻印装置における刻印位置補正装置
US5969741A (en) * 1996-06-17 1999-10-19 Xerox Corporation Raster scanner with a selectable spot dimension
US6657157B1 (en) * 2000-06-07 2003-12-02 Westar Photonics, Inc. Method, system and product for producing a reflective mask mirror and for ablating an object using said reflective mask mirror
CN117572677B (zh) * 2023-12-29 2024-07-23 剑芯光电(苏州)有限公司 一种液晶器件动态反射率的测试系统及方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2602266B2 (ja) * 1987-03-02 1997-04-23 株式会社日立製作所 レーザマーカ及びそれを利用したレーザ発振器
US4818835A (en) * 1987-03-02 1989-04-04 Hitachi, Ltd. Laser marker and method of laser marking
JP2701183B2 (ja) * 1991-08-09 1998-01-21 株式会社小松製作所 液晶マスク式レーザマーカ
JP2640321B2 (ja) * 1992-05-08 1997-08-13 株式会社小松製作所 液晶マスク式レーザマーカ及びレーザマーキング方法
WO1994026457A1 (fr) * 1993-05-07 1994-11-24 Kabushiki Kaisha Komatsu Seisakusho Dispositif de controle de cristaux liquides au laser et procede d'evaluation de la deterioration de cristaux liquides

Also Published As

Publication number Publication date
EP0724928A1 (en) 1996-08-07
EP0724928A4 (enExample) 1996-08-28
US5663826A (en) 1997-09-02
WO1995009067A1 (en) 1995-04-06

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Legal Events

Date Code Title Description
PA0105 International application

Patent event date: 19960326

Patent event code: PA01051R01D

Comment text: International Patent Application

PG1501 Laying open of application
PC1203 Withdrawal of no request for examination
WITN Application deemed withdrawn, e.g. because no request for examination was filed or no examination fee was paid